Patents by Inventor Hung-ho Ko

Hung-ho Ko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PAA-based etchant, methods of using same, and resultant structures
    Patent number: 7709277
    Abstract: A wet-etch composition may include: peracetic acid (PAA); and a fluorinated acid; a relative amount of the PAA in the composition being sufficient to ensure an etch rate of (P-doped-SiGe):(P-doped-Si) that is substantially the same as an etch rate of (N-doped-SiGe):(N-doped-Si). Such a wet-etch composition is hereafter referred to as a PAA-based etchant and can be used to make, e.g., a CMOS MBCFET, an electrode of a capacitor, etc.
    Type: Grant
    Filed: November 16, 2006
    Date of Patent: May 4, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyo-san Lee, Hung-ho Ko, Chang-ki Hong, Sang-jun Choi