Patents by Inventor Hui-yi Tang

Hui-yi Tang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CLEANING COMPOSITION, CLEANING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR
    Publication number: 20240218294
    Abstract: A cleaning composition for electronics industries is provided. The cleaning composition includes 40% to 90% by weight of an amine solvent having a structure of following formula (1), a quaternary ammonium salt, and water. Wherein, R1, R2, R4, and R5 are each independently hydrogen, a linear alkyl group having 1 to 4 carbon atoms, a branched alkyl group having 3 to 5 carbon atoms, a linear alkylamine having 1 to 4 carbon atoms, or a branched alkylamine having 3 to 5 carbon atoms, and R3 is a linear alkylene group having 1 to 5 carbon atoms or a branched alkylene group having 3 to 5 carbon atoms.
    Type: Application
    Filed: November 6, 2023
    Publication date: July 4, 2024
    Applicant: Daxin materials corporation
    Inventors: Hui-yi TANG, Tzu-chi WANG, Yi-cheng CHEN
  • ALKALINE CLEANING COMPOSITION, CLEANING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR
    Publication number: 20220206394
    Abstract: An alkaline cleaning composition is provided. The alkaline cleaning composition includes an alkaline compound, 5% to 40% by weight of propylene glycol monomethyl ether, 10% to 30% by weight of water, and a polar solvent. Wherein, the polar solvent includes acetals, glycol ethers, pyrrolidones, or a combination thereof, and the alkaline cleaning composition is free of benzenesulfonic acid.
    Type: Application
    Filed: December 23, 2021
    Publication date: June 30, 2022
    Applicant: Daxin materials corporation
    Inventors: Hui-yi Tang, Tzu-chi Wang, Yu-nung Chen, Yi-cheng Chen