Patents by Inventor Hury Ming Chong

Hury Ming Chong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask and method to pattern chromeless phase lithography contact hole
    Patent number: 7655388
    Abstract: A chromeless phase shift mask and Method for making and using. The A chromeless phase shift mask is used to pattern contact holes. The chromeless phase shift mask preferably comprises: a first phase shift region and a second phase shift region; the first region is comprised of a unit cell which is comprised of a rectangular center section and at least three rectangular sections (legs) outwards extending from the rectangular center section. The second region is adjacent to said first region. The interference between the first and second phase shift regions creates a contact hole pattern.
    Type: Grant
    Filed: January 3, 2005
    Date of Patent: February 2, 2010
    Assignee: Chartered Semiconductor Manufacturing, Ltd.
    Inventors: Sia Kim Tan, Soon Yoeng Tan, Qun Ying Lin, Hury Ming Chong, Liang Choo Hsia