Patents by Inventor Hung-Wei TSAI

Hung-Wei TSAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12315806
    Abstract: A semiconductor device includes a semiconductor die and a conductive structure disposed side-by-side and spaced apart from each other through an insulating encapsulant. The conductive structure includes a first conductor laterally covered by the insulating encapsulant, and a second conductor disposed over and separating from the first conductor. The second conductor includes a first portion laterally covered by the insulating encapsulant and a second portion protruded from the insulating encapsulant, where a ratio of a first standoff height of the first portion and a second standoff height of the second portion ranges from about 0.4 to about 1.5.
    Type: Grant
    Filed: April 25, 2023
    Date of Patent: May 27, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tsung-Fu Tsai, Hou-Ju Huang, Shih-Ting Lin, Szu-Wei Lu, Hung-Wei Tsai
  • Publication number: 20240312940
    Abstract: A semiconductor device and a method for manufacturing the same are provided. The semiconductor device includes a first semiconductor module, a reorientation layer, a second semiconductor module and a plurality of jointing materials. The first semiconductor module has at least one first conductive structure and at least one second conductive structure. The reorientation layer covers part of the second conductive structure to form an opening. The second semiconductor module has at least one third conductive structure and at least one fourth conductive structure. The jointing materials are disposed between the first conductive structure and the third conductive structure, and disposed in the opening.
    Type: Application
    Filed: March 17, 2023
    Publication date: September 19, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hung-Wei TSAI, Chih-Wei WU, Ying-Ching SHIH
  • Publication number: 20230260911
    Abstract: A semiconductor device includes a semiconductor die and a conductive structure disposed side-by-side and spaced apart from each other through an insulating encapsulant. The conductive structure includes a first conductor laterally covered by the insulating encapsulant, and a second conductor disposed over and separating from the first conductor. The second conductor includes a first portion laterally covered by the insulating encapsulant and a second portion protruded from the insulating encapsulant, where a ratio of a first standoff height of the first portion and a second standoff height of the second portion ranges from about 0.4 to about 1.5.
    Type: Application
    Filed: April 25, 2023
    Publication date: August 17, 2023
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tsung-Fu Tsai, Hou-Ju Huang, Shih-Ting Lin, Szu-Wei Lu, Hung-Wei Tsai
  • Patent number: 11670593
    Abstract: An electronic device and a manufacturing method thereof are provided. The method includes at least the following steps. An insulating encapsulant is formed to encapsulate a multi-layered structure and a semiconductor die, where the multi-layered structure includes a first conductor, a diffusion barrier layer on the first conductor, and a metallic layer on the diffusion barrier layer, and the insulating encapsulant at least exposes a portion of the semiconductor die and a portion of the first conductor. A redistribution structure is formed over the insulating encapsulant, the semiconductor die, and the first conductor. The metallic layer is removed to form a recess in the insulating encapsulant. A second conductor is formed in the recess over the diffusion barrier layer, where the first conductor, the diffusion barrier layer, and the second conductor form a conductive structure that is electrically coupled to the semiconductor die through the redistribution structure.
    Type: Grant
    Filed: December 14, 2020
    Date of Patent: June 6, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tsung-Fu Tsai, Hou-Ju Huang, Shih-Ting Lin, Szu-Wei Lu, Hung-Wei Tsai
  • Publication number: 20210098386
    Abstract: An electronic device and a manufacturing method thereof are provided. The method includes at least the following steps. An insulating encapsulant is formed to encapsulate a multi-layered structure and a semiconductor die, where the multi-layered structure includes a first conductor, a diffusion barrier layer on the first conductor, and a metallic layer on the diffusion barrier layer, and the insulating encapsulant at least exposes a portion of the semiconductor die and a portion of the first conductor. A redistribution structure is formed over the insulating encapsulant, the semiconductor die, and the first conductor. The metallic layer is removed to form a recess in the insulating encapsulant. A second conductor is formed in the recess over the diffusion barrier layer, where the first conductor, the diffusion barrier layer, and the second conductor form a conductive structure that is electrically coupled to the semiconductor die through the redistribution structure.
    Type: Application
    Filed: December 14, 2020
    Publication date: April 1, 2021
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tsung-Fu Tsai, Hou-Ju Huang, Shih-Ting Lin, Szu-Wei Lu, Hung-Wei Tsai
  • Patent number: 10867919
    Abstract: An electronic device and the manufacturing method thereof are provided. The electronic device includes a semiconductor die, a conductive structure electrically coupled to the semiconductor die, an insulating encapsulant encapsulating the semiconductor die and the conductive structure, and a redistribution structure disposed on the insulating encapsulant and the semiconductor die. The conductive structure includes a first conductor, a second conductor, and a diffusion barrier layer between the first conductor and the second conductor. The redistribution structure is electrically connected to the semiconductor die and the first conductor of the conductive structure.
    Type: Grant
    Filed: September 19, 2018
    Date of Patent: December 15, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tsung-Fu Tsai, Hou-Ju Huang, Shih-Ting Lin, Szu-Wei Lu, Hung-Wei Tsai
  • Publication number: 20200091077
    Abstract: An electronic device and the manufacturing method thereof are provided. The electronic device includes a semiconductor die, a conductive structure electrically coupled to the semiconductor die, an insulating encapsulant encapsulating the semiconductor die and the conductive structure, and a redistribution structure disposed on the insulating encapsulant and the semiconductor die. The conductive structure includes a first conductor, a second conductor, and a diffusion barrier layer between the first conductor and the second conductor. The redistribution structure is electrically connected to the semiconductor die and the first conductor of the conductive structure.
    Type: Application
    Filed: September 19, 2018
    Publication date: March 19, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tsung-Fu Tsai, Hou-Ju Huang, Shih-Ting Lin, Szu-Wei Lu, Hung-Wei Tsai
  • Publication number: 20180366439
    Abstract: Integrated fan-out packages and methods of forming the same are disclosed. An integrated fan-out package includes a first chip, a redistribution layer structure, a plurality of connection pads, a plurality of dummy patterns, a plurality of micro-bumps, a second chip and an underfill layer. The redistribution layer structure is electrically connected to the first chip. The connection pads are electrically connected to the redistribution layer structure. The dummy patterns are at one side of the connection pads. The micro-bumps are electrically connected to the connection pads. The second chip is electrically connected to the micro-bumps. The underfill layer covers the plurality of dummy patterns and surrounds the micro-bumps.
    Type: Application
    Filed: June 20, 2017
    Publication date: December 20, 2018
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jing-Cheng Lin, Tsung-Fu Tsai, Chen-Hua Yu, Po-Hao Tsai, Shih-Ting Lin, Szu-Wei Lu, Hung-Wei Tsai, Chen-Hsuan Tsai
  • Patent number: 10157888
    Abstract: Integrated fan-out packages and methods of forming the same are disclosed. An integrated fan-out package includes a first chip, a redistribution layer structure, a plurality of connection pads, a plurality of dummy patterns, a plurality of micro-bumps, a second chip and an underfill layer. The redistribution layer structure is electrically connected to the first chip. The connection pads are electrically connected to the redistribution layer structure. The dummy patterns are at one side of the connection pads. The micro-bumps are electrically connected to the connection pads. The second chip is electrically connected to the micro-bumps. The underfill layer covers the plurality of dummy patterns and surrounds the micro-bumps.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: December 18, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jing-Cheng Lin, Tsung-Fu Tsai, Chen-Hua Yu, Po-Hao Tsai, Shih-Ting Lin, Szu-Wei Lu, Hung-Wei Tsai, Chen-Hsuan Tsai
  • Patent number: 9023663
    Abstract: The object of the present invention is to provide a method for preparing a nano-sheet array structure of a Group V-VI semiconductor, comprising: (A) providing an electrolyte containing a hydrogen ion and disposing an auxiliary electrode and a working electrode in the electrolyte, wherein the working electrode comprises a Group V-VI semiconductor bulk; and (B) applying a redox reaction bias to the auxiliary electrode and the working electrode to form a nano-sheet array structure on the bulk.
    Type: Grant
    Filed: April 30, 2014
    Date of Patent: May 5, 2015
    Assignee: National Tsing Hua University
    Inventors: Yu-Lun Chueh, Hung-Wei Tsai, Tsung-Cheng Chan
  • Publication number: 20140329338
    Abstract: The object of the present invention is to provide a method for preparing a nano-sheet array structure of a Group V-VI semiconductor, comprising: (A) providing an electrolyte containing a hydrogen ion and disposing an auxiliary electrode and a working electrode in the electrolyte, wherein the working electrode comprises a Group V-VI semiconductor bulk; and (B) applying a redox reaction bias to the auxiliary electrode and the working electrode to form a nano-sheet array structure on the bulk.
    Type: Application
    Filed: April 30, 2014
    Publication date: November 6, 2014
    Applicant: National Tsing Hua University
    Inventors: Yu-Lun CHUEH, Hung-Wei TSAI, Tsung-Cheng CHAN
  • Publication number: 20140204175
    Abstract: An image conversion method for naked-eye 3D display includes: an image receiving step to receive a 2D image data having a depth information; a sub-pixel arrangement receiving step to receive a sub-pixel arrangement data which is corresponding to a 3D display apparatus and includes a plurality of views; a view ascertaining step to ascertain the view corresponding to at least a sub-pixel of a plurality of sub-pixels by the sub-pixel arrangement data; and a sub-pixel data searching step to search a sub-pixel data of the sub-pixel at the ascertained view from the 2D image data by the depth information. Thereby, the sub-pixel data of these sub-pixels constitute a 3D image data for displaying.
    Type: Application
    Filed: May 28, 2013
    Publication date: July 24, 2014
    Inventors: Jar-Ferr YANG, Hung-Ming WANG, Yi-Hsiang CHIU, Hung-Wei TSAI