Patents by Inventor Hung-Sheng Hu

Hung-Sheng Hu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7513042
    Abstract: A fluid injector and method of manufacturing the same. The fluid injector comprises a base, a first through hole, a bubble generator, a passivation layer, and a metal layer. The base includes a chamber and a surface. The first through hole communicates with the chamber, and is disposed in the base. The bubble generator is disposed on the surface near the first through hole, and is located outside the chamber. The passivation layer is disposed on the surface. The metal layer defines a second through hole, and is disposed on the passivation layer outside the chamber. The second through hole communicates with the first through hole.
    Type: Grant
    Filed: March 9, 2006
    Date of Patent: April 7, 2009
    Assignee: BenQ Corporation
    Inventors: Hung-Sheng Hu, Wei-Lin Chen, In-Yao Lee, Tsung-Ping Hsu, Chung-Cheng Chou, ShangShi Wu
  • Patent number: 7439163
    Abstract: Methods for fabricating fluid injection devices. A patterned sacrificial layer is formed on a substrate. A patterned first structural layer is formed on the substrate covering the sacrificial layer. At least one fluid actuator is formed on the structural layer. A first passivation layer is formed on the first structural covering the at least one fluid actuator. An under bump metal (UBM) layer is conformably formed on the first passivation layer. A patterned first photoresist is formed at a predetermined nozzle site and a contact opening site exposes the UBM layer. A second structural layer is formed on the UBM layer. An etching protective layer is formed on the second structural layer. The first photoresist is removed creating an opening at the nozzle site exposing the UBM layer. The UBM layer in the opening is removed.
    Type: Grant
    Filed: February 17, 2006
    Date of Patent: October 21, 2008
    Assignees: Qisda Corporation, Benq Corporation
    Inventors: Hung-Sheng Hu, Wei-Lin Chen, Tsung-Ping Hsu, Der-Rong Shyn
  • Publication number: 20080242798
    Abstract: The present invention is generally related to an anti-leaking cartridge and anti-leaking ink. The anti-leaking ink comprises: an organic solvent, which is selected from the group consisting of diethylene glycol, triethylene glycol, triethanolamine amine extra pure, polyethylene glycol 200, and ethylene glycol and functions with at least one seal member for avoiding leakage; at least one dye dissolved in the organic solvent; a buffer solution maintaining the pH value of the anti-leaking ink in between 6.0 to 8.0; an antibacterial avoiding that the properties of the ink is changed; surfactant, which homogenizes the aquas of ink and the organic solvent; and de-ionized water.
    Type: Application
    Filed: March 26, 2008
    Publication date: October 2, 2008
    Inventors: Po-Son Wang, Yu-Ting Lin, Yun-I Liu, Ming-Chung Peng, Wen-Chen Liu, Hung-Sheng Hu
  • Patent number: 7264917
    Abstract: A method for fabricating a fluid injection micro device. The method includes the steps of providing a substrate with an insulating layer thereon. A heater is formed on the insulating layer. A patterned conductive layer is formed on the heater and the insulating layer. A protective layer is formed on the conductive layer to insulate the conductive layer. An opening is formed by sequentially etching the protective layer, the insulating layer and the substrate. A patterned thick film, having a defined chamber, is formed on the protective layer. The back of the substrate is removed and thinned until the opening forms a through hole.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: September 4, 2007
    Assignee: BenQ Corporation
    Inventors: Hung-Sheng Hu, Wei-Lin Chen, Tsung-Ping Hsu
  • Patent number: 7252368
    Abstract: The fluid injector includes a base, a first through hole, a fluid actuator, a passivation layer, and a thick hydrophobic film. The base includes a chamber and a surface. The first through hole communicates with the chamber, and is disposed in the base. The fluid actuator is disposed on the surface near the first through hole, and is located outside the chamber. The passivation layer is disposed on the surface. The thick hydrophobic film formed of a crosslink defines a second through hole, and is disposed on the passivation layer outside the chamber. The second through hole communicates with the first through hole.
    Type: Grant
    Filed: November 5, 2004
    Date of Patent: August 7, 2007
    Assignee: Benq Corporation
    Inventors: Wei-Lin Chen, Hung-Sheng Hu
  • Publication number: 20070105382
    Abstract: A fluid ejection device includes a first substrate having a first crystal orientation, a second substrate having a second crystal orientation, bound to the first substrate, a manifold through the first and second substrates, a chamber formed in the second substrate, connected with the manifold, and a plurality of nozzles connecting to the chamber, wherein the first crystal orientation is different from the second crystal orientation. A method of fabricating the same is also disclosed.
    Type: Application
    Filed: January 4, 2007
    Publication date: May 10, 2007
    Applicant: BENQ CORPORATION
    Inventors: Hung-Sheng Hu, Wei-Lin Chen
  • Patent number: 7186349
    Abstract: A fluid ejection device includes a first substrate having a first crystal orientation, a second substrate having a second crystal orientation, bound to the first substrate, a manifold through the first and second substrates, a chamber formed in the second substrate, connected with the manifold, and a plurality of nozzles connecting to the chamber, wherein the first crystal orientation is different from the second crystal orientation. A method of fabricating the same is also disclosed.
    Type: Grant
    Filed: November 4, 2004
    Date of Patent: March 6, 2007
    Assignee: Benq Corporation
    Inventors: Hung-Sheng Hu, Wei-Lin Chen
  • Publication number: 20060284932
    Abstract: A fluid injector and method of manufacturing the same. The fluid injector comprises a base, a first through hole, a bubble generator, a passivation layer, and a metal layer. The base includes a chamber and a surface. The first through hole communicates with the chamber, and is disposed in the base. The bubble generator is disposed on the surface near the first through hole, and is located outside the chamber. The passivation layer is disposed on the surface. The metal layer defines a second through hole, and is disposed on the passivation layer outside the chamber. The second through hole communicates with the first through hole.
    Type: Application
    Filed: March 9, 2006
    Publication date: December 21, 2006
    Inventors: Hung-Sheng Hu, Wei-Lin Chen, In-Yao Lee, Tsung-Ping Hsu, Chung-Cheng Chou, ShangShi Wu
  • Publication number: 20060258138
    Abstract: Methods for fabricating fluid injection devices. A patterned sacrificial layer is formed on a substrate. A patterned first structural layer is formed on the substrate covering the sacrificial layer. At least one fluid actuator is formed on the structural layer. A first passivation layer is formed on the first structural covering the at least one fluid actuator. An under bump metal (UBM) layer is conformably formed on the first passivation layer. A patterned first photoresist is formed at a predetermined nozzle site and a contact opening site exposes the UBM layer. A second structural layer is formed on the UBM layer. An etching protective layer is formed on the second structural layer. The first photoresist is removed creating an opening at the nozzle site exposing the UBM layer. The UBM layer in the opening is removed.
    Type: Application
    Filed: February 17, 2006
    Publication date: November 16, 2006
    Inventors: Hung-Sheng Hu, Wei-Lin Chen, Tsung-Ping Hsu, Der-Rong Shyn
  • Publication number: 20060236537
    Abstract: A method for fabricating a monolithic fluid injection device. The method includes providing a substrate with a patterned sacrificial layer thereon. Next, a patterned support layer and a patterned resistive layer, as a heating element, are formed on the substrate sequentially. A patterned insulating layer having a heating element contact via and a first opening is formed on the support layer. A patterned conductive layer is formed on the support layer and fills the heating element contact via as a signal transmitting circuit. A patterned protective layer having a signal transmitting circuit contact via and a second opening corresponding to the first opening is formed on the substrate. A manifold is formed by wet etching the back of the substrate to expose the sacrificial layer. A chamber is formed by removing the sacrificial layer in the wet etching process. Finally, an opening connecting the chamber is formed by etching the support layer along the second opening.
    Type: Application
    Filed: June 22, 2006
    Publication date: October 26, 2006
    Applicant: BENQ CORPORATION
    Inventors: Wei-Lin Chen, Hung-Sheng Hu, In-Yao Lee
  • Patent number: 7089665
    Abstract: A method for fabricating a monolithic fluid injection device. The method includes providing a substrate with a patterned sacrificial layer thereon. Next, a patterned support layer and a patterned resistive layer, as a heating element, are formed on the substrate sequentially. A patterned insulating layer having a heating element contact via and a first opening is formed on the support layer. A patterned conductive layer is formed on the support layer and fills the heating element contact via as a signal transmitting circuit. A patterned protective layer having a signal transmitting circuit contact via and a second opening corresponding to the first opening is formed on the substrate. A manifold is formed by wet etching the back of the substrate to expose the sacrificial layer. A chamber is formed by removing the sacrificial layer in the wet etching process. Finally, an opening connecting the chamber is formed by etching the support layer along the second opening.
    Type: Grant
    Filed: June 15, 2004
    Date of Patent: August 15, 2006
    Assignee: BENQ Corporation
    Inventors: Wei-Lin Chen, Hung-Sheng Hu, In-Yao Lee
  • Publication number: 20060170731
    Abstract: A fluid injection device. The fluid injection device comprises a substrate, a chamber formed in the substrate, a structural layer covering the substrate and the chamber, at least one nozzle through the structural layer and connecting the chamber, an opening through the structural layer and connecting the terminal of the chamber, wherein an outlet is formed at the connecting region therebetween. A method of fabricating the fluid injection device is also disclosed.
    Type: Application
    Filed: December 9, 2005
    Publication date: August 3, 2006
    Applicant: BENQ CORPORATION
    Inventors: Kuo-Tong Ma, In-Yao Lee, Hung-Sheng Hu
  • Patent number: 7040740
    Abstract: A fluid injector and method of manufacturing the same. The fluid injector includes a base, a first through hole, a bubble generator, a passivation layer, and a metal layer. The base includes a chamber and a surface. The first through hole communicates with the chamber, and is disposed in the base. The bubble generator is disposed on the surface near the first through hole, and is located outside the chamber. The passivation layer is disposed on the surface. The metal layer defines a second through hole, and is disposed on the passivation layer outside the chamber. The second through hole communicates with the first through hole.
    Type: Grant
    Filed: July 11, 2003
    Date of Patent: May 9, 2006
    Assignee: Benq Corporation
    Inventors: Hung-Sheng Hu, Wei-Lin Chen, In-Yao Lee, Tsung-Ping Hsu, Chung-Cheng Chou, ShangShi Wu
  • Publication number: 20060071302
    Abstract: Fluid injection devices and fabrication methods thereof. A first structural layer is disposed on a substrate. A fluid chamber is disposed between the substrate and the first structural layer. At least one bubble generator is disposed on the first structural layer and on the opposite side of the fluid chamber. A first passivation layer is disposed on the first structural layer covering the bubble generator. A second structural layer is disposed on the passivation layer. A second passivation layer is conformably deposited on the second passivation layer. A nozzle adjacent to the bubble generator passes through the second passivation layer, the second structural layer, the first passivation layer, and the first structural layer communicating the fluid chamber, wherein the sidewall of the nozzle is made of the first structural, the first passivation layer and the second passivation layer.
    Type: Application
    Filed: October 5, 2005
    Publication date: April 6, 2006
    Inventors: Wei-Lin Chen, Hung-Sheng Hu, Der-Rong Shyn
  • Publication number: 20050206680
    Abstract: Fluid injection devices and fabrication methods thereof. The fluid injection device comprises a substrate, a structural layer disposed on the substrate, a fluid created between the substrate and the structural layer, and at least one bubble generator disposed on the structural layer and on the opposite side of the fluid chamber. A passivation layer is disposed on the structural layer covering the bubble generator. A composite layer is formed on the passivation layer. A nozzle neighboring the bubble generator is formed passing through the composite layer, the passivation layer, and the structural layer, communicating with the fluid chamber.
    Type: Application
    Filed: March 14, 2005
    Publication date: September 22, 2005
    Inventors: Wei-Lin Chen, Hung-Sheng Hu
  • Publication number: 20050157091
    Abstract: A method for fabricating an enlarged fluid chamber using multiple sacrificial layers. The method comprises providing a plurality of patterned sacrificial layers between a substrate and a structural layer. A chamber neck is formed between a fluid chamber and a fluid channel using different sacrificial layers with different etching rates. The chamber neck can stabilize ejection of the fluid droplet. Additionally, a single print-head chip with different chamber sizes can also be formed, thereby ejecting droplets with different sizes.
    Type: Application
    Filed: January 6, 2005
    Publication date: July 21, 2005
    Inventors: Hung-Sheng Hu, Wei-Lin Chen, Ming-Chung Peng
  • Publication number: 20050139939
    Abstract: A wafer protection device. The wafer has a first surface etched with an etching fluid and a second surface, and the wafer protection device is applied to the wafer to prevent a specific area on the second surface of the wafer from etching. The wafer protection device has a body and a pressure modulating device. The body covers the specific area of the wafer and provides an isolated cavity between the body and the specific area to prevent the specific area from contacting the etching fluid, and the pressure modulating device is provided on the body and connected to the isolated cavity to modulate pressure in the isolated cavity.
    Type: Application
    Filed: December 22, 2004
    Publication date: June 30, 2005
    Inventors: Hung-Sheng Hu, Wei-Lin Chen
  • Publication number: 20050127028
    Abstract: A method for fabricating an enlarged fluid channel. The method includes providing a substrate with a patterned sacrificial layer thereon. A patterned support layer is formed on the substrate and covers the sacrificial layer. A fluid channel is formed by wet etching the substrate and exposing the sacrificial layer. A first chamber is formed by removing a portion of the sacrificial layer in the wet etching process. Finally, the first chamber and the exit-end of the fluid channel are enlarged by wet etching. More specifically, the exit-end of the fluid channel is enlarged using multiple steps of etching the sacrificial layer without changing the dimensions of the entry-end of the fluid channel.
    Type: Application
    Filed: November 12, 2004
    Publication date: June 16, 2005
    Inventors: Wei-Lin Chen, Hung-Sheng Hu
  • Publication number: 20050093106
    Abstract: A fluid ejection device includes a first substrate having a first crystal orientation, a second substrate having a second crystal orientation, bound to the first substrate, a manifold through the first and second substrates, a chamber formed in the second substrate, connected with the manifold, and a plurality of nozzles connecting to the chamber, wherein the first crystal orientation is different from the second crystal orientation. A method of fabricating the same is also disclosed.
    Type: Application
    Filed: November 4, 2004
    Publication date: May 5, 2005
    Inventors: Hung-Sheng Hu, Wei-Lin Chen
  • Publication number: 20050093936
    Abstract: A fluid injector and method of manufacturing the same. The fluid injector comprises a base, a first through hole, a fluid actuator, a passivation layer, and a thick hydrophobic film. The base includes a chamber and a surface. The first through hole communicates with the chamber, and is disposed in the base. The fluid actuator is disposed on the surface near the first through hole, and is located outside the chamber. The passivation layer is disposed on the surface. The thick hydrophobic film defines a second through hole, and is disposed on the passivation layer outside the chamber. The second through hole communicates with the first through hole.
    Type: Application
    Filed: November 5, 2004
    Publication date: May 5, 2005
    Inventors: Wei-Lin Chen, Hung-Sheng Hu