Patents by Inventor Hung-Lung Lin

Hung-Lung Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9141752
    Abstract: A method includes accessing data representing a layout of a layer of an integrated circuit (IC) having a plurality of polygons defining circuit patterns to be divided among a number (N) of photomasks over a single layer of a semiconductor substrate, where N is greater than two. The method further includes inputting a conflict graph having a plurality of vertices, identifying a first and second vertex, each of which is connected to a third and fourth vertex where the third and fourth vertices are connected to a same edge of a conflict graph, and merging the first and second vertices to form a reduced graph. The method further includes detecting at least one or more vertex in the reduced having a conflict. In one aspect, the method resolves the detected conflict by performing one of pattern shifting, stitch inserting, or re-routing.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: September 22, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Hung Lin, Cheng-I Huang, Chin-Chang Hsu, Hung Lung Lin
  • Patent number: 9137922
    Abstract: A drawer and a server using the same are provided. The drawer is configured for a node of a server. The drawer includes a bottom plate and a bezel. The bottom plate is configured for disposing a circuit board. The bezel is disposed at one side of the bottom plate. The bezel includes a body and a door structure connected to the body. The door structure can be opened to open an opening, such that the node is accessible through the opening. The door structure can be closed to shut the opening, such that the bezel works as an electrostatic shield of the circuit board.
    Type: Grant
    Filed: February 25, 2014
    Date of Patent: September 15, 2015
    Assignee: WISTRON CORPORATION
    Inventors: Hung-Lung Lin, Chia-Hsin Hsieh
  • Patent number: 9122838
    Abstract: Provided is a method for evaluating and decomposing a semiconductor device level for triple pattern lithography in semiconductor manufacturing. The method includes generating a conflict graph and simplifying the conflict graph using various methods to produce a simplified conflict graph which can either be further simplified or evaluated for decomposition validity. The disclosure also provides for applying decomposition validity rules to a simplified conflict graph to determine if the conflict graph represents a semiconductor device layer that is decomposable into three masks. Methods of the disclosure are carried out by a computer and instructions for carrying out the method may be stored on a computer readable storage medium.
    Type: Grant
    Filed: June 12, 2014
    Date of Patent: September 1, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hung Lung Lin, Chin-Chang Hsu, Min-Yuan Tsai, Wen-Ju Yang, Chien Lin Ho
  • Patent number: 9026971
    Abstract: The present disclosure relates to a method and apparatus for forming a multiple patterning lithograph (MPL) compliant integrated circuit layout by operating a construction validation check on unassembled IC cells to enforce design restrictions that prevent MPL conflicts after assembly. In some embodiments, the method is performed by generating a plurality of unassembled integrated circuit (IC) cells having a multiple patterning design layer. A construction validation check is performed on the unassembled IC cells to identify violating IC cells having shapes disposed in patterns comprising potential multiple patterning coloring conflicts. Design shapes within a violating IC cell are adjusted to achieve a plurality of violation free IC cells. The plurality of violation free IC cells are then assembled to form an MPL compliant IC layout. Since the MPL compliant IC layout is free of coloring conflicts, a decomposition algorithm can be operated without performing a post assembly color conflict check.
    Type: Grant
    Filed: January 7, 2014
    Date of Patent: May 5, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chien Lin Ho, Chin-Chang Hsu, Hung Lung Lin, Wen-Ju Yang, Yi-Kan Cheng, Tsong-Hua Ou, Wen-Li Cheng, Ken-Hsien Hsieh, Ching Hsiang Chang, Ting Yu Chen, Li-Chun Tien
  • Publication number: 20150108890
    Abstract: A drawer and a server using the same are provided. The drawer is configured for a node of a server. The drawer includes a bottom plate and a bezel. The bottom plate is configured for disposing a circuit board. The bezel is disposed at one side of the bottom plate. The bezel includes a body and a door structure connected to the body. The door structure can be opened to open an opening, such that the node is accessible through the opening. The door structure can be closed to shut the opening, such that the bezel works as an electrostatic shield of the circuit board.
    Type: Application
    Filed: February 25, 2014
    Publication date: April 23, 2015
    Applicant: WISTRON CORPORATION
    Inventors: Hung-Lung Lin, Chia-Hsin Hsieh
  • Publication number: 20150100935
    Abstract: A method of determining if a layout design for fabricating a layer of features of an integrated circuit is N-colorable, comprising identifying a set of candidate cells among layout cells of a layout design. Each candidate cell of the set of candidate cells is one of the set of base layout cells, or one of the set of composite layout cells, and constituent layout cells of the one of the set of composite layout cells having been determined as N-colorable. Whether a first candidate cell of the set of candidate cell is N-colorable is determined. An abutment-sensitive conflict graph of the first candidate cell is generated when the first candidate cell is N-colorable and the first candidate cell is not the top layout cell.
    Type: Application
    Filed: October 3, 2013
    Publication date: April 9, 2015
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hung Lung LIN, Chin-Chang HSU, Chien Lin HO, Wen-Ju YANG
  • Publication number: 20140372958
    Abstract: Provided is a method for evaluating and decomposing a semiconductor device level for triple pattern lithography in semiconductor manufacturing. The method includes generating a conflict graph and simplifying the conflict graph using various methods to produce a simplified conflict graph which can either be further simplified or evaluated for decomposition validity. The disclosure also provides for applying decomposition validity rules to a simplified conflict graph to determine if the conflict graph represents a semiconductor device layer that is decomposable into three masks. Methods of the disclosure are carried out by a computer and instructions for carrying out the method may be stored on a computer readable storage medium.
    Type: Application
    Filed: June 12, 2014
    Publication date: December 18, 2014
    Inventors: Hung Lung LIN, Chin-Chang HSU, Min-Yuan TSAI, Wen-Ju YANG, Chien Lin HO
  • Publication number: 20140325466
    Abstract: A method embodiment includes identifying, by a processor, an empty region in an integrated circuit (IC) layout, wherein the empty region is a region not including any active fins. The method further includes providing a standard dummy fin cell and forming an expanded dummy fin cell. The standard dummy fin cell includes a plurality of partitions. The expanded dummy fin cell is larger than the standard dummy fin cell, and the expanded dummy fin cell includes integer multiples of each of the plurality of partitions. The empty region is filled with a plurality of dummy fin cells, wherein the plurality of dummy fin cells includes the expanded dummy fin cell. The plurality of dummy fin cells is implemented in an IC.
    Type: Application
    Filed: July 8, 2014
    Publication date: October 30, 2014
    Inventors: Li-Sheng Ke, Jia-Rong Hsu, Wen-Ju Yang, Hung-Lung Lin
  • Patent number: 8875065
    Abstract: A method of decomposing a layout for triple pattern lithography generates a first conflict graph from the layout. The method generates a second conflict graph from the first conflict graph, and identifies loops in the second conflict graph as decomposition violations.
    Type: Grant
    Filed: July 30, 2013
    Date of Patent: October 28, 2014
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hung Lung Lin, Chin-Chang Hsu, Min-Yuan Tsai, Wen-Ju Yang
  • Patent number: 8869090
    Abstract: A method embodiment includes identifying an empty region in an integrated circuit (IC) layout, wherein the empty region is a region not including any active fins and outside a minimum spacing boundary, applying a grid map over the empty region, wherein the grid map comprises a plurality of grids inside the empty region, and filling the empty region with a plurality of dummy fin cells by placing a dummy fin cell in each of the plurality of grids, wherein applying the grid map and filling the empty region is performed using a computer.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: October 21, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Li-Sheng Ke, Min-Yuan Tsai, Jia-Rong Hsu, Hung-Lung Lin, Wen-Ju Yang
  • Publication number: 20140282293
    Abstract: A method includes accessing data representing a layout of a layer of an integrated circuit (IC) having a plurality of polygons defining circuit patterns to be divided among a number (N) of photomasks over a single layer of a semiconductor substrate, where N is greater than two. The method further includes inputting a conflict graph having a plurality of vertices, identifying a first and second vertex, each of which is connected to a third and fourth vertex where the third and fourth vertices are connected to a same edge of a conflict graph, and merging the first and second vertices to form a reduced graph. The method further includes detecting at least one or more vertex in the reduced having a conflict. In one aspect, the method resolves the detected conflict by performing one of pattern shifting, stitch inserting, or re-routing.
    Type: Application
    Filed: February 24, 2014
    Publication date: September 18, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yen-Hung LIN, Cheng-I HUANG, Chin-Chang HSU, Hung Lung LIN
  • Publication number: 20140258961
    Abstract: A method embodiment includes identifying an empty region in an integrated circuit (IC) layout, wherein the empty region is a region not including any active fins and outside a minimum spacing boundary, applying a grid map over the empty region, wherein the grid map comprises a plurality of grids inside the empty region, and filling the empty region with a plurality of dummy fin cells by placing a dummy fin cell in each of the plurality of grids, wherein applying the grid map and filling the empty region is performed using a computer.
    Type: Application
    Filed: March 15, 2013
    Publication date: September 11, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Li-Sheng Ke, Min-Yuan Tsai, Jia-Rong Hsu, Hung-Lung Lin, Wen-Ju Yang
  • Patent number: 8448100
    Abstract: A computer implemented system comprises: a tangible, non-transitory computer readable storage medium encoded with data representing an initial layout of an integrated circuit pattern layer having a plurality of polygons. A special-purpose computer is configured to perform the steps of: analyzing in the initial layout of an integrated circuit pattern layer having a plurality of polygons, so as to identify a plurality of multi-patterning conflict cycles in the initial layout; constructing in the computer a respective multi-patterning conflict cycle graph representing each identified multi-patterning conflict cycle; classifying each identified multi-patterning conflict cycle graph in the computer according to a number of other multi-patterning conflict cycle graphs which enclose that multi-patterning conflict cycle graph; and causing a display device to graphically display the plurality of multi-patterning conflict cycle graphs according to their respective classifications.
    Type: Grant
    Filed: April 11, 2012
    Date of Patent: May 21, 2013
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hung Lung Lin, Chin-Chang Hsu, Ying-Yu Shen, Wen-Ju Yang, Hsiao-Shu Chao, Yi-Kan Cheng, Chin-Hsiung Hsu, Huang-Yu Chen, Yi-Chuin Tsai, Yuan-Te Hou, Chung-Hsing Wang
  • Patent number: 8151500
    Abstract: The photo frame contains a frame body, first and second transparent plates, first and second light generating units. The frame body contains a number of side walls and a back cover. The first transparent plate is jointed to the frame body and attached to the back cover with a photo in between. The second transparent plate is arranged to the frame body's front side, parallel to the first transparent plate and forming a gap therebetween. A first light generating unit contains at least a first light generating element configured along a side wall, projecting illuminating light into the gap to create a stereographic impression. The second light generating unit contains at least a second light generating element arranged an edge of the second transparent plate to project blue light into the second transparent plate to manifest fluorescent traces written by a highlighter.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: April 10, 2012
    Inventor: Hung Lung Lin
  • Publication number: 20110232146
    Abstract: The photo frame contains a frame body, first and second transparent plates, first and second light generating units. The frame body contains a number of side walls and a back cover. The first transparent plate is jointed to the frame body and attached to the back cover with a photo in between. The second transparent plate is arranged to the frame body's front side, parallel to the first transparent plate and forming a gap therebetween. A first light generating unit contains at least a first light generating element configured along a side wall, projecting illuminating light into the gap to create a stereographic impression. The second light generating unit contains at least a second light generating element arranged an edge of the second transparent plate to project blue light into the second transparent plate to manifest fluorescent traces written by a highlighter.
    Type: Application
    Filed: March 26, 2010
    Publication date: September 29, 2011
    Inventor: Hung Lung Lin
  • Patent number: 7116306
    Abstract: A liquid crystal display includes a liquid crystal display panel having a plurality of pixels on a display line. A set of drivers drives a set of pixels, the set of drivers receiving display data and providing video signals to the set of pixels. A clock provides a clock signal to the set of drivers to latch the display data based on a frequency of the clock signal, and receives a feedback signal from the set of drivers prior to an end of the display data received by the set of drivers. A delay circuit stops the clock signal to the set of drivers, based on the feedback signal, after delaying for a first time period, that is no less than a predetermined time period between the feedback signal and the end of the display data received by the set of drivers.
    Type: Grant
    Filed: May 16, 2003
    Date of Patent: October 3, 2006
    Assignee: Winbond Electronics Corp.
    Inventor: Hung-Lung Lin
  • Publication number: 20040227716
    Abstract: A liquid crystal display includes a liquid crystal display panel having a plurality of pixels on a display line; a set of drivers for driving a set of pixels, the set of drivers receiving display data and providing video signals to the set of pixels; a clock for providing a clock signal to the set of drivers to latch the display data based on a frequency of the clock signal, wherein the clock receives a feedback signal from the set of drivers prior to an end of the display data received by the set of drivers; and a delay circuit for stopping the clock signal to the set of drivers based on the feedback signal, wherein the delay circuit stops the clock signal to the set of drivers after delaying for a first time period, the first time period being no less than a predetermined time period between the feedback signal and the end of the display data received by the set of drivers.
    Type: Application
    Filed: May 16, 2003
    Publication date: November 18, 2004
    Applicant: Winbond Electronics Corporation
    Inventor: Hung-Lung Lin
  • Patent number: 5675894
    Abstract: Disclosed is a mechanically operated razor which does not require any electric power supply while functioning as a power-driven shaver. The razor mainly includes a housing, a driving mechanism, a transmission mechanism, a top cover, a shaving blade, and a mirror. Repeatedly pushing a push button of the driving mechanism toward the housing causes a rack connected the push button to move inward and to mesh with and rotate a gear of the transmission mechanism. The rotating gear in turn brings other gears of the transmission mechanism and a flywheel to rotate, causing the shaving blade to rotate rapidly for a prolonged time. The rotating flywheel may reduce the times the push button is depressed while prolongs the rotating of the shaving blade, so that the razor functions like an electrically driven razor. A cleaning brush is removably attached to the razor for cleaning the razor after shaving.
    Type: Grant
    Filed: September 23, 1996
    Date of Patent: October 14, 1997
    Inventor: Hung Lung Lin
  • Patent number: D416660
    Type: Grant
    Filed: November 12, 1998
    Date of Patent: November 16, 1999
    Inventor: Hung-Lung Lin