Patents by Inventor Hung-Chi Hsiao

Hung-Chi Hsiao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11923405
    Abstract: The present disclosure is directed to a semiconductor device. The semiconductor device includes a substrate, an insulating layer disposed on the substrate, a first conductive feature disposed in the insulating layer, and a capacitor structure disposed on the insulating layer. The capacitor structure includes a first electrode, a first dielectric layer, a second electrode, a second dielectric layer, and a third electrode sequentially stacked. The semiconductor device also includes a first via connected to the first electrode and the third electrode, a second via connected to the second electrode, and a third via connected to the first conductive feature. A part of the first via is disposed in the insulating layer. A portion of the first conductive feature is directly under the capacitor structure.
    Type: Grant
    Filed: May 23, 2022
    Date of Patent: March 5, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Chih-Fan Huang, Hung-Chao Kao, Yuan-Yang Hsiao, Tsung-Chieh Hsiao, Hsiang-Ku Shen, Hui-Chi Chen, Dian-Hau Chen, Yen-Ming Chen
  • Patent number: 11862938
    Abstract: Provided is a semiconductor laser diode, including a GaAs/In P substrate and a multi-layer structure on the GaAs/InP substrate. The multi-layer structure includes a lower epitaxial region, an active region and an upper epitaxial region. The active region comprises a first active layer, an epitaxial region and a second active layer, the epitaxial region is disposed between the first active layer and the second active layer, the first active layer comprises one or more quantum well structures or one or more quantum dot structures, and the second active layer comprises one or more quantum well structures or one or more quantum dot structures.
    Type: Grant
    Filed: June 11, 2020
    Date of Patent: January 2, 2024
    Assignee: VISUAL PHOTONICS EPITAXY CO., LTD.
    Inventors: Chao-Hsing Huang, Yu-Chung Chin, Van-Truong Dai, Jhao-Hang He, Hung-Chi Hsiao
  • Publication number: 20230125582
    Abstract: The subject invention relates to two-stage inoculation and two-stage fermentation process which are performed by the inoculation time difference and staged fermentation. In the first stage, yeast, lactic acid bacteria and Acetobacter aceti are inoculated into a fermentation tank to perform primary fermentation to produce primary fermented material. In the second stage, yeast is added into the primary fermented material in a container to perform the secondary fermentation to produce secondary fermented material, and then the secondary fermented material is pasteurized to deactivate yeast, lactic acid bacteria and Acetobacter aceti in the container and stop fermentation reaction. Finally, the secondary fermented material is cooled to ambient temperature to prepare the kombucha fermented beverage preserving active fermentative bacteria and enzyme at ambient temperature. The invention is help to improve the preservation convenience of the kombucha fermented beverage and avoid excessive alcohol concentration.
    Type: Application
    Filed: September 19, 2022
    Publication date: April 27, 2023
    Inventors: Yu-Fen WANG, Kwan-Han CHEN, Hung-Chi HSIAO, Meng-Hsuan CHUANG, Yen-Chung CHEN, Yu-Shin CHEN, Pi-Feng TSAO, Chun-En GAO
  • Publication number: 20220400695
    Abstract: Disclosed herein is a process for producing a peanut milk product, which includes subjecting a milk material to a hydrolysis reaction with lactase and transglucosidase to obtain a milk product, immersing peanut kernels in water to obtain swelled peanut kernels, subjecting the swelled peanut kernels to a steam cooking treatment to obtain steamed peanut kernels, and admixing the milk product with the steamed peanut kernels, followed by subjecting a mixture thus obtained to a heating treatment, so as to obtain the peanut milk product. A method for improving gut health using the peanut milk product and a canned food containing the peanut milk product are also disclosed.
    Type: Application
    Filed: June 17, 2022
    Publication date: December 22, 2022
    Inventors: Kwan-Han CHEN, Hung-Chi HSIAO, Chun-Liang CHOU, Li-Chueh HUANG, Yun-Wen CHEN, Pei-Hsiu HUANG
  • Publication number: 20220338496
    Abstract: The present invention relates to an oligo-saccharide oat liquid composition, an oligo-saccharide oat powder composition and an oligo-saccharide oat drink having improved properties and immunomodulatory efficacy (for example, promotion of proliferation of immune cells), a micro-milling process involving quadri-enzyme hydrolysis for preparing the same, and uses thereof.
    Type: Application
    Filed: April 21, 2022
    Publication date: October 27, 2022
    Inventors: Kwan-Han CHEN, HUNG-CHI HSIAO, CHUN-LIANG CHOU, HAI-FENG CHANG, YI-SHIAN WANG, YUN-WEN CHEN, PEI-HSIU HUANG, PEI-CHEN HSIEH
  • Publication number: 20200395737
    Abstract: Provided is a semiconductor laser diode. Although the materials used in the conventional technology can reduce the strain, the selections of materials are relatively limited and the carrier confinement ability is not good. To solve the above-mentioned problems, a phosphorus-containing semiconductor layer is provided in a laser diode. As such, it can effectively reduce the strain of the active region or the total strain of the laser diode, and improve the carrier confinement capability of the active region. Therefore, it can effectively reduce the total strain or significantly improve carrier confinement under appropriate conditions of the laser diode. In some cases, it has the aforesaid effects. The phosphorus-containing semiconductor layer is suitable for an active region with one or more active layers. Especially after the phosphorus-containing semiconductor layer is provided in the active region with multiple active layers, high temperature performance are significantly improved or enhanced.
    Type: Application
    Filed: June 11, 2020
    Publication date: December 17, 2020
    Inventors: Chao-Hsing Huang, Yu-Chung Chin, Van-Truong Dai, Jhao-Hang He, Hung-Chi Hsiao
  • Publication number: 20190090502
    Abstract: Disclosed herein is a whole-bean soymilk having an increased level of deglycosylated soy isoflavones and a method of preparing thereof. The method includes the steps of subjecting a mixture of a soybean material and water to a comminution treatment so as to obtain a soybean slurry, subjecting the soybean slurry to an enzymatic hydrolysis treatment using a ?-glucosidase to obtain a hydrolysate, and subjecting the hydrolysate to a media milling treatment using a milling medium.
    Type: Application
    Filed: September 11, 2018
    Publication date: March 28, 2019
    Inventors: Kwan-Han CHEN, Hung-Chi HSIAO, Hui-Min LAI, Chien-Yu CHEN, Chia-Ching LI, Yi-Shian WANG, Ming-Chi TSAI
  • Publication number: 20160049502
    Abstract: Provided is a heterojunction bipolar transistor (HBT), including a GaAs substrate; a subcollector layer stacked on the GaAs substrate, wherein a part of or all of the subcollector layer is formed by N-type group III-V semiconductors doped by at least Te and/or Se; a blocking layer structure directly or indirectly stacked on the subcollector layer, and formed by N-type group III-V semiconductors doped by at least group IV elements, a collector layer stacked on the blocking layer structure, and formed by N-type group III-V semiconductors; a base layer stacked on the collector layer, and formed by P-type group III-V semiconductors; an emitter layer stacked on the base layer and formed by N-type group III-V semiconductors; an emitter cap layer stacked on the emitter layer and formed by N-type group III-V semiconductors; and an ohmic contact layer stacked on the emitter cap layer and formed by N-type group III-V semiconductors.
    Type: Application
    Filed: May 15, 2015
    Publication date: February 18, 2016
    Inventors: Yu-Chung Chin, Chao-Hsing Huang, Hung-Chi Hsiao
  • Patent number: 5721146
    Abstract: An method for the fabrication of an improved polysilicon buried contact is described. The contact is formed within a trench etched into the silicon substrate. The effective area of the contact is thereby increased over the conventional planar buried contact by an amount equal to the area of the trench walls. For sub-micron sized buried contacts and trenches 1000 to 3000 Angstroms deep this area can be twice that of the conventional planar buried contact. Contacts formed in this fashion are particularly beneficial in the manufacture of static-random-access memory devices(SRAMs) through their application with local-interconnects. They afford a lower contact resistance, manifested by the greater effective contact area, as well as a much reduced risk of open or high resistive contacts due to photomask mis-alignment. The presence of the trench also results in a higher junction capacitance which affords a reduction in soft-error-rates, a notable concern for memory devices.
    Type: Grant
    Filed: April 29, 1996
    Date of Patent: February 24, 1998
    Assignee: Taiwan Semiconductor Manufacturing Company Ltd
    Inventors: Jhon-Jhy Liaw, Jin-Yuan Lee, Hung-Chi Hsiao