Patents by Inventor Hung-Ju Wang

Hung-Ju Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230324998
    Abstract: A temporal sequence alignment method includes the following steps: receiving gesture training data and gesture sample data; wherein the gesture training data includes multiple training frames and multiple training soft labels, and the gesture sample data includes multiple sample frames and multiple sample soft labels; compressing the training frames to generate a compressed training frame; compressing the sample frames to generate a compressed sample frame; calculating an alignment model of the compressed training frame and the compressed sample frame; aligning the sample soft labels to multiple aligned soft labels according to the alignment model; generating an aligned training data according to the gesture sample data and the aligned soft labels. The present invention uses the aforementioned steps to calibrate the sample soft labels of the gesture sample data, allowing a gesture recognition system to minimize time discrepancy for recognizing a gesture.
    Type: Application
    Filed: April 11, 2022
    Publication date: October 12, 2023
    Applicant: KaiKuTek Inc.
    Inventors: Hung-Ju WANG, Tsung-Ming TAI, Wen-Jyi HWANG, Chun-Hsuan KUO, Mike Chun-Hung WANG
  • Publication number: 20090325471
    Abstract: A diamond polishing disk and a manufacturing method thereof are described. The method includes the steps as follows. A plurality of diamond particles are disposed in an accommodation unit, and each diamond particle has at least one acute polishing end. Next, a guiding mold is supplied, in which the guiding mold has a plurality of grooves. The guiding mold is pressed on the diamond particles, such that the acute polishing ends of the diamond particles are respectively inserted in the grooves correspondingly. Next, the guiding mold is removed, and then a polymer material is injected into the accommodation unit to cover the diamond particles. The polymer material is hardened. Finally, the accommodation unit is removed, so as to finish manufacturing the diamond polishing disk.
    Type: Application
    Filed: June 12, 2009
    Publication date: December 31, 2009
    Applicant: KINK COMPANY
    Inventors: Cheng Shiang Chou, Hung-Ju Wang, Chih-Chung Chou