Patents by Inventor Hung-Jung Hsu

Hung-Jung Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography exposure method with debris removing mechanism
    Patent number: 11754928
    Abstract: A method for a lithography exposing process includes placing a reticle over a reticle stage, generating a light beam by irradiating a droplet by a laser, projecting a first portion of the light beam over a plurality of light permeable protrusions formed on a reflection layer and directing, by the protrusions and the reflection layer, the first portion of the light beam to the reticle.
    Type: Grant
    Filed: March 5, 2020
    Date of Patent: September 12, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventor: Hung-Jung Hsu
  • Method and apparatus for mitigating contamination
    Patent number: 11632849
    Abstract: A shutter is provided near the immediate focus of a lithography apparatus in order to deflect tin debris generated by a source side of the apparatus away from a scanner side of the apparatus and towards a debris collection device. The activation of the shutter is synchronized with the generation of light pulses so as not to block light from entering the scanner side.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: April 18, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chieh Hsieh, Tai-Yu Chen, Hung-Jung Hsu, Cho-Ying Lin, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu
  • METHOD AND APPARATUS FOR MITIGATING CONTAMINATION
    Publication number: 20230064840
    Abstract: A shutter is provided near the immediate focus of a lithography apparatus in order to deflect tin debris generated by a source side of the apparatus away from a scanner side of the apparatus and towards a debris collection device. The activation of the shutter is synchronized with the generation of light pulses so as not to block light from entering the scanner side.
    Type: Application
    Filed: August 27, 2021
    Publication date: March 2, 2023
    Inventors: Chieh HSIEH, Tai-Yu CHEN, Hung-Jung HSU, Cho-Ying LIN, Shang-Chieh CHIEN, Li-Jui CHEN, Heng-Hsin LIU
  • LITHOGRAPHY EXPOSURE SYSTEM WITH DEBRIS REMOVING MECHANISM
    Publication number: 20220382162
    Abstract: A lithography system includes an extreme ultraviolet (EUV) light source, a reticle stage, a reflection layer, and a plurality of light permeable protrusions. The EUV light source is configured for generating an EUV light beam. The reticle stage is configured for holding a reticle with a front surface of the reticle facing in a downward direction. The reflection layer is below the reticle stage. The light permeable protrusions are formed on the reflection layer. Each of the light permeable protrusions includes a bouncing surface facing in a direction that forms an acute angle with the downward direction. A first portion of the EUV light beam from the EUV light source passes through the bouncing surface of each of the light permeable protrusions to the reflection layer and is reflected to the reticle by the reflection layer.
    Type: Application
    Filed: August 9, 2022
    Publication date: December 1, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventor: Hung-Jung HSU
  • LITHOGRAPHY EXPOSURE METHOD WITH DEBRIS REMOVING MECHANISM
    Publication number: 20210063890
    Abstract: A method for a lithography exposing process includes placing a reticle over a reticle stage, generating a light beam by irradiating a droplet by a laser, projecting a first portion of the light beam over a plurality of light permeable protrusions formed on a reflection layer and directing, by the protrusions and the reflection layer, the first portion of the light beam to the reticle.
    Type: Application
    Filed: March 5, 2020
    Publication date: March 4, 2021
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventor: Hung-Jung HSU
  • Memory apparatus, and method of averagely using blocks of a flash memory
    Patent number: 7908423
    Abstract: A flash memory controller for averagely using blocks of a flash memory and the method thereof are provided. The flash memory controller is configured to process wear-leveling by allocating frequently updated data in less-erased blocks, and, allocating less-updated data in frequently erased blocks to achieve dynamic uniformity of times of erasion of blocks.
    Type: Grant
    Filed: January 11, 2008
    Date of Patent: March 15, 2011
    Assignee: Silicon Motion, Inc.
    Inventors: Hung-Jung Hsu, Hsiao-Te Chang
  • Memory Apparatus, and Method of Averagely Using Blocks of a Flash Memory
    Publication number: 20090119448
    Abstract: A flash memory controller for averagely using blocks of a flash memory and the method thereof are provided. The flash memory controller is configured to process wear-leveling by allocating frequently updated data in less-erased blocks, and, allocating less-updated data in frequently erased blocks to achieve dynamic uniformity of times of erasion of blocks.
    Type: Application
    Filed: January 11, 2008
    Publication date: May 7, 2009
    Applicant: SILICON MOTION, INC.
    Inventors: Hung-Jung Hsu, Hsiao-Te Chang