Abstract: Embodiments of a method and apparatus for determining a substrate exchange position in a processing system are provided. In one embodiment, a method of determining a substrate exchange position in a processing system includes determining an initial exchange position within a processing chamber, and resolving a change in the exchange position. The step of resolving may further include the step of sensing a change in temperature of a facet of a transfer chamber having the processing chamber coupled thereto, sensing a change in a state of the system, or sensing a change in position of the processing chamber, among others.

Abstract: Embodiments of a method and apparatus for determining a substrate exchange position in a processing system are provided. In one embodiment, a method of determining a substrate exchange position in a processing system includes determining an initial exchange position within a processing chamber, and resolving a change in the exchange position. The step of resolving may further include the step of sensing a change in temperature of a facet of a transfer chamber having the processing chamber coupled thereto, sensing a change in a state of the system, or sensing a change in position of the processing chamber, among others.

Abstract: A substrate support that aligns a substrate placed thereon is generally provided. In one aspect, a substrate support for supporting a substrate includes a support plate, an alignment member and a cylindrical member. The alignment member is disposed proximate a first edge of the support plate while the cylindrical member is disposed proximate an adjacent, second edge of the support plate. The alignment member extends above the support plate and is adapted to urge the substrate in a first direction. The cylindrical member has a rotational axis aligned with the first direction. In another aspect of the invention, a load lock chamber is provided that includes a chamber body having a first and a second substrate transfer ports. A support plate is disposed in the chamber body and has a substrate alignment mechanism interacting therewith that aligns the substrate on the support plate.