Abstract: A method for manufacturing 2-dimensional dimethylglyoxime-iridium (DMG-Ir) nanosheet is used to manufacturing the 2-dimensional DMG-Ir nanosheet which can quickly react with a nickel (Ni2+) ion and form a coordination complex in crimson red. By the use of the manufactured 2-dimensional DMG-Ir nanosheet, the problem of poor reactivity of the conventional method for detecting the Ni2+ ion using DMG can be solved. The method for manufacturing 2-dimensional DMG-Ir nanosheet includes promoting the reaction between iridium (Ir) salt and DMG in a basic environment. Preferably, the promotion of the reaction between the Ir salt and DMG includes dissolving the Ir salt and DMG in an alkaline aqueous solution to form a mixture. The mixture is probe sonicated for a predetermined time with a pulse on time and a pulse off time, and a hydrothermal reaction is further carried out to the resulted mixture. The 2-dimensional DMG-Ir nanosheet manufactured by the method and a colorimetric system are also disclosed.

Abstract: A method of manufacturing a titanium dioxide nanomaterial according to the present invention comprises: mixing a titanium (III) chloride solution, ethanol, and a sodium chloride solution to obtain a solution to be sonicated; performing probe ultrasonication to the solution to be sonicated with an opening time and a pulse closing time for a sonicating time at a power of 45 W to 55 W and under a temperature of 23° C. to 27° C. to obtain a reaction solution; adding deionized water dropwise into the reaction solution with a predetermined adding rate, and gradually increasing the temperature of the reaction solution to 80° C. with a predetermined ramping rate to obtain a solution to be centrifuged; and centrifuging the solution to be centrifuged to separate a precipitate, wherein the precipitate includes the titanium dioxide nanomaterial.

Abstract: A method for fabricating microelectromechanical systems containing a glass diaphragm formed on a silicon macrostructure is disclosed. The method comprises the steps of: (a) obtaining a silicon wafer and forming a cavity in the silicon wafer; (b) using a flame hydrolysis deposition technique to deposite glass soot into the cavity, the glass soot fills the cavity and extends onto the external surface of the silicon wafer so as to form a glass soot layer having a predetermined thickness; and (c) heat-consolidating the glass soot at temperatures between 850.degree. and 1,350.degree. C. so as to cause the glass soot to shrink and form a glass diaphragm over the cavity. The shrinkage ratio between the glass diaphragm and the glass soot layer is between 1:20 to 1:50. The silicon wafer can be further fabricated to contain a diaphragm-sealed cavity and/or a diaphragm-converted cantilever.