Abstract: An aircraft flight attitude display device includes a central processing unit (CPU), a display unit electrically connected to the CPU for showing an aircraft image therein, a flight data receiver unit electrically connected to the CPU, a sky obstacle data receiver unit electrically to the CPU, a ground obstacle data receiver unit electrically connected to the CPU, and a power supply unit electrically connected to the CPU.

Abstract: An aircraft auxiliary display system for avoiding spatial disorientation includes a central processing unit (CPU), a sensing module, an activation display unit and an electro-optical visual unit. The CPU includes a storage unit and is electrically connected to the activation display unit. The sensing module is electrically connected to the CPU and includes a flight data sensing unit. The activation display unit is electrically connected to the electro-optical visual unit.

Abstract: An aircraft flight attitude display device includes a central processing unit (CPU), a display unit electrically connected to the CPU for showing an aircraft image therein, a flight data receiver unit electrically connected to the CPU, a sky obstacle data receiver unit electrically to the CPU, a ground obstacle data receiver unit electrically connected to the CPU, and a power supply unit electrically connected to the CPU. With these arrangements, the aircraft flight attitude display device aids a pilot in making quick and correct judgment about the aircraft flight attitude relative to the sky and the ground, so as to upgrade the aviation safety.

Abstract: An aircraft flight attitude display device includes a central processing unit (CPU), a display unit electrically connected to the CPU for showing an aircraft image therein, a flight data receiver unit electrically connected to the CPU, a sky obstacle data receiver unit electrically to the CPU, a ground obstacle data receiver unit electrically connected to the CPU, and a power supply unit electrically connected to the CPU. With these arrangements, the aircraft flight attitude display device aids a pilot in making quick and correct judgment about the aircraft flight attitude relative to the sky and the ground, so as to upgrade the aviation safety.

Abstract: A workpiece-transporting apparatus of in-line sputtering machine includes a conveyer unit and a carrying salver. The conveyer unit has a holder, and a transporting wheel group is arranged in the holder. A conveyer belt covers around the transporting wheel group. A driving wheel group is arranged in one side of the conveyer belt and located in the holder. The driving wheel group connects to a motor and surrounded by a connecting belt. The carrying salver is placed on the conveyer belt of the conveyer unit. The carrying salver has a base, a plurality of supporting shafts are assembled in the base and linked together for being driven together. A workpiece base is arranged on the supporting shafts. At least one of the supporting shafts is surrounded by a supporting wheel. The supporting wheel engages with the connecting belt for being driven by the connecting belt.

Abstract: A workpiece-transporting apparatus of in-line sputtering machine includes a conveyer unit and a carrying salver. The conveyer unit has a holder, and a transporting wheel group is arranged in the holder. A conveyer belt covers around the transporting wheel group. A driving wheel group is arranged in one side of the conveyer belt and located in the holder. The driving wheel group connects to a motor and surrounded by a connecting belt. The carrying salver is placed on the conveyer belt of the conveyer unit. The carrying salver has a base, a plurality of supporting shafts are assembled in the base and linked together for being driven together. A workpiece base is arranged on the supporting shafts. At least one of the supporting shafts is surrounded by a supporting wheel. The supporting wheel engages with the connecting belt for being driven by the connecting belt.

Abstract: A method for removing black silicon in semiconductor fabrication is disclosed. First, a trench is formed in a semiconductor substrate having a pad dielectric layer and a hard mask layer. Then, the hard mask layer is removed. A photoresist layer covers the trench and only black silicon created at the edge of the semiconductor substrate during formation of the trench is left uncovered. Finally, the black silicon is removed.