Abstract: A lamination carrier is used in a lamination method of a display device. The display device includes a first component, a second component and an adhesive layer. The first component includes a transparent portion and an opaque portion surrounding the transparent portion. The adhesive layer is disposed between the first component and the second component, and is distributed on the transparent portion and the opaque portion. The lamination carrier includes a base plate and a light-guiding structure having a reflecting surface that extends upwardly and outwardly from the base plate and that is disposed to reflect light to the adhesive layer distributed on the opaque portion of the first component. A lamination method is also disclosed.

Abstract: A display displays a plurality of sequential image; each sequential image of the plurality of sequential images has corresponding gratings. When the display displays the sequential image of the plurality of sequential images, the gratings are turned on. When the display displays another sequential image of the plurality of sequential images, the gratings are turned off.

Abstract: A storage capacitor having a scattering effect is positioned in a substrate for use in a thin film transistor array loop. The storage capacitor is characterized by having a rough layer overlapped by a medium layer and a passivation layer. The storage capacitor further has a reflective layer with high reflectivity so as to provide the storage capacitor with the scattering effect toward an external light source. A method of manufacturing the storage capacitor by two photolithography processes is also shown.

Abstract: A backlight unit is disclosed. The backlight unit contains a light-generating device and a polarization conversion apparatus, wherein the polarization conversion apparatus acts as the top substrate of the light-generating device. The polarization conversion apparatus converts natural light originating from the light-generating device into polarized light of a predetermined polarization. Therefore, the backlight unit of the present invention is capable of providing polarized light.

Abstract: An optical-interference type display panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple first conductive optical film stacks, supporting layers and multiple second conductive optical film stacks are formed. The substrate further has a plurality of connecting pads consisting of a transparent conductive film of the first conductive optical film stacks. Since the transparent conductive film is made of indium tin oxide, these connecting pads have the excellent anti-oxidation ability at their surface.

Abstract: The method for fabricating reflector plate for a reflective liquid crystal display and the device is disclosed. The present invention includes the formation of a protection layer over the glass substrate having thin film transistors and a layer of transparent electrodes on top, followed by the formation of a layer of undulating resin over the protection layer. If the reflector plate to be produced is a semi-transmissive type, a light-transmitting region is created over the protection layer. Since the protection layer is created in advance of the undulating resin outgrowth, the present method can effectively prevent reflection from the exposure stage during the lithography process, thus the problem of abnormal pattern marks occurring on the reflective surface can be avoided, and the exposure time and the production yield are enhanced.

Abstract: A structure of an ultra-micro reflector having abrasive surface with tapered micro bumps and free of resin layer and its fabrication method are provided. The reflector structure comprises mainly a layer of reflector metal, a scattering element with abrasive surface, and a layer of ITO. The abrasive surface has many tapered micro bumps. The reflector structure can be applied to a reflective or partially reflective LCD to achieve optimal performance. It makes the scattering angle of the reflective light source wider and more uniform. The variation of the gap of liquid crystal cells is greatly reduced, so that the reflective efficiency can be kept in an optimal condition. The reflector structure has larger scattering angle, smooth effect, and very good anti-glare effect. The fabrication process of the reflector structure is simple. The material cost for the abrasive surface is inexpensive.

Abstract: The method for fabricating reflector plate for a reflective liquid crystal display and the device is disclosed. The present invention includes the formation of a protection layer over the glass substrate having thin film transistors and a layer of transparent electrodes on top, followed by the formation of a layer of undulating resin over the protection layer. If the reflector plate to be produced is a semi-transmissive type, a light-transmitting region is created over the protection layer. Since the protection layer is created in advance of the undulating resin outgrowth, the present method can effectively prevent reflection from the exposure stage during the lithography process, thus the problem of abnormal pattern marks occurring on the reflective surface can be avoided, and the exposure time and the production yield are enhanced.

Abstract: The method for fabricating reflector plate for a reflective liquid crystal display and the device is disclosed. The present invention includes the formation of a protection layer over the glass substrate having thin film transistors and a layer of transparent electrodes on top, followed by the formation of a layer of undulating resin over the protection layer. If the reflector plate to be produced is a semi-transmissive type, a light-transmitting region is created over the protection layer. Since the protection layer is created in advance of the undulating resin outgrowth, the present method can effectively prevent reflection from the exposure stage during the lithography process, thus the problem of abnormal pattern marks occurring on the reflective surface can be avoided, and the exposure time and the production yield are enhanced.

Abstract: A storage capacitor having a scattering effect is positioned in a substrate for use in a thin film transistor array loop. The storage capacitor is characterized by having a rough layer overlapped by a medium layer and a passivation layer. The storage capacitor further has a reflective layer with high reflectivity so as to provide the storage capacitor with the scattering effect toward an external light source. A method of manufacturing the storage capacitor by two photolithography processes is also shown.

Abstract: A storage capacitor having a scattering effect is positioned in a substrate for use in a thin film transistor array loop. The storage capacitor is characterized by having a rough layer overlapped by a medium layer and a passivation layer. The storage capacitor further has a reflective layer with high reflectivity so as to provide the storage capacitor with the scattering effect toward an external light source. A method of manufacturing the storage capacitor by two photolithography processes is also shown.

Abstract: A structure of an ultra-micro reflector having abrasive surface with tapered micro bumps and free of resin layer and its fabrication method are provided. The reflector structure comprises mainly a layer of reflector metal, a scattering element with abrasive surface, and a layer of ITO. The abrasive surface has many tapered micro bumps. The reflector structure can be applied to a reflective or partially reflective LCD to achieve optimal performance. It makes the scattering angle of the reflective light source wider and more uniform. The variation of the gap of liquid crystal cells is greatly reduced, so that the reflective efficiency can be kept in an optimal condition. The reflector structure has larger scattering angle, smooth effect, and very good anti-glare effect. The fabrication process of the reflector structure is simple. The material cost for the abrasive surface is inexpensive.

Abstract: A reflector structure in a multi-domain liquid crystal display comprises an active matrix device structure having regions of various height levels, a diffusing layer, and a structure of multi-domain reflective layer. The diffusing layer is formed above the active matrix device structure with multiple extruded bumps of various film thickness and various heights and shapes. The reflector structure has various reflective angles and reflective effects to improve the quality of LCD panel. It can be used in the reflective layer of a reflective or semi-reflective TN, STN, TFT, or TFD. The reflector fabrication process uses conventional process for a metal or an insulation layer on a TFT substrate to form multiple domains within a pixel area. After forming the cell structure of the multi-domain reflective layer, liquid crystal cells form multiple domains within a pixel area.

Abstract: An optical-interference type display panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple first conductive optical film stacks, supporting layers and multiple second conductive optical film stacks are formed. The substrate further has a plurality of connecting pads consisting of a transparent conductive film of the first conductive optical film stacks. Since the transparent conductive film is made of indium tin oxide, these connecting pads have the excellent anti-oxidation ability at their surface.

Abstract: The method for fabricating reflector plate for a reflective liquid crystal display and the device is disclosed. The present invention includes the formation of a protection layer over the glass substrate having thin film transistors and a layer of transparent electrodes on top, followed by the formation of a layer of undulating resin over the protection layer. If the reflector plate to be produced is a semi-transmissive type, a light-transmitting region is created over the protection layer. Since the protection layer is created in advance of the undulating resin outgrowth, the present method can effectively prevent reflection from the exposure stage during the lithography process, thus the problem of abnormal pattern marks occurring on the reflective surface can be avoided, and the exposure time and the production yield are enhanced.

Abstract: A reflector structure in a multi-domain liquid crystal display comprises an active matrix device structure having regions of various height levels, a diffusing layer, and a structure of multi-domain reflective layer. The diffusing layer is formed above the active matrix device structure with multiple extruded bumps of various film thickness and various heights and shapes. The reflector structure has various reflective angles and reflective effects to improve the quality of LCD panel. It can be used in the reflective layer of a reflective or semi-reflective TN, STN, TFT, or TFD. The reflector fabrication process uses conventional process for a metal or an insulation layer on a TFT substrate to form multiple domains within a pixel area. After forming the cell structure of the multi-domain reflective layer, liquid crystal cells form multiple domains within a pixel area.

Abstract: A reflector structure in a multi-domain liquid crystal display comprises an active matrix device structure having regions of various height levels, a diffusing layer, and a structure of multi-domain reflective layer. The diffusing layer is formed above the active matrix device structure with multiple extruded bumps of various film thickness and various heights and shapes. The reflector structure has various reflective angles and reflective effects to improve the quality of LCD panel. It can be used in the reflective layer of a reflective or semi-reflective TN, STN, TFT, or TFD. The reflector fabrication process uses conventional process for a metal or an insulation layer on a TFT substrate to form multiple domains within a pixel area. After forming the cell structure of the multi-domain reflective layer, liquid crystal cells form multiple domains within a pixel area.

Abstract: A structure of a thin film transistor (TFT) liquid crystal display (LCD) device with a convex structure and a manufacturing method thereof are provided. The manufacturing method includes steps of: providing an insulation substrate; forming a first conductor layer on the insulation substrate; removing portions of the first conductor layer to define a first conductor structure and a first convex structure, wherein the first convex structure is posited on an area of pixel; forming an insulation layer and a semiconductor layer sequentially on the first conductor structure and the insulation substrate having the first conductor layer; removing portions of the semiconductor layer to define a semiconductor structure; forming a second conductor layer on the semiconductor structure; and removing portions of the second conductor layer to define a second conductor structure.