Abstract: A device includes a substrate, a first conductive layer on the substrate, a first conductive via, and further conductive layers and conductive vias between the first conductive via and the substrate. The first conductive via is between the substrate and the first conductive layer, and is electrically connected to the first conductive layer. The first conductive via extends through at least two dielectric layers, and has thickness greater than about 8 kilo-Angstroms. An inductor having high quality factor is formed in the first conductive layer and also includes the first conductive via.

Abstract: An engaging mechanism includes a casing, a first engaging member and a second engaging member. The casing has a first engaging recess and a second engaging recess. The first engaging member is slidably disposed in the casing and has a first engaging portion. The second engaging member is rotatably disposed in the casing and has a second engaging portion. When the first engaging member is located at a first lock position, the second engaging member is able to rotate between a second lock position and a second unlock position. When the second engaging member is located at the second unlock position and the first engaging member slides from the first lock position to a first unlock position, the first engaging member pushes the second engaging member to rotate toward the second lock position, such that the second engaging portion blocks the second engaging recess.

Abstract: The present disclosure relates a ferroelectric field-effect transistor (FeFET) device. The FeFET device includes a ferroelectric structure having a first side and a second side. A gate structure is disposed along the first side of the ferroelectric structure, and an oxide semiconductor is disposed along the second side of the ferroelectric structure. The oxide semiconductor has a first semiconductor type. A source region and a drain region are disposed on the oxide semiconductor. The gate structure is laterally between the source region and the drain region. A polarization enhancement structure is arranged on the oxide semiconductor between the source region and the drain region. The polarization enhancement structure includes a semiconductor material or an oxide semiconductor material having a second semiconductor type that is different than the first semiconductor type.

Abstract: A semiconductor device includes a semiconductor stack, a reflective structure, and a conductive structure. The semiconductor stack includes a first semiconductor structure, a second semiconductor structure and an active region located between the first semiconductor structure and the second semiconductor structure. The reflective structure is located at a side of semiconductor stack closed to the first semiconductor structure, and includes a first metal. The conductive structure locates between the reflective structure and the first semiconductor structure, and includes a first region overlapping with the active structure and a second region which does not overlap with the active structure. The first metal in the second region has a concentration smaller than 5 atomic percent.

Abstract: Semiconductor devices and methods of manufacturing are provided. In some embodiments the method includes depositing an etch stop layer over a first hard mask material, the first hard mask material over a gate stack, depositing an interlayer dielectric over the etch stop layer, forming a first opening through the interlayer dielectric, the etch stop layer, and the first hard mask material, the first opening exposing a conductive portion of the gate stack, and treating sidewalls of the first opening with a first dopant to form a first treated region within the interlayer dielectric, a second treated region within the etch stop layer, a third treated region within the first hard mask material, and a fourth treated region within the conductive portion, wherein after the treating the fourth treated region has a higher concentration of the first dopant than the first treated region.

Abstract: An optical transceiver system includes a laser diode device. The laser diode device includes a first submount, a second submount, a laser diode, and a bump. The first submount includes a first electrode. The second submount corresponds to the first submount and includes a second electrode. The laser diode is between the first submount and the second submount, and a side of the laser diode adjacent to the first submount is electrically connected to the first electrode. The laser diode has a waveguide and the waveguide is on a side of the laser diode away from the first submount. The bump corresponds to the waveguide, one of two ends of the bump is electrically connected to the second electrode, and a height of the bump is substantially higher than a height of the waveguide.

Abstract: A method for performing trench filling includes: patterning a base structure to form a plurality of trenches in the patterned base structure; depositing a trench filling material over the patterned base structure to fill the trenches; performing an annealing process at a temperature not greater than 550° C. to anneal the trench filling material; and performing a plasma radical treatment at a temperature not greater than 500° C. to treat the trench filling material.

Abstract: A fan-out semiconductor package includes: a redistribution structure; a functional chip coupled to the redistribution structure; an isolation structure disposed on the redistribution structure and including a body formed with through-holes; a shielding structure disposed on the isolation structure and the redistribution structure; a first conductive pattern structure disposed on the isolation structure and extending through the through-holes of the isolation structure; an encapsulating structure disposed on the isolation structure, the shielding structure and the first conductive pattern structure; and a second conductive pattern structure disposed on the encapsulating structure. A method for manufacturing the fan-out semiconductor package is also disclosed.

Abstract: An electronic device is provided and includes a bearing member defined with a bearing surface, and at least one electronic element disposed on the bearing member, where the electronic element is disposed on the bearing member in a manner that can be inclined relative to the bearing surface, such that when the electronic element is a light-emitting element, the light presented by the electronic element can effectively illuminate a predetermined area.

Abstract: An electronic package includes a pad, a dielectric layer, a bump, and a conductive element. The dielectric layer encapsulates the pad and includes an opening exposing the pad. The bump is disposed over the pad. The conductive element is disposed in the opening between the pad and the bump. The conductive element is configured to mitigate a shrinkage of an electrical path between the pad and the bump occupied by an expansion of the dielectric layer.

Abstract: A semiconductor structure includes a semiconductor substrate and an isolation structure disposed in the semiconductor substrate, wherein the isolation structure includes a first dielectric layer in contact with the semiconductor substrate and a second dielectric layer over the first dielectric layer, wherein the first dielectric layer is between the second dielectric layer and the semiconductor substrate, the first dielectric layer comprises a bottom portion and a sidewall portion, and a thickness of the bottom portion is greater than a thickness of the sidewall portion, wherein the first dielectric layer and the second dielectric layer comprise different materials, and wherein the first dielectric layer comprises a nitride of a semiconductor material.

Abstract: A memory array includes a first memory cell configured to store data, a second memory cell configured to store data and a bit line extending along the first direction, and being over the first memory cell and the second memory cell. The first memory cell and the second memory cell are arranged along a first direction in a first column of memory cells. The bit line includes a first conductor extending in the first direction and being in a first conductive layer, and a second conductor extending in the first direction and being in a second conductive layer different from the first conductive layer.

Abstract: A soft-switching power converter includes a main switch, an energy-releasing switch, and an inductive coupled unit. The main switch is a controllable switch. The energy-releasing switch is coupled to the main switch. The inductive coupled unit is coupled to the main switch and the energy-releasing switch. The inductive coupled unit includes a first inductance, a second inductance coupled to the first inductance, and an auxiliary switch unit. The auxiliary switch unit is coupled to the second inductance to form a closed loop. The main switch and the energy-releasing switch are alternately turned on and turned off. The auxiliary switch unit is controlled to start turning on before the main switch is turned on so as to provide at least one current path.

Abstract: A method of predicting fabric features is disclosed herein, and the method includes following operations. Inputting first fabric information of a first fabric. Generating first fabric feature values of the first fabric. Performing a first calculation on the first fabric information and the first fabric feature values. Generating feature parameters and first predicted feature values of the first fabric by the first calculation. Inputting second fabric information of a second fabric. Generating second fabric feature values of the second fabric according to the second fabric information and the feature parameters. A system of predicting fabric features is also disclosed herein.

Abstract: A semiconductor device includes a substrate, a plurality of active structures, a trench, a lower epitaxy, an upper epitaxy and a bottom barrier portion. The active structures are formed on the substrate and arranged in a first direction. The trench passes through adjacent two of the active structures in a second direction and has a bottom recess. The lower epitaxy is formed on a lower portion of the trench. The upper epitaxy is formed on an upper portion of the trench and separated from the lower epitaxy. The bottom barrier portion is formed on the bottom recess and separates the substrate and the lower epitaxy.

Abstract: A memory circuit includes a first pull down transistor, a first pass gate transistor coupled to the first pull down transistor, a second pull down transistor, a second pass gate transistor and a first metal contact. The second pull down transistor has a first active region located on a first level. The second pass gate transistor has a second active region located on the first level, and being coupled to the second pull down transistor. The first metal contact extends from the first active region to the second active region, being located on a second level, and electrically coupling a drain of the second pull down transistor to a drain of the second pass gate transistor. The first pass gate transistor, the second pass gate transistor, the first pull down transistor and the second pull down transistor are part of a four transistor (4T) memory cell.

Abstract: The present disclosure describes a method for forming capping layers configured to prevent the migration of out-diffused cobalt atoms into upper metallization layers In some embodiments, the method includes depositing a cobalt diffusion barrier layer on a liner-free conductive structure that includes ruthenium, where depositing the cobalt diffusion barrier layer includes forming the cobalt diffusion barrier layer self-aligned to the liner-free conductive structure. The method also includes depositing, on the cobalt diffusion barrier layer, a stack with an etch stop layer and dielectric layer, and forming an opening in the stack to expose the cobalt diffusion barrier layer. Finally, the method includes forming a conductive structure on the cobalt diffusion barrier layer.

Abstract: A single-inductor multi-output (SIMO) DC-DC buck converter includes a first switch, a second switch, a third switch, a fourth switch, an inductor, an error amplifier circuit, an inductor current ripple emulator circuit, a comparison circuit, and a control circuit. The error amplifier circuit generates a first error signal and a second error signal according to the output voltages of the SIMO DC-DC buck converter. The inductor current ripple emulator circuit generates a sensed voltage according to a first terminal voltage and a second terminal voltage of the inductor. The comparison circuit generates a first comparison result and a second comparison result according to the first error signal, the second error signal, and the sensed voltage. The control circuit generates first to fourth control signals for respectively controlling the first to fourth switches according to the first comparison result and the second comparison result.

Abstract: In an embodiment, a method includes: forming a sacrificial spacer in a contact opening, the contact opening exposing a source/drain region; depositing a spacer layer on a sidewall of the sacrificial spacer and on a top surface of the source/drain region; forming a protective dielectric on the spacer layer and in the contact opening; removing the sacrificial spacer to form a recess adjacent the spacer layer; and forming a dielectric cap in an upper portion of the recess by redepositing a material of the protective dielectric and a material of the spacer layer in the upper portion of the recess, the dielectric cap sealing a lower portion of the recess to form a void.

Abstract: A duty cycle control circuit generates a duty cycle control signal for controlling the duty cycle of a DC-DC buck conversion signal. The duty cycle control circuit includes: a dual ramp generator for generating a first ramp signal and a second ramp signal having the same frequency and different phases; a first comparator for comparing the first ramp signal with a feedback signal to generate a first control signal; a second comparator for comparing the second ramp signal with the feedback signal to generate a second control signal; and a logical circuit for performing a first predetermined logical operation according to the first control signal and a first conduction-control signal to generate a first part of the duty cycle control signal, and performing a second predetermined logical operation according to the second control signal and a second conduction-control signal to generate a second part of the duty cycle control signal.