Patents by Inventor Hung-Chun YU

Hung-Chun YU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Para-phenylenediamine derivative, 1,4-cyclohexyldiamine derivative, and fabricating method for 1,4-diamine cyclic compound derivative
    Patent number: 11851387
    Abstract: A fabricating method for a 1,4-diamine cyclic compound derivative includes: performing a first thermal process to form a first compound, in which the first compound has a structure represented by formula (i): in which R represents a C1 to C12 hydrocarbon group; performing a second thermal process, which includes performing a reduction reaction on the first compound to form a second compound, in which the second compound has a structure represented by formula (ii), and performing a third thermal process, which includes performing a reduction reaction on the second compound to form the 1,4-diamine cyclic compound derivative, in which the 1,4-diamine cyclic compound derivative has a structure represented by formula (I) or formula (II): in which R represents a C1 to C12 hydrocarbon group, in which R represents a C1 to C12 hydrocarbon group.
    Type: Grant
    Filed: July 11, 2022
    Date of Patent: December 26, 2023
    Assignee: Yuanhan Materials Inc.
    Inventors: En Ming Chang, Hung-Chun Yu, Feng-Chao Yu
  • para-PHENYLENEDIAMINE DERIVATIVE, 1,4-CYCLOHEXYLDIAMINE DERIVATIVE, AND FABRICATING METHOD FOR 1,4-DIAMINE CYCLIC COMPOUND DERIVATIVE
    Publication number: 20230075418
    Abstract: A fabricating method for a 1,4-diamine cyclic compound derivative includes: performing a first thermal process to form a first compound, in which the first compound has a structure represented by formula (i): in which R represents a C1 to C12 hydrocarbon group; performing a second thermal process, which includes performing a reduction reaction on the first compound to form a second compound, in which the second compound has a structure represented by formula (ii), and performing a third thermal process, which includes performing a reduction reaction on the second compound to form the 1,4-diamine cyclic compound derivative, in which the 1,4-diamine cyclic compound derivative has a structure represented by formula (I) or formula (II): in which R represents a C1 to C12 hydrocarbon group, in which R represents a C1 to C12 hydrocarbon group.
    Type: Application
    Filed: July 11, 2022
    Publication date: March 9, 2023
    Inventors: En Ming CHANG, Hung-Chun YU, Feng-Chao YU
  • ENVIRONMENTALLY FRIENDLY PHOTORESIST REMOVING COMPOSITION AND METHOD FOR USING THE SAME
    Publication number: 20230038651
    Abstract: An environmentally friendly photoresist removing composition includes 20 parts by weight to 80 parts by weight of a carbonate compound, 0.5 parts by weight to 15 parts by weight of a hydramine compound, an amide compound, or an ammonium compound, 1 part by weight to 20 parts by weight of an organic base compound, and 2 parts by weight to 70 parts by weight of an alcohol ether compound.
    Type: Application
    Filed: July 25, 2022
    Publication date: February 9, 2023
    Inventors: Sheng-Chun SHA, Hung-Chun YU, Feng-Chao YU, En-Ming CHANG