Patents by Inventor Hung-Eli Kim

Hung-Eli Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Two mask photoresist exposure pattern for dense and isolated regions
    Patent number: 6803178
    Abstract: There is provided a method of making plurality of features in a first layer. A photoresist layer is formed over the first layer. Dense regions in the photoresist layer are exposed through a first mask under a first set of illumination conditions. Isolated regions in the photoresist layer are exposed through a second mask different from the first mask under a second set of illumination conditions different from the first set of illumination conditions. The exposed photoresist layer is patterned and then the first layer is patterned using the patterned photoresist layer as a mask.
    Type: Grant
    Filed: June 25, 2001
    Date of Patent: October 12, 2004
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Ramkumar Subramanian, Scott A. Bell, Todd P. Lukanc, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eli Kim