Patents by Inventor Hung-Yang Hsiao

Hung-Yang Hsiao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11923405
    Abstract: The present disclosure is directed to a semiconductor device. The semiconductor device includes a substrate, an insulating layer disposed on the substrate, a first conductive feature disposed in the insulating layer, and a capacitor structure disposed on the insulating layer. The capacitor structure includes a first electrode, a first dielectric layer, a second electrode, a second dielectric layer, and a third electrode sequentially stacked. The semiconductor device also includes a first via connected to the first electrode and the third electrode, a second via connected to the second electrode, and a third via connected to the first conductive feature. A part of the first via is disposed in the insulating layer. A portion of the first conductive feature is directly under the capacitor structure.
    Type: Grant
    Filed: May 23, 2022
    Date of Patent: March 5, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Chih-Fan Huang, Hung-Chao Kao, Yuan-Yang Hsiao, Tsung-Chieh Hsiao, Hsiang-Ku Shen, Hui-Chi Chen, Dian-Hau Chen, Yen-Ming Chen
  • Patent number: 6313230
    Abstract: A process for hydrogenation of conjugated diene polymers comprises hydrogenating said polymer in the presence of hydrogen and a hydrogenation catalyst composition comprising: (a) at least one titanium compound represented by the following formula (a): wherein R1 and R2, which may be the same or different, represent a halogen atom, an alkyl group, an aryl group, an arakyl group, a cycloalkyl group, an aryloxy group, an alkoxy group or a carbonyl group, and Cp* represents a cyclopentadienyl group or a derivative having the formula of C5R5, and R5, which may be the same or different, represents a hydrogen atom, an alkyl group an aralkyl group and an aryl group; and (b) at least one silyl hydride.
    Type: Grant
    Filed: September 21, 1999
    Date of Patent: November 6, 2001
    Assignees: Industrial Technology Research Institute, Chi Mei Corporation
    Inventors: Jing-Cherng Tsai, Wen-Sheng Chang, Yu-Shan Chao, Chih-Nan Chu, Chen-Pao Huang, Hung-Yang Hsiao