Patents by Inventor Hung-Jen Huang
Hung-Jen Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12149260Abstract: A method and apparatus for decoding a Low-Density Parity-Check (LDPC) code whereby the apparatus comprises an LDPC decoder comprising variable-node calculation circuitry and check-node calculation circuitry: the check-node calculation circuitry is arranged operably to perform a modulo 2 multiplication on a codeword and a parity check matrix to calculate a plurality of first syndromes in a first-stage state. The variable-node calculation circuitry is arranged operably to perform a bit flipping algorithm to generate variable nodes, and calculate soft bits for the variable nodes in a second-stage state. The check-node calculation circuitry is arranged to perform the modulo 2 multiplication on the variable nodes and the parity check matrix to calculate second syndromes in the second-stage. When second syndromes indicate that the previously generated variable nodes are incorrect, a third stage state is repeated until decoding succeeds or a total number of iterations exceeds a threshold.Type: GrantFiled: May 4, 2023Date of Patent: November 19, 2024Assignee: SILICON MOTION, INC.Inventors: Shiuan-Hao Kuo, Hung-Jen Huang
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Patent number: 11862727Abstract: The invention provides a method for fabricating a fin structure for fin field effect transistor, including following steps. Providing a substrate, including a fin structure having a silicon fin and a single mask layer just on a top of the silicon fin, the single mask layer being as a top portion of the fin structure. Forming a stress buffer layer on the substrate and conformally covering over the fin structure. Performing a nitridation treatment on the stress buffer layer to have a nitride portion. Perform a flowable deposition process to form a flowable dielectric layer to cover over the fin structures. Annealing the flowable dielectric layer. Polishing the flowable dielectric layer, wherein the nitride portion of the stress buffer layer is used as a polishing stop.Type: GrantFiled: December 29, 2022Date of Patent: January 2, 2024Assignee: United Microelectronics Corp.Inventors: Hao Che Feng, Hung Jen Huang, Hsin Min Han, Shih-Wei Su, Ming Shu Chiu, Pi-Hung Chuang, Wei-Hao Huang, Shao-Wei Wang, Ping Wei Huang
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Publication number: 20230421175Abstract: The invention relates to a method and an apparatus for decoding a Low-Density Parity-Check (LDPC) code. The method includes the following steps, which is performed by an LDPC decoder including a variable-node calculation circuitry and a check-node calculation circuitry: A first-stage state entering when a codeword has been stored in a static random access memory (SRAM) is detected. The check-node calculation circuitry is arranged operably to perform a modulo 2 multiplication on the codeword and a parity check matrix to calculate a plurality of first syndromes in the first-stage state. A second-stage state is entered when the first syndromes indicate that the codeword obtained in the first-stage state is incorrect. The variable-node calculation circuitry is arranged operably to perform a bit flipping algorithm accordingly to generate variable nodes, and calculate second soft bits for the variable nodes in the second-stage state.Type: ApplicationFiled: May 4, 2023Publication date: December 28, 2023Applicant: Silicon Motion, Inc.Inventors: Shiuan-Hao KUO, Hung-Jen HUANG
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Publication number: 20230135072Abstract: The invention provides a method for fabricating a fin structure for fin field effect transistor, including following steps. Providing a substrate, including a fin structure having a silicon fin and a single mask layer just on a top of the silicon fin, the single mask layer being as a top portion of the fin structure. Forming a stress buffer layer on the substrate and conformally covering over the fin structure. Performing a nitridation treatment on the stress buffer layer to have a nitride portion. Perform a flowable deposition process to form a flowable dielectric layer to cover over the fin structures. Annealing the flowable dielectric layer. Polishing the flowable dielectric layer, wherein the nitride portion of the stress buffer layer is used as a polishing stop.Type: ApplicationFiled: December 29, 2022Publication date: May 4, 2023Applicant: United Microelectronics Corp.Inventors: Hao Che Feng, Hung Jen Huang, Hsin Min Han, Shih-Wei Su, Ming Shu Chiu, Pi-Hung Chuang, Wei-Hao Huang, Shao-Wei Wang, Ping Wei Huang
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Patent number: 11581438Abstract: The invention provides a fin structure for a fin field effect transistor, including a substrate. The substrate includes a plurality of silicon fins, wherein a top of each one of the silicon fins is a round-like shape in a cross-section view. An isolation layer is disposed on the substrate between the silicon fins at a lower portion of the silicon fins while an upper portion of the silicon fins is exposed. A stress buffer layer is disposed on a sidewall of the silicon fins between the isolation layer and the lower portion of the silicon fins. The stress buffer layer includes a nitride portion.Type: GrantFiled: August 12, 2020Date of Patent: February 14, 2023Assignee: UNITED MICROELECTRONICS CORP.Inventors: Hao Che Feng, Hung Jen Huang, Hsin Min Han, Shih-Wei Su, Ming Shu Chiu, Pi-Hung Chuang, Wei-Hao Huang, Shao-Wei Wang, Ping Wei Huang
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Patent number: 11536760Abstract: A testing device includes a testing socket and a reflector. The testing socket defines an accommodating space. The reflector is disposed in the accommodating space and has a plurality of reflection surfaces non-parallel with each other. The reflection surfaces define a transmission space.Type: GrantFiled: April 3, 2018Date of Patent: December 27, 2022Assignee: ASE TEST, INC.Inventors: Hung-Jen Huang, Yen-Chun Wang, Chen-Kuo Chu, I-Chun Liu
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Publication number: 20220052199Abstract: The invention provides a fin structure for a fin field effect transistor, including a substrate. The substrate includes a plurality of silicon fins, wherein a top of each one of the silicon fins is a round-like shape in a cross-section view. An isolation layer is disposed on the substrate between the silicon fins at a lower portion of the silicon fins while an upper portion of the silicon fins is exposed. A stress buffer layer is disposed on a sidewall of the silicon fins between the isolation layer and the lower portion of the silicon fins. The stress buffer layer includes a nitride portion.Type: ApplicationFiled: August 12, 2020Publication date: February 17, 2022Applicant: United Microelectronics Corp.Inventors: Hao Che Feng, Hung Jen Huang, Hsin Min Han, Shih-Wei Su, Ming Shu Chiu, Pi-Hung Chuang, Wei-Hao Huang, Shao-Wei Wang, Ping Wei Huang
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Patent number: 10955451Abstract: A testing device includes a testing socket, a first transmission medium and a second transmission medium. The testing socket defines a radiation space. The first transmission medium is disposed in the radiation space of the testing socket. The first transmission medium is configured for supporting a device under test (DUT). The second transmission medium is disposed in the radiation space of the testing socket.Type: GrantFiled: November 8, 2018Date of Patent: March 23, 2021Assignee: ASE TEST, INC.Inventors: Yen-Chun Wang, Hung-Jen Huang, Chen-Kuo Chu, I-Chun Liu
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Publication number: 20190371916Abstract: A semiconductor structure having a metal gate includes a dielectric layer. The dielectric layer having a recess is disposed on a substrate, wherein the dielectric layer has a top part and a bottom part, and the tensile stress of the top part is larger than the tensile stress of the bottom part, thereby the recess having a sidewall profile tapering from bottom to top. The present invention also provides a method of forming said semiconductor structure.Type: ApplicationFiled: June 26, 2018Publication date: December 5, 2019Inventors: Jing-Yi Lin, Yi-Wen Chen, Hung-Yi Wu, Ping-Wei Huang, Shao-Wei Wang, Yueh-Chi Chuang, Hung-Jen Huang, Hao-Che Feng
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Publication number: 20190162767Abstract: A testing device includes a testing socket, a first transmission medium and a second transmission medium. The testing socket defines a radiation space. The first transmission medium is disposed in the radiation space of the testing socket. The first transmission medium is configured for supporting a device under test (DUT). The second transmission medium is disposed in the radiation space of the testing socket.Type: ApplicationFiled: November 8, 2018Publication date: May 30, 2019Applicant: ASE TEST, INC.Inventors: YEN-CHUN WANG, Hung-Jen HUANG, Chen-Kuo CHU, I-Chun LIU
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Publication number: 20190162774Abstract: A testing device includes a testing socket and a reflector. The testing socket defines an accommodating space. The reflector is disposed in the accommodating space and has a plurality of reflection surfaces non-parallel with each other. The reflection surfaces define a transmission space.Type: ApplicationFiled: April 3, 2018Publication date: May 30, 2019Applicant: Advanced Semiconductor Engineering, Inc.Inventors: Hung-Jen HUANG, Yen-Chun WANG, Chen-Kuo CHU, I-Chun LIU
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Publication number: 20130075316Abstract: A water pollutant processing method to adsorb, oxidize and activate water pollutants includes using an adsorbent with low oxidation number (zeolite), an activator (from industrial wastes, such as BF slags and BOF slags) and a persulfate to process polluted water and underground water. The method includes an integrated processing system including the persulfate, adsorbent with low oxidation number and iron-containing activator. The integrated processing system not only possesses an adsorbing capability, but also an oxidizing capability using transition metal such as iron on the surface of the activator. The system can not only accelerate removal of water pollutants, but also delay movement of the pollutants to further reduce threat of pollutant spreading to downstream. BF and BOF slags are industrial wastes and the present invention also provides a channel for reusing the wastes.Type: ApplicationFiled: September 25, 2011Publication date: March 28, 2013Applicant: NATIONAL CHI NAN UNIVERSITYInventors: Ku-Fan Chen, Yu-Chen Chang, Hung-Jen Huang, Ting-Yu Chen
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Patent number: 8247004Abstract: The present invention provides a pharmaceutical composition for treating skin disorders, including enhancing the healing of wounds for diabetic patients. Specifically, this invention relates to the use of the extracts of Plectranthus amboinicus and Centella asiatica for improving skin disorders, including enhancing the healing of wounds for diabetic patients, and a pharmaceutical composition comprising the extracts of Plectranthus amboinicus and Centella asiatica as well as a wound dressing comprising the same. The invention also provides a method for preparing the crude extract and extract of Plectranthus amboinicus.Type: GrantFiled: June 15, 2011Date of Patent: August 21, 2012Assignee: Development Center for BiotechnologyInventors: Rey-Yuh Wu, Yuh-Shan Chung, Yu-Yuan Wu, Ma-Li Siu, Hung-Jen Huang, Chin-Wen Hsiao
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Publication number: 20120009281Abstract: The present invention provides a pharmaceutical composition for treating skin disorders, including enhancing the healing of wounds for diabetic patients. Specifically, this invention relates to the use of the extracts of Plectranthus amboinicus and Centella asiatica for improving skin disorders, including enhancing the healing of wounds for diabetic patients, and a pharmaceutical composition comprising the extracts of Plectranthus amboinicus and Centella asiatica as well as a wound dressing comprising the same. The invention also provides a method for preparing the crude extract and extract of Plectranthus amboinicus.Type: ApplicationFiled: June 15, 2011Publication date: January 12, 2012Inventors: Rey-Yuh WU, Yuh-Shan Chung, Yu-Yuan Wu, Ma-Li Siu, Hung-Jen Huang, Chin-Wen Hsiao
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Patent number: 7985431Abstract: The present invention provides a pharmaceutical composition for treating skin disorders, including enhancing the healing of wounds for diabetic patients. Specifically, this invention relates to the use of the extracts of Plectranthus amboinicus and Centella asiatica for improving skin disorders, including enhancing the healing of wounds for diabetic patients, and a pharmaceutical composition comprising the extracts of Plectranthus amboinicus and Centella asiatica as well as a wound dressing comprising the same. The invention also provides a method for preparing the crude extract and extract of Plectranthus amboinicus.Type: GrantFiled: November 28, 2006Date of Patent: July 26, 2011Assignee: Development Center for BiotechnologyInventors: Rey-Yuh Wu, Yuh-Shan Chung, Yu-Yuan Wu, Ma-Li Siu, Hung-Jen Huang, Chin-Wen Hsiao
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Patent number: 7580615Abstract: The mechanism of a sub-picture processing method for displaying multiple subtitles in a video/audio playing apparatus is provided. The purpose for displaying multiple subtitles in different languages simultaneously can be achieved under a user's control. Due to the unique control procedures and the concept of time division multiplexing, the present invention only employs a single sub-picture decoding unit and a single image mixer to display multiple subtitles in different languages at any preferred positions of the main picture.Type: GrantFiled: August 1, 2005Date of Patent: August 25, 2009Assignee: Sunplus Technology Co., Ltd.Inventors: Hung-Jen Huang, Hsin-Ting Lin, Chao-Yung Liu
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Patent number: 7312832Abstract: A sub-picture image decoder is disclosed, which essentially uses a sub-picture buffering unit to temporarily store at least one sub-picture data, an adjustment unit to store plural types of adjusting parameters, a control unit to compare the sub-picture data with the sub-picture display formats stored in a look-up table. The control unit receives adjusting signal generated by an input unit to retrieve corresponding adjusting parameter and adjust the corresponding sub-picture image for display according to the adjusting parameter.Type: GrantFiled: April 28, 2004Date of Patent: December 25, 2007Assignee: Sunplus Technology Co., Ltd.Inventors: Hung-Jen Huang, Wen-Kuan Chen
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Publication number: 20070237841Abstract: The present invention provides a pharmaceutical composition for treating skin disorders, including enhancing the healing of wounds for diabetic patients. Specifically, this invention relates to the use of the extracts of Plectranthus amboinicus and Centella asiatica for improving skin disorders, including enhancing the healing of wounds for diabetic patients, and a pharmaceutical composition comprising the extracts of Plectranthus amboinicus and Centella asiatica as well as a wound dressing comprising the same. The invention also provides a method for preparing the crude extract and extract of Plectranthus amboinicus.Type: ApplicationFiled: November 28, 2006Publication date: October 11, 2007Inventors: Rey-Yuh Wu, Yuh-Shan Chung, Yu-Yuan Wu, Ma-Li Siu, Hung-Jen Huang, Chin-Wen Hsiao
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Publication number: 20070055164Abstract: A physiological status monitoring method is disclosed, which comprises the steps of: monitoring physiological status of at least an individual stationed inside a transportation means for acquiring a physiological data of the individual; transmitting the physiological data to a center processing device; and processing an operation of analysis and comparison upon the received physiological data by the center processing device. Moreover, with respect to the aforesaid method, a physiological status monitoring system can be provided to be installed inside a transportation means, which comprises: at least a bio sensor, capable of monitoring and sensing a physiological status of at least an individual stationed inside the transportation means for generating a sensing signal; and a center processing device, arranged inside the transportation means for receiving the sensing signal and thus evaluating the physiological caodition of the monitored individual inside the transportation means.Type: ApplicationFiled: November 4, 2005Publication date: March 8, 2007Inventors: Hung-Jen Huang, Shao-Wei Chung, Chie-Chung Kuo, Hsin-Teng Lin
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Publication number: 20060222336Abstract: The mechanism of a sub-picture processing method for displaying multiple subtitles in a video/audio playing apparatus is provided. The purpose for displaying multiple subtitles in different languages simultaneously can be achieved under a user's control. Due to the unique control procedures and the concept of time division multiplexing, the present invention only employs a single sub-picture decoding unit and a single image mixer to display multiple subtitles in different languages at any preferred positions of the main picture.Type: ApplicationFiled: August 1, 2005Publication date: October 5, 2006Inventors: Hung-Jen Huang, Hsin-Ting Lin, Chao-Yung Liu