Abstract: A resist composition which has as components a phenolic resin component, a photoactive 2,1,5-diazonaphthoquinonesulfonate component (PAC), a solvent component and that does not contain a photo acid generator (PAG). The PAC is a free PAC, a coupled PAC (PACb) or a combination thereof that includes a substituted or unsubstituted 2,1,5-DNQ material or compound onto which a substituted or unsubstituted 2,1,5-DNQ material is appended that, when UV exposed, do not form sulfonic acid. The phenolic resin component is a Novolak derivative in which some or all the free hydroxy groups are protected with an acid cleavable acetal moiety which can include a PACb moiety. A method whereby this composition is used in either thick or thin film photoresist device manufacturing methodologies.

Abstract: The present invention relates to resist compositions comprising a polymer component, a photoacid generator component (PAG), a photoactive diazonaphthoquinone component (PAC), a base component, a solvent component, and optionally, a heterocyclic thiol component. The polymer component is a Novolak derivative, comprising Novolak repeat units with free phenolic hydroxy moieties, and Novolak repeat units comprising phenolic hydroxy moieties protected with an acid cleavable acetal moiety.

Abstract: An elastic bandage includes: a body including a wide portion and a narrow portion, where the wide portion is connected to the narrow portion along an X-axis direction, and along a Y-axis direction perpendicular to the X-axis direction, a width of the wide portion is greater than a width of the narrow portion; a first fixing portion disposed on the wide portion of the body; and a second fixing portion disposed on the narrow portion of the body; where the first fixing portion and the second fixing portion are respectively located at two opposite ends of the body along the X-axis direction.

Abstract: The disclosed subject matter relates to resist compositions that include the following components: Component a) a blend of two Novolak polymers having structures (I) and (II); component b) a diazo-naphthoquinone sulfonate (DNQ-PAC) component which is a single material or a mixture of materials having general formula having structure (III) or having general formula (III-1); is a dissolution enhancer component comprising a polyphenolic compound which is a single compound or a mixture of at least two compounds selected from the group consisting of an oligomeric fractionated Novolak, a compounds having general structure (VI) and a compound having general structure (VII), wherein Rde1, Rde2, Rde3, Rde4 and Rde5 are individually selected from a C-1 to C-4 alkyl; component d) a surfactant; and component e) an organic spin casting solvent, and an optional component f) a heterocyclic thiol.

Abstract: The disclosed subject matter relates to resist compositions comprising a phenolic resin component, a photoactive 2,1,5-diazonaphthoquinonesulfonate component (PAC), a solvent component that do not include or require the use of an added photo acid generator (PAG). The PAC is a free PAC, a coupled PAC (PACb) or a combination thereof that includes a substituted or unsubstituted 2,1,5-DNQ material or compound onto which a substituted or unsubstituted 2,1,5-DNQ material is appended that, when UV exposed, do not form sulfonic acid. The phenolic resin component is a Novolak derivative in which some or all of the free hydroxy groups are protected with an acid cleavable acetal moiety which can include a PACb moiety. The disclosed subject matter also relates to the methods of using the present compositions in either in thick for thin film photoresist device manufacturing methodologies.

Abstract: The present invention relates to resist compositions comprising a polymer component, a photoacid generator component (PAG), a photoactive diazonaphthoquinone component (PAC), a base component, a solvent component, and optionally, a heterocyclic thiol component. The polymer component is a Novolak derivative, comprising Novolak repeat units with free phenolic hydroxy moieties, and Novolak repeat units comprising phenolic hydroxy moieties protected with an acid cleavable acetal moiety.

Abstract: Compounds of formula (I) and polymers comprising at least a structure of formula (II), wherein T1 or T2 are independently of each other a group of Formula (III), Formula (iv) Qa, Qb, Qc, Qd, Qe or Qf are independently of each other O, S or NR1.

Abstract: Compounds of formula (I) and polymers comprising at least a structure of formula (II), wherein T1 or T2 are independently of each other a group of Formula (III), Formula (iv) Qa, Qb, Qc, Qd, Qe or Qf are independently of each other O, S or NR1.