Patents by Inventor Huirong Yao

Huirong Yao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antireflective Coating Compositions
    Publication number: 20100009297
    Abstract: Antireflective coatings and related polymers are disclosed.
    Type: Application
    Filed: July 8, 2008
    Publication date: January 14, 2010
    Inventors: Huirong Yao, Guanyang Lin, Jian Yin, Hengpeng Wu, Mark Neisser, Ralph Dammel
  • Antireflective composition for photoresists
    Patent number: 7638262
    Abstract: The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, A is a nonaromatic linking moiety, R? and R? are independently selected from hydrogen, Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbyl linking moiety, and, Y? is independently a (C1-C20) hydrocarbyl linking moiety. The invention further relates to a process for imaging the antireflective coating composition.
    Type: Grant
    Filed: August 10, 2006
    Date of Patent: December 29, 2009
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Hengpeng Wu, Zhong Xiang, Hong Zhuang, Jianhui Shan, Jian Yin, Huirong Yao, PingHung Lu
  • Antireflective Coating Composition and Process Thereof
    Publication number: 20090130591
    Abstract: The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer, where, R1 to R8 are independently selected from hydrogen and C1-C4 alkyl, W1 is a fully or partially fluorinated alkylene group, X is selected from F, H and OH; W2 comprises a chromophore group, and W3 Y comprises a crosslinking site. The invention also relates to a process for using the antireflective coating composition.
    Type: Application
    Filed: November 21, 2007
    Publication date: May 21, 2009
    Inventors: Huirong Yao, Zhong Xiang, Jian Yin, Weihong Liu
  • Underlayer Coating Composition Based on a Crosslinkable Polymer
    Publication number: 20090035704
    Abstract: The present invention relates to an underlayer coating composition capable of being crosslinked comprising a polymer, a compound capable of generating a strong acid, and optionally a crosslinker, where the polymer comprises at least one absorbing chromophore and at least one moiety selected from an epoxy group, an aliphatic hydroxy group and mixtures thereof. The invention further relates to a process of imaging the underlayer coating compositions.
    Type: Application
    Filed: August 3, 2007
    Publication date: February 5, 2009
    Inventors: Hong Zhuang, Huirong Yao, Hengpeng Wu, Mark Neisser, Weihong Liu, Jianhui Shan, Zhong Xiang
  • Organic bottom antireflective polymer compositions
    Patent number: 7470500
    Abstract: The present invention relates to bottom antireflective coating compositions, polymers useful in making such compositions, and their use in image processing by forming a thin layer between a reflective substrate and a photoresist coating.
    Type: Grant
    Filed: July 19, 2005
    Date of Patent: December 30, 2008
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Huirong Yao, Shuji S. Ding-Lee
  • Antireflective composition for photoresists
    Publication number: 20080038659
    Abstract: The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, A is a nonaromatic linking moiety, R? and R? are independently selected from hydrogen, Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbyl linking moiety, and, Y? is independently a (C1-C20) hydrocarbyl linking moiety. The invention further relates to a process for imaging the antireflective coating composition.
    Type: Application
    Filed: August 10, 2006
    Publication date: February 14, 2008
    Inventors: Hengpeng Wu, Zhong Xiang, Hong Zhuang, Jianhui Shan, Jian Yin, Huirong Yao, PingHung Lu
  • New organic bottom antireflective polymer compositions
    Publication number: 20070020557
    Abstract: The present invention relates to bottom antireflective coating compositions, polymers useful in making such compositions, and their use in image processing by forming a thin layer between a reflective substrate and a photoresist coating.
    Type: Application
    Filed: July 19, 2005
    Publication date: January 25, 2007
    Inventors: Huirong Yao, Shuji Ding-Lee
  • Bottom antireflective coatings
    Patent number: 7030201
    Abstract: The present invention relates to bottom antireflective coating compositions and polymers useful in making such compositions.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: April 18, 2006
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Huirong Yao, Shuji Ding-Lee, Hengpeng Wu, Zhong Xiang
  • Bottom antireflective coatings
    Publication number: 20050112494
    Abstract: The present invention relates to bottom antireflective coating compositions and polymers useful in making such compositions.
    Type: Application
    Filed: November 26, 2003
    Publication date: May 26, 2005
    Inventors: Huirong Yao, Shuji Ding-Lee, Hengpeng Wu, Zhong Xiang