Patents by Inventor Hunter Chung

Hunter Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6315834
    Abstract: A method for removing extraneous matters from a stainless device is provided. The method includes the steps of (a) providing a container for holding a fluorine-containing neutral solution therein, (b) immersing said stainless device in said fluorine-containing neutral solution to remove said extraneous matters from said stainless device, and (c) heating and swirling said fluorine-containing solution. The fluorine-containing neutral solution is made from neutralizing hydrofluoric acid (HF) with ammonium hydroxide (NH4OH), neutralizing hydrofluoric acid (HF) with ammonium fluoride (NH4F), or dissolving ammonium acid fluoride (NH4F) in a deionized water (DIW).
    Type: Grant
    Filed: October 25, 1999
    Date of Patent: November 13, 2001
    Assignees: Utek Semiconductor Corp., United Microelectronics Corp.
    Inventors: Ping-Chung Chung, Tsung-Lin Lu, Hunter Chung, Chin-Hsien Chen, Weng-Yi Chen, Jack Yao, Chienfeng Chen
  • Patent number: 6187080
    Abstract: An exhaust gas treatment apparatus for treating exhaust gas generated in semiconductor manufacturing processes. It includes a main pipe, a gas vortex means, a water vortex means, an U pipe and a discharge pipe. The main pipe transforms the exhaust gases to waste powder which are discharged out through the U pipe and the discharge pipe. The gas vortex means and water vortex means are located below the main pipe for generating annular and even downward gas flow and water flow at the outlet of the main pipe for preventing reflux of waste powder from entering into the main pipe. Waste powder thus won't deposit around the outlet. Scraper in the main pipe won't be stuck or deformed. Waste powder may be discharged out through the U pipe and discharge pipe smoothly and efficiently.
    Type: Grant
    Filed: August 9, 1999
    Date of Patent: February 13, 2001
    Assignee: United Microelectronics Inc.
    Inventors: Chung Ping-Chung, Lu Tsung-Lin, Chi-Hsien Chen, Jing-Yi Huang, Ju-Long Lee, Hunter Chung, Chien-Feng Chen
  • Patent number: 6095063
    Abstract: An exhaust treatment machine. The exhaust treatment machine has a burning chamber and a wet chamber. Water is injected into the wet chamber by a water inlet at a bottom portion of the wet chamber. At least two rotor blades are installed over the bottom of the wet chamber to generate a vortex flow of the water. Thus, the vortex flow of the water acentrically flushes away the product produced in the burning chamber and removes it via a drainpipe. Furthermore, those clots agglomerated from the powers produced in the burning chamber are fragmented by the rotor blades. The problems of blocking the drainpipe is thus resolved.
    Type: Grant
    Filed: August 26, 1999
    Date of Patent: August 1, 2000
    Assignees: UTEK Semiconductor Corp., United Microelectronics Corp.
    Inventors: Ju-Long Lee, Hunter Chung