Patents by Inventor Hui-Ting Yang

Hui-Ting Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210338414
    Abstract: A tissue repair device and a method for using the same are provided. The tissue repair device includes a body portion and at least one wire. The body portion includes an inner layer and an outer layer. The inner layer is close to a tissue, wherein the inner layer includes a hydrophilic structure, and the outer layer includes a hydrophobic structure. The wire is connected to the body portion to fix the body portion to the tissue.
    Type: Application
    Filed: April 29, 2021
    Publication date: November 4, 2021
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Chieh HUANG, Jeng-Liang KUO, Hui-Ting HUANG, Shiun-Yin CHANG, Meng-Hsueh LIN, Cheng-Yi WU, Lih-Tao HSU, Pei-I TSAI, Hsin-Hsin SHEN, Chih-Yu CHEN, Kuo-Yi YANG, Chun-Hsien MA
  • Patent number: 11133255
    Abstract: A semiconductor device or structure includes a first pattern metal layer disposed between a first supply metal tract and a second supply metal tract, the first pattern metal layer comprising an internal route and a power route. A follow pin couples the first supply metal to the power route. The first supply metal tract comprises a first metal and a follow pin comprises a second metal.
    Type: Grant
    Filed: April 20, 2020
    Date of Patent: September 28, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Shih-Wei Peng, Chih-Liang Chen, Charles Chew-Yuen Young, Hui-Ting Yang, Jiann-Tyng Tzeng, Wei-Cheng Lin
  • Patent number: 11121256
    Abstract: A method for forming a non-planar semiconductor device includes: forming a fin structure protruding from a front side of a substrate of the non-planar semiconductor device; depositing a dielectric region on the front side of the substrate, the dielectric region including a conductive rail buried within the dielectric region and in parallel with the fin structure; etching the dielectric region to create a first opening in the dielectric region to expose the conductive rail; depositing a plurality of conductive regions on the dielectric region, one of the conductive regions contacting the conductive rail through the first opening; etching the substrate from a backside of the substrate to form a second opening to expose the conductive rail; and filling a first conductive material into the second opening to form a through-substrate via in the substrate.
    Type: Grant
    Filed: June 5, 2020
    Date of Patent: September 14, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chih-Liang Chen, Lei-Chun Chou, Jack Liu, Kam-Tou Sio, Hui-Ting Yang, Wei-Cheng Lin, Chun-Hung Liou, Jiann-Tyng Tzeng, Chew-Yuen Young
  • Publication number: 20210280607
    Abstract: The present disclosure describes an apparatus with a local interconnect structure. The apparatus can include a first transistor, a second transistor, a first interconnect structure, a second interconnect structure, and a third interconnect structure. The local interconnect structure can be coupled to gate terminals of the first and second transistors and routed at a same interconnect level as reference metal lines coupled to ground and a power supply voltage. The first interconnect structure can be coupled to a source/drain terminal of the first transistor and routed above the local interconnect structure. The second interconnect structure can be coupled to a source/drain terminal of the second transistor and routed above the local interconnect structure. The third interconnect structure can be routed above the local interconnect structure and at a same interconnect level as the first and second interconnect structures.
    Type: Application
    Filed: May 24, 2021
    Publication date: September 9, 2021
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Liang CHEN, Cheng-Chi Chuang, Chih-Ming Lai, Chia-Tien Wu, Charles Chew-Yuen Young, Hui-Ting Yang, Jiann-Tyng Tzeng, Ru-Gun Liu, Wei-Cheng Lin, Lei-Chun Chou, Wei-An Lai
  • Publication number: 20210225831
    Abstract: A system that generates a layout diagram has a processor that implements a method, the method including: generating first and second conductor shapes; generating first, second and third cap shapes correspondingly over the first and second conductor shapes; arranging a corresponding one of the second conductor shapes to be interspersed between each pair of neighboring ones of the first conductor shapes; generating first cut patterns over selected portions of corresponding ones of the first cap shapes; and generating second cut patterns over selected portions of corresponding ones of the second cap shapes. In some circumstances, the first cut patterns are designated as selective for a first etch sensitivity corresponding to the first cap shapes; and the second cut patterns are designated as selective for a second etch sensitivity corresponding to the second cap shapes.
    Type: Application
    Filed: April 8, 2021
    Publication date: July 22, 2021
    Inventors: Kam-Tou SIO, Chih-Liang CHEN, Hui-Ting YANG, Shun Li CHEN, Ko-Bin KAO, Chih-Ming LAI, Ru-Gun LIU, Charles Chew-Yuen YOUNG
  • Publication number: 20210217744
    Abstract: A semiconductor device includes a first transistor having a first fin, wherein a base of the first fin is surrounded by a first dielectric material, the first fin having a first fin height measured from the top surface of the first dielectric material to a top surface of the first fin; and a second transistor having a second fin, wherein a base of the second fin is surrounded by a second dielectric material, the second fin having a second fin height measured from a top surface of the second dielectric material to a top surface of the second fin, wherein the first fin height is different from the second fin height.
    Type: Application
    Filed: March 29, 2021
    Publication date: July 15, 2021
    Inventors: Wei-Cheng LIN, Hui-Ting YANG, Jiann-Tyng TZENG, Lipen YUAN, Wei-An LAI
  • Patent number: 11063596
    Abstract: A frame decoding circuit implemented in an IC die includes a frame synchronizer, receiving an input clock signal and an input frame signal in serial form, to provide an output clock signal. A phase shift of the output clock signal is adjusted according to a detected code by sampling the input frame signal at a center point for every two bits and the detected code being not a correct type. The input clock signal is divided in frequency with the phase shift for providing the output clock signal. A de-serializer unit receives the input frame signal, the input data, the output clock signal from the frame synchronizer, a delay-locked-loop clock signal to de-serialize the input frame signal and the input data for output.
    Type: Grant
    Filed: January 7, 2021
    Date of Patent: July 13, 2021
    Assignees: Global Unichip Corporation, Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ting-Hao Wang, Ting-Chin Cho, Hui-Ting Yang, Yung-Sheng Fang, Chang-Ming Liu, Igor Elkanovich, Amnon Parnass
  • Patent number: 11043426
    Abstract: The present disclosure, in some embodiments, relates to a method of forming an integrated chip. The method may be performed by forming a plurality of gate structures over a substrate, and forming a plurality of source and drain regions along opposing sides of the plurality of gate structures. A plurality of middle-of-the-line (MOL) structures are formed at locations laterally interleaved between the plurality of gate structures. The plurality of MOL structures are redefined by getting rid of a part but not all of one or more of the plurality of MOL structures. Redefining the plurality of MOL structures results in a plurality of MOL active structures arranged over the plurality of source and drain regions at an irregular pitch.
    Type: Grant
    Filed: September 22, 2019
    Date of Patent: June 22, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hui-Ting Yang, Chih-Ming Lai, Chun-Kuang Chen, Chih-Liang Chen, Charles Chew-Yuen Young, Jiann-Tyng Tzeng, Kam-Tou Sio, Meng-Hung Shen, Ru-Gun Liu, Wei-Cheng Lin
  • Publication number: 20210183772
    Abstract: The present disclosure relates to a semiconductor device and a manufacturing method, and more particularly to forming via rail and deep via structures to reduce parasitic capacitances in standard cell structures. Via rail structures are formed in a level different from the conductive lines. The via rail structure can reduce the number of conductive lines and provide larger separations between conductive lines that are on the same interconnect level and thus reduce parasitic capacitance between conductive lines.
    Type: Application
    Filed: February 1, 2021
    Publication date: June 17, 2021
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wei-Cheng LIN, Cheng-Chi CHUANG, Chih-Liang CHEN, Charles Chew-Yuen YOUNG, Hui-Ting YANG, Wayne LAI
  • Patent number: 11018157
    Abstract: The present disclosure describes an apparatus with a local interconnect structure. The apparatus can include a first transistor, a second transistor, a first interconnect structure, a second interconnect structure, and a third interconnect structure. The local interconnect structure can be coupled to gate terminals of the first and second transistors and routed at a same interconnect level as reference metal lines coupled to ground and a power supply voltage. The first interconnect structure can be coupled to a source/drain terminal of the first transistor and routed above the local interconnect structure. The second interconnect structure can be coupled to a source/drain terminal of the second transistor and routed above the local interconnect structure. The third interconnect structure can be routed above the local interconnect structure and at a same interconnect level as the first and second interconnect structures.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: May 25, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Liang Chen, Cheng-Chi Chuang, Chih-Ming Lai, Chia-Tien Wu, Charles Chew-Yuen Young, Hui-Ting Yang, Jiann-Tyng Tzeng, Ru-Gun Liu, Wei-Cheng Lin, Lei-Chun Chou, Wei-An Lai
  • Publication number: 20210110094
    Abstract: A method of manufacturing a semiconductor device that includes identifying a first area in the layout diagram which is populated with cells, the first area including first and second rows extending substantially parallel to a first direction, the first and second rows having substantially different cell densities; relative to a second direction, substantially perpendicular to the first direction, the first and second rows having corresponding first (H1) and second (H2) heights. The method also includes replacing cells in the first row which have the H1 height with corresponding substitute cells, each substitute cell being correspondingly taller relative to the second direction and correspondingly narrower relative to the first direction, the replacing thereby increasing a density of the second row at least without substantially increasing a density of the first row.
    Type: Application
    Filed: December 22, 2020
    Publication date: April 15, 2021
    Inventors: Wei-Cheng LIN, Hui-Ting YANG, Jiann-Tyng TZENG, Lipen YUAN, Wei-An LAI
  • Patent number: 10978439
    Abstract: A method of generating a layout diagram includes: generating first and second conductor shapes; generating first, second and third cap shapes correspondingly over the first and second conductor shapes; arranging a corresponding one of the second conductor shapes to be interspersed between each pair of neighboring ones of the first conductor shapes; generating first cut patterns over selected portions of corresponding ones of the first cap shapes; and generating second cut patterns over selected portions of corresponding ones of the second cap shapes. In some circumstances, the first cut patterns are designated as selective for a first etch sensitivity corresponding to the first cap shapes; and the second cut patterns are designated as selective for a second etch sensitivity corresponding to the second cap shapes.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: April 13, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Kam-Tou Sio, Chih-Liang Chen, Chih-Ming Lai, Charles Chew-Yuen Young, Hui-Ting Yang, Ko-Bin Kao, Ru-Gun Liu, Shun Li Chen
  • Patent number: 10964684
    Abstract: A method of modifying an integrated circuit includes operations related to identifying at least two fin-containing functional areas of the integrated circuit, generating a performance curve for each fin-containing functional area of the integrated circuit for each fin height of a series of fin heights, and determining whether an inflection point exists for each performance curve. The method further includes operations related to selecting a value of a performance characteristic for each of the fin-containing functional areas, the selected value having a corresponding fin height in each of the fin-containing functional areas, modifying each fin-containing functional area to have the fin height corresponding to the selected value of the performance characteristic; and combining the modified fin-containing functional areas to form a modified integrated circuit.
    Type: Grant
    Filed: May 7, 2019
    Date of Patent: March 30, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Wei-Cheng Lin, Hui-Ting Yang, Jiann-Tyng Tzeng, Lipen Yuan, Wei-An Lai
  • Publication number: 20210091000
    Abstract: A method of manufacturing a semiconductor device including: arranging a first and a second gate strip separating in a first distance, wherein each of the first and the second gate strip is a gate terminal of a transistor; depositing a first contact via on the first gate strip; forming a first conductive strip on the first contact via, wherein the first conductive strip and the first gate strip are crisscrossed from top view; arranging a second and a third conductive strip, above the first conductive strip, separating in a second distance, wherein each of the second and the third conductive strip is free from connecting to the first conductive strip, the first and the second conductive strip are crisscrossed from top view. The first distance is twice as the second distance. A length of the first conductive strip is smaller than two and a half times as the first distance.
    Type: Application
    Filed: December 8, 2020
    Publication date: March 25, 2021
    Inventors: SHIH-WEI PENG, HUI-TING YANG, WEI-CHENG LIN, JIANN-TYNG TZENG
  • Publication number: 20210066182
    Abstract: Examples of an integrated circuit a having an advanced two-dimensional (2D) metal connection with metal cut and methods of fabricating the same are provided. An example method for fabricating a conductive interconnection layer of an integrated circuit may include: patterning a conductive connector portion on the conductive interconnection layer of the integrated circuit using extreme ultraviolet (EUV) lithography, wherein the conductive connector portion is patterned to extend across multiple semiconductor structures in a different layer of the integrated circuit; and cutting the conductive connector portion into a plurality of conductive connector sections, wherein the conductive connector portion is cut by removing conductive material from the metal connector portion at one or more locations between the semiconductor structures.
    Type: Application
    Filed: November 16, 2020
    Publication date: March 4, 2021
    Inventors: Chih-Liang Chen, Cheng-Chi Chuang, Chih-Ming Lai, Chia-Tien Wu, Charles Chew-Yuen Young, Hui-Ting Yang, Jiann-Tyng Tzeng, Kam-Tou Sio, Ru-Gun Liu, Shun Li Chen, Shih-Wei Peng, Tien-Lu Lin
  • Patent number: 10930595
    Abstract: The present disclosure relates to a semiconductor device and a manufacturing method, and more particularly to forming via rail and deep via structures to reduce parasitic capacitances in standard cell structures. Via rail structures are formed in a level different from the conductive lines. The via rail structure can reduce the number of conductive lines and provide larger separations between conductive lines that are on the same interconnect level and thus reduce parasitic capacitance between conductive lines.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: February 23, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wei-Cheng Lin, Cheng-Chi Chuang, Chih-Liang Chen, Charles Chew-Yuen Young, Hui-Ting Yang, Wayne Lai
  • Publication number: 20210028311
    Abstract: The present disclosure describes various non-planar semiconductor devices, such as fin field-effect transistors (finFETs) to provide an example, having one or more metal rail conductors and various methods for fabricating these non-planar semiconductor devices. In some situations, the one or more metal rail conductors can be electrically connected to gate, source, and/or drain regions of these various non-planar semiconductor devices. In these situations, the one or more metal rail conductors can be utilized to electrically connect the gate, the source, and/or the drain regions of various non-planar semiconductor devices to other gate, source, and/or drain regions of various non-planar semiconductor devices and/or other semiconductor devices. However, in other situations, the one or more metal rail conductors can be isolated from the gate, the source, and/or the drain regions these various non-planar semiconductor devices.
    Type: Application
    Filed: October 12, 2020
    Publication date: January 28, 2021
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Liang Chen, Charles Chew-Yuen Young, Hui-Ting Yang, Jiann-Tyng Tzeng, Kam-Tou Sio, Shih-Wei Peng, Wei-Cheng Lin, Lei-Chun Chou
  • Patent number: 10878162
    Abstract: A method of designing a layout includes generating first routing tracks assigned to a first color group, generating second routing tracks assigned to a second color group, wherein a first routing track of the first routing tracks is between adjacent second routing tracks of the second routing tracks, and specifying a color stitching region connecting a selected first routing track of the first routing tracks with a selected second routing track of the second routing tracks of the layout, wherein the color stitching region represents a conductive region that connects a first conductive element represented by the selected first routing track with a second conductive element represented by the selected second routing track through an exposed portion of the selected first routing track, and wherein the exposed portion is at a removed portion of a sidewall structure surrounding the selected first routing track.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: December 29, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Shih-Wei Peng, Chih-Ming Lai, Hui-Ting Yang, Jiann-Tyng Tzeng, Wei-Cheng Lin
  • Patent number: 10878158
    Abstract: A method of generating a layout diagram includes: identifying a first area in the layout diagram which is populated with cells, the first area including first and second rows extending substantially parallel to a first direction, the first and second rows having substantially different cell densities; relative to a second direction, substantially perpendicular to the first direction, the first and second rows having corresponding first (H1) and second (H2) heights; for a first one of the cells having H1 height (a first H1 cell) in a first location in the first row, substituting a multi-row-height cell for the first H1 cell, the multi-row-height cell being narrower than the first H1 cell relative to the first direction; and placing a first part of the multi-row-height cell into a portion of the first location resulting in the first and second rows having more similar cell densities.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: December 29, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wei-Cheng Lin, Hui-Ting Yang, Jiann-Tyng Tzeng, Lipen Yuan, Wei-An Lai
  • Publication number: 20200395298
    Abstract: A semiconductor device includes gate strips, first metal strips and second metal strips. The first metal strips are formed above the gate strips. The first metal strips are co-planar, and each first metal strip and one of the gate strips are crisscrossed. The second metal strips are formed above the first metal strips. The second metal strips are co-planar, and each second metal strip and one of the first metal strips are crisscrossed. One first metal strip connects to one gate strip crossing underneath by a first contact via without connecting to one second metal strip crossing over. A length between two adjacent gate strips is twice as a length between two adjacent second metal strips, and a length of said one first metal strips is smaller than two and a half times as the length between two adjacent gate strips.
    Type: Application
    Filed: June 14, 2019
    Publication date: December 17, 2020
    Inventors: Shih-Wei Peng, Hui-Ting Yang, Wei-Cheng Lin, Jiann-Tyng Tzeng