Patents by Inventor Hung-Tsung Wang

Hung-Tsung Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070205793
    Abstract: The present invention discloses a method and an apparatus for silent current detection. By measuring voltage of a control output of a driver control circuit for driving an application device, leakage current of the driver control circuit can be detected. If the application device has an energy bandgap, short or open states of the device can further be detected. These detections are achieved, no matter whether the application device is driven or not.
    Type: Application
    Filed: June 30, 2006
    Publication date: September 6, 2007
    Inventor: Hung-Tsung Wang
  • Publication number: 20020070989
    Abstract: The present invention discloses a circuit for driving a heater of a printhead and a device employing the same. The device primarily includes a plurality of driving units and a plurality of electric resistant heaters. Each driving unit includes a transistor or at least one pair of transistors to form a Darlington pair, and has a base node connecting to a correspondent receive node for receiving correspondent address signals. Each electric resistant heater defines a first end connecting to the collector node of each driving unit, and a second end connecting to a current source. The driving unit of the present invention is a common emitter, which results in higher power gain. According to the driving circuit and device of the present invention, the power of electric resistant heaters is more controllable, and the stability of outputing current is improved.
    Type: Application
    Filed: January 24, 2001
    Publication date: June 13, 2002
    Inventors: Li-Chang Yang, Yun-Lung Yang, Hung-Tsung Wang
  • Patent number: 6200885
    Abstract: A III-V semiconductor structure and it producing method is provided. The method for forming a III-V semiconductor structure having a Schottky barrier layer includes the steps of (a) providing a III-V substrate, (b) treating the first barrier layer with a sulfuric acid solution, (c) forming a Schottky barrier layer on the III-V substrate, and (d) forming a metal layer on the second barrier layer. The Ill-V semiconductor structure includes a III-V substrate, a Schottky barrier layer, and a metal layer. The Schottky barrier layer is made of Al2(SO4)3 and In2(SO4)3.
    Type: Grant
    Filed: February 9, 1999
    Date of Patent: March 13, 2001
    Assignee: National Science Council
    Inventors: Hung-Tsung Wang, Ming-Jyh Hwu, Yao-Hwa Wu, Liann-Be Chang
  • Patent number: 6197667
    Abstract: Group III-V composites, which is used to manufacture Schottky contacts having the characteristics of higher energy gap, higher carriers mobility, etc., are applied for manufacturing high-speed devices. Therefore, in there years, Group III-V composite Schottky contacts are continuously being developed. In the invention, the surface treatment of composite semiconductor is used for reduce a surface state and oxidation, thereby increased the Schottky barriers of the Group III-V composite (such as, GaAs, fnP, InAs and InSb) Schottky contacts. During experiments. a phosphorus sulphide/ammonia sulphide solution and hydrogen fluoride solution are used for the surface treatment to increase the amount of sulphur contained on the surfaces of substrates, reduce the surface state and remove various oxides. Furthermore. ultra-thin and really stable sulphur fluoride/phosphorus fluoride layers having high energy gaps are formed on various substrates.
    Type: Grant
    Filed: February 3, 1999
    Date of Patent: March 6, 2001
    Assignee: National Science Council
    Inventors: Liann-Be Chang, Hung-Tsung Wang
  • Patent number: 6087704
    Abstract: Group III-V composites, which is used to manufacture Schottky contacts having the characteristics of higher energy gap, higher carriers mobility, etc., are applied for manufacturing high-speed devices. Therefore, in there years, Group III-V composite Schottky contacts are continuously being developed. In the invention, the surface treatment of composite semiconductor is used for reduce a surface state and oxidation, thereby increased the Schottky barriers of the Group III-V composite (such as, GaAs, InP, InAs and InSb) Schottky contacts. During experiments, a phosphorus sulphide/ammonia sulphide solution and hydrogen fluoride solution are used for the surface treatment to increase the amount of sulphur contained on the surfaces of substrates, reduce the surface state and remove various oxides. Furthermore, ultra-thin and really stable sulphur fluoride/phosphorus fluoride layers having high energy gaps are formed on various substrates.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: July 11, 2000
    Assignee: National Science Council
    Inventors: Liann-Be Chang, Hung-Tsung Wang