Abstract: A hinge includes a second connector having a hollow pivotal device of which a peripheral outside protrudes outward to form a locking rib, and a first connector having a pivotal sleeve which is pivotally sleeved to the pivotal device to make the first connector rotatable relative to the second connector. The locking rib is able to slide along and abut against a peripheral inside of the pivotal sleeve to produce friction resistance force therebetween for positioning the first connector at any inclined angle relative to the second connector. A fastening pin is disposed in the pivotal device of the second connector and spaced from a peripheral inside of the pivotal device so that can make the pivotal device pressed inward to produce an outward elasticity to strengthen the friction resistance force between the locking rib and the peripheral inside of the pivotal sleeve.

Abstract: A hinge includes a second connector having a pintle of which a locating rib is protruded at a peripheral outside, and a first connector which includes a pivotal sleeve sleeved to the pintle and defining a slot to break off the pivotal sleeve for locking the locating rib therein, a coupling flap and a locating strip spaced from each other in a parallel relation and connected with two opposite edges of the slot respectively. The locating rib can further slide along and abut against a peripheral inside of the pivotal sleeve to produce friction resistance force therebetween for positioning the first connector at any inclined angle relative to the second connector. A fastening element holds the locating strip and the coupling flap together and can adjust a space between the locating strip and the coupling flap to further regulate the friction resistance force.

Abstract: A microphone shell includes a top wall and a side wall extending downwardly from peripheral area of the top wall. A receiving room is formed between the top wall and the side wall for containing a microphone soldered with a printed circuit board, and a through hole arranged on center of the top wall. Voice is transmitted only through the through hole and gathered in the receiving room of the microphone shell, and then received by the microphone. In addition the microphone receives no external noise because the microphone shell covers the microphone and obstructs the external noise. Therefore, the microphone shell not only gathers voice but also obstructs noise.

Abstract: A loudspeaker according to the present invention includes a frame body, a leading wire board disposed underneath the frame body, a magnet mounted in the frame body, a pad ring glued on an edge of the frame body, a diaphragm whose exterior rim is glued on the pad ring and a voice coil assembled in the frame body and surrounding the magnet. A top of the voice coil is adhered to a bottom of the diaphragm and two free ends of the voice coil are soldered to the leading wire board. The pad ring is made of plastic material.

Abstract: A loudspeaker includes a basket defining a center hole therethrough, a conduction wire board fixed to the bottom surface of the basket, a magnet placed on the basket, a diaphragm arranged on the basket and above the magnet, and a voice coil. The conduction wire board defines a core hole corresponding to the center hole, and two welding foils on the bottom surface. The magnet defines a through hole corresponding to the center hole. The voice coil is wrapped around the magnet and fixed to the bottom of the diaphragm. The voice coil has leading wires, which bend inward at the top and downward pass through the through hole of the magnet, the center hole of the basket and the core hole of the conduction wire board, and then extend toward two sides of the rivet for being welded on the corresponding welding foils.

Abstract: A device and a method for testing an exposure apparatus is disclosed. A testing device includes a substrate, and a plurality of block patterns, each of which has a top area varying with an area of a shot region of the exposure apparatus, having at least two different heights located on the substrate. Additionally, the method for testing an exposure apparatus includes using the exposure apparatus to perform an exposure process on the testing device or on the testing device having a photoresist layer thereon, and testing the performance of the exposure apparatus through comparing surface information of the testing device computed by the exposure apparatus with actual surface information of the testing device or through examining photoresist patterns formed on the testing device.

Abstract: A microphone shell includes a top wall and a side wall extending downwardly from peripheral area of the top wall. A receiving room is formed between the top wall and the side wall for containing a microphone soldered with a printed circuit board, and a through hole arranged on center of the top wall. Voice is transmitted only through the through hole and gathered in the receiving room of the microphone shell, and then received by the microphone. In addition the microphone receives no external noise because the microphone shell covers the microphone and obstructs the external noise. Therefore, the microphone shell not only gathers voice but also obstructs noise.

Abstract: A device and a method for testing an exposure apparatus is disclosed. A testing device includes a substrate, and a plurality of block patterns, each of which has a top area varying with an area of a shot region of the exposure apparatus, having at least two different heights located on the substrate. Additionally, the method for testing an exposure apparatus includes using the exposure apparatus to perform an exposure process on the testing device or on the testing device having a photoresist layer thereon, and testing the performance of the exposure apparatus through comparing surface information of the testing device computed by the exposure apparatus with actual surface information of the testing device or through examining photoresist patterns formed on the testing device.

Abstract: A device and a method for testing an exposure apparatus is disclosed. A testing device includes a substrate, and a plurality of block patterns, each of which has a top area varying with an area of a shot region of the exposure apparatus, having at least two different heights located on the substrate. Additionally, the method for testing an exposure apparatus includes using the exposure apparatus to perform an exposure process on the testing device or on the testing device having a photoresist layer thereon, and testing the performance of the exposure apparatus through comparing surface information of the testing device computed by the exposure apparatus with actual surface information of the testing device or through examining photoresist patterns formed on the testing device.

Abstract: The present invention discloses a tool for cleaning particles from a wafer stage, comprising: a main body, a driving device, a power supply, and a cleaning module composed of a rotary base, a turntable, and an elastic member, wherein the main body is designed to be extendable, having a accommodating space disposed at the front thereof, and the driving device is arranged in the accommodating space for driving the cleaning module, and the power supply is coupled to the driving device for providing power to the same. Moreover, the rotary base is connected to the turntable by way of the elastic member, so that the driving device can drive the turntable to rotate for cleaning the wafer stage. A plurality turntables of different characteristic can be selected to be used in the cleaning module of the invention with respect to different cleaning requirement and environment.

Abstract: A device and a method for testing an exposure apparatus is disclosed. A testing device includes a substrate, and a plurality of block patterns, each of which has a top area varying with an area of a shot region of the exposure apparatus, having at least two different heights located on the substrate. Additionally, the method for testing an exposure apparatus includes using the exposure apparatus to perform an exposure process on the testing device or on the testing device having a photoresist layer thereon, and testing the performance of the exposure apparatus through comparing surface information of the testing device computed by the exposure apparatus with actual surface information of the testing device or through examining photoresist patterns formed on the testing device.

Abstract: A photolithography system applied to the semiconductor process includes a light source, a shutter set, and a lens set. The shutter set has a variable opening area. The shutter set can include a plurality of triple-blade shutters and utilizes step motors to adjust the relative positions of the triple-blade shutters. The opening area is adjusted in accordance with the intensity of the light source or the required dose.

Abstract: The present invention provides a support stand. The support stand includes at least one H-beam set between a light source of an exposure machine and an operating machine of that to support an optical axis of the exposure machine, at least one supporting element set on a first part of the H-beam, a signal emitter set on a second part of the H-beam, and a signal receiver, receiving a signal sent from the signal emitter, set on a third part of the H-beam. The signal emitter and the signal receiver are used for detecting an optical axis shift.