Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A device includes a substrate and a plurality of photosensitive regions in the substrate. The substrate has a first side and a second side opposite to the first side. The device further includes an interconnect structure on the first side of the substrate, and a plurality of recesses on the second side of the substrate. The plurality of recesses extend into a semiconductor material of the substrate.

Abstract: A silica-containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF.B, M comprises at least one metal or metalloid cation. S is a sulfur-based species. F optionally exists and F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100%. The molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300 or from about 0.5 to about 100, and the molar ratio of a/z is about 0.5 to about 5. B is a hygroscopic solid at a water to solid molar ratio of 0.1-6 and preferably comprises at least one alkaline earth oxide or lanthanide oxide.