Patents by Inventor Hun-hwan Ha

Hun-hwan Ha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8027017
    Abstract: The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.
    Type: Grant
    Filed: January 15, 2009
    Date of Patent: September 27, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ju-A Ryu, Jeong-Heung Kong, Yang-Koo Lee, Hun-Hwan Ha, Yo-Han Ahn, Hweon Jin, Myung-Ki Lee
  • Publication number: 20090180086
    Abstract: The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.
    Type: Application
    Filed: January 15, 2009
    Publication date: July 16, 2009
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ju-A Ryu, Jeong-Heung Kong, Yang-Koo Lee, Hun-Hwan Ha, Yo-Han Ahn, Hweon Jin, Myung-Ki Lee
  • Patent number: 6398430
    Abstract: A semiconductor device fabrication system for carrying out a UV-bake on a photoresist pattern in the semiconductor device pattern formation, includes a photoresist coating unit coating a wafer with a specific photoresist; a developing unit forming a photoresist pattern on the wafer coated with the photoresist; and a cross-linking and flow baking unit for cross-linking the photoresist pattern and subsequently flow baking the cross-linked photoresist pattern, wherein the cross-linking and flow baking unit thermally stabilizes the photoresist pattern prior to flow baking.
    Type: Grant
    Filed: August 8, 2000
    Date of Patent: June 4, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Gyu-chan Jeoung, Kwang-seok Choi, Jin-hang Jung, Young-sun Kim, Hong Lee, Hoe-sik Chung, Sung-ho Lee, Hun-hwan Ha
  • Patent number: 6358672
    Abstract: There are provided a semiconductor device fabrication system for carrying out a UV-bake on a photoresist pattern in the semiconductor device pattern formation, a method of forming a semiconductor device pattern using the same, and a photoresist formed thereby. The semiconductor device fabrication system includes a photoresist coating unit coating a wafer with a specific photoresist; a developing unit forming a photoresist pattern on the wafer coated with the photoresist; and a cross-linking unit cross-linking the photoresist pattern to provide a stabilized flow during the flow process for the photoresist pattern. The method of forming a semiconductor device pattern includes: coating a wafer with a photoresist; aligning a photo mask on the photoresist, and carrying out an exposure; forming a photoresist pattern on the wafer; carrying out a cross-linking of the photoresist pattern; and carrying out a flow bake for the photoresist pattern after the cross-linking.
    Type: Grant
    Filed: November 16, 1998
    Date of Patent: March 19, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Gyu-chan Jeoung, Kwang-seok Choi, Jin-hang Jung, Young-sun Kim, Hong Lee, Hoe-sik Chung, Sung-ho Lee, Hun-hwan Ha
  • Publication number: 20010053500
    Abstract: There are provided a semiconductor device fabrication system for carrying out a UV-bake on a photoresist pattern in the semiconductor device pattern formation, a method of forming a semiconductor device pattern using the same, and a photoresist formed thereby. The semiconductor device fabrication system includes a photoresist coating unit coating a wafer with a specific photoresist; a developing unit forming a photoresist pattern on the wafer coated with the photoresist; and a cross-linking unit cross-linking the photoresist pattern to provide a stabilized flow during the flow process for the photoresist pattern. The method of forming a semiconductor device pattern includes: coating a wafer with a photoresist; aligning a photo mask on the photoresist, and carrying out an exposure; forming a photoresist pattern on the wafer; carrying out a cross-linking of the photoresist pattern; and carrying out a flow bake for the photoresist pattern after the cross-linking.
    Type: Application
    Filed: November 16, 1998
    Publication date: December 20, 2001
    Inventors: GYU-CHAN JEOUNG, KWANG-SEOK CHOI, JIN-HANG JUNG, YOUNG-SUN KIM, HONG LEE, HOE-SIK CHUNG, SUNG-HO LEE, HUN-HWAN HA