Abstract: A method of forming a silver catalyst layer in chemical plating includes providing a substrate; applying a silver-containing solution onto the substrate; and applying energy of activation to the silver-containing solution to form a silver catalyst layer over the substrate. The silver-containing solution includes silver ions, a diamine compound, a carboxylic acid compound, and a solvent. In addition, the substrate having the silver catalyst layer thereon can be immersed into a chemical plating solution to form a metal layer over the silver catalyst layer.

Abstract: A method of forming a silver catalyst layer in chemical plating includes providing a substrate; applying a silver-containing solution onto the substrate; and applying energy of activation to the silver-containing solution to form a silver catalyst layer over the substrate. The silver-containing solution includes silver ions, a diamine compound, a carboxylic acid compound, and a solvent. In addition, the substrate having the silver catalyst layer thereon can be immersed into a chemical plating solution to form a metal layer over the silver catalyst layer.

Abstract: A plasma treatment method is provided. The method includes generating a planar plasma in a plasma treatment chamber, observing an effective influence region of the planar plasma by using an optical observation system in which an observation lens has a transparent substrate and a fluorescent coating thereon, adjusting a location of the observation lens to observe a brightness change of the fluorescent coating and the transparent substrate to obtain a location and a thickness range of the effective influence region of the planar plasma, and then adjusting a location of the observation lens to observe a brightness change of the fluorescent coating and the transparent substrate to obtain a location and a thickness range of the effective influence region of the planar plasma. A location of a sample is adjusted to within the effective influence region, and a plasma treatment is then performed on the sample.

Abstract: A plasma treatment method is provided. The method includes generating a planar plasma in a plasma treatment chamber, observing an effective influence region of the planar plasma by using an optical observation system in which an observation lens has a transparent substrate and a fluorescent coating thereon, adjusting a location of the observation lens to observe a brightness change of the fluorescent coating and the transparent substrate to obtain a location and a thickness range of the effective influence region of the planar plasma, and then adjusting a location of the observation lens to observe a brightness change of the fluorescent coating and the transparent substrate to obtain a location and a thickness range of the effective influence region of the planar plasma. A location of a sample is adjusted to within the effective influence region, and a plasma treatment is then performed on the sample.

Abstract: A plasma treatment apparatus and a plasma treatment method are provided. The apparatus includes a chamber, a planar plasma-generating electrode, a sample suspension and holding system, and an optical observation system. The chamber defines a processing inner chamber, and the top portion of the chamber has a window. The planar plasma-generating electrode is located in the processing inner chamber for generating a planar plasma. The sample suspension and holding system is disposed opposite to the planar plasma-generating electrode in the processing inner chamber to suspend and hold a sample. The optical observation system is located in the processing inner chamber adjacent to the sample suspension and holding system to measure the thickness range of a planar plasma effective influence region through the window of the chamber.

Abstract: A plasma treatment apparatus and a plasma treatment method are provided. The apparatus includes a chamber, a planar plasma-generating electrode, a sample suspension and holding system, and an optical observation system. The chamber defines a processing inner chamber, and the top portion of the chamber has a window. The planar plasma-generating electrode is located in the processing inner chamber for generating a planar plasma. The sample suspension and holding system is disposed opposite to the planar plasma-generating electrode in the processing inner chamber to suspend and hold a sample. The optical observation system is located in the processing inner chamber adjacent to the sample suspension and holding system to measure the thickness range of a planar plasma effective influence region through the window of the chamber.

Abstract: A light-emitting device utilizing gaseous sulfur compounds is provided. This device includes a first substrate with an energy transmission coil disposed thereover, a dielectric barrier layer embedding underneath the energy transmission coil, a sealant wall circling around the dielectric barrier layer, a second substrate disposed against the first substrate and supported by the sealant wall, and a high-frequency oscillating power supply connected to the energy transmission coil. Normally the second substrate is a transparent substrate. Between the first and second substrates thereby defines an inner chamber, wherein a gaseous reactant comprising an inert gas and a sulfur-containing gas is filled. While powering up, the energy transmission coil induces an electromagnetic field within the inner chamber between the two substrates as causing decomposing/regenerating process cycles of sulfur molecules to lighting up the light-emitting device.

Abstract: A light-emitting device having an excited sulfur medium by inductively-coupled electrons is provided. This device includes a substrate, an energy transmission coil disposed over the substrate, a transparent discharge cavity disposed over the energy transmission coil, having a substantially planar top and bottom surface, and a high-frequency oscillating power supply coupled to the energy transmission coil. While power up, the energy transmission coil induces an electromagnetic field within the transparent discharge cavity of the light-emitting device. In one embodiment, the transparent discharge cavity includes a sulfur-containing medium disposed within the transparent discharge cavity, and a buffer gas or a plurality of buffer gasses filling inner space of the transparent discharge cavity.

Abstract: A light-emitting device having an excited sulfur medium by inductively-coupled electrons is provided. This device includes a substrate, an energy transmission coil disposed over the substrate, a transparent discharge cavity disposed over the energy transmission coil, having a substantially planar top and bottom surface, and a high-frequency oscillating power supply coupled to the energy transmission coil. While power up, the energy transmission coil induces an electromagnetic field within the transparent discharge cavity of the light-emitting device. In one embodiment, the transparent discharge cavity includes a sulfur-containing medium disposed within the transparent discharge cavity, and a buffer gas or a plurality of buffer gasses filling inner space of the transparent discharge cavity.

Abstract: A light-emitting device utilizing gaseous sulfur compounds is provided. This device includes a first substrate with an energy transmission coil disposed thereover, a dielectric barrier layer embedding underneath the energy transmission coil, a sealant wall circling around the dielectric barrier layer, a second substrate disposed against the first substrate and supported by the sealant wall, and a high-frequency oscillating power supply connected to the energy transmission coil. Normally the second substrate is a transparent substrate. Between the first and second substrates thereby defines an inner chamber, wherein a gaseous reactant comprising an inert gas and a sulfur-containing gas is filled. While powering up, the energy transmission coil induces an electromagnetic field within the inner chamber between the two substrates as causing decomposing/regenerating process cycles of sulfur molecules to lighting up the light-emitting device.