Abstract: An improved method and apparatus for measuring the relative reflectance spectra of an observed sample (3) and method and apparatus for autofocussing the sample (3). A broadband visible and ultraviolet beam (42) is split into a sample beam (46) and a reference beam (48). The sample beam (46) is reflected off the surface of the sample (3), and the spectrum of the reflected sample beam (46) is compared to the spectrum of the reference beam (48) to determine the relative reflectance spectrum of the sample (3). A video camera (96) is provided for viewing the sample (3). The autofocus system has a course-focus mode and a fine-focus mode. In the course-focus mode, the sample (3) is focused when the centroid of the sample image is centered on a position sensitive detector (99). In the fine-focus mode, the sample is focused when the intensity of light reaching the detector (99) is minimized.

Abstract: A method and system for performing reflectance measurements of a sample using radiation having UV frequency components (preferably in a broad UV band) and visible frequency components (preferably in a broad band). Preferably, two detectors simultaneously receive a sample beam reflected from the sample surface. One detector generates a signal indicative of the sample beam components in the UV band and the other detector generates a signal indicative of the sample beam components in the visible band. By processing these two signals, the invention enables accurate measurement of the thickness of a very thin film on the sample. Preferably, the system determines a single effective wavelength for the UV radiation incident on the first detector and a single effective wavelength for the visible radiation incident on the second detector. Embodiments of the system can also measure reflectance spectra and refractive indices, and can determine lithographic exposure times.

Abstract: An autofocusing system for a microscope is disclosed. An autofocus target is placed between a colliminating lens and a relay lens of the microscope. The autofocus target contains a pattern of dark areas which are projected onto a specimen and reflected into a CCD camera array. The focus of the microscope is adjusted such that the variation in intensity of light through the pattern is maximized.

Abstract: An automatic system for performing sheet resistivity testing on surface layers of semiconductor wafers, including a wafer handling stage having a platform for carrying a semiconductor wafer, and an arrangement for mounting the platform for rotation about a central axis and for translation of the platform orthogonal to a major surface thereof. A platform drive translates the platform between a wafer test position and a wafer load position, and a stage drive rotates the platform to accurately located angular test positions. A probe handling arrangement includes a carriage for carrying a test probe parallel to the major surface of a wafer on the platform and a carriage drive translates the carriage between a parked position in which a test prove thereon is positioned adjacent and clear of the platform and accurately located test positions along a radius of the platform. The carriage carries a resistivity test probe which includes test probe element for contacting the surface of a semiconductor wafer.