Patents by Inventor Huyndon JUNG

Huyndon JUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230109887
    Abstract: Stack fault inspection apparatus and method are disclosed. The apparatus includes a sample stage fixing the silicon carbide substrate and allow the incident light to scan the substrate surface; an incident light source configured to irradiate a vertical illumination light of a wavelength corresponding to an energy greater than a band gap energy of the substrate to at least a portion of a surface of the substrate in a direction substantially perpendicular to the surface of the substrate; a photomultiplier tube (PMT) configured to obtain a photoluminescence mapping image having a wavelength corresponding to the band gap energy of the substrate from the surface of the substrate; and a controller configured to process the mapping image and identify stacking faults.
    Type: Application
    Filed: April 20, 2022
    Publication date: April 13, 2023
    Inventors: Huyndon JUNG, Min-jung LEE
  • Publication number: 20230113093
    Abstract: Stack fault inspection apparatus and method are disclosed. The apparatus includes a sample stage fixing the silicon carbide substrate and allow the incident light to scan the substrate surface; an incident light source configured to irradiate a vertical illumination light of a wavelength corresponding to an energy greater than a band gap energy of the substrate to at least a portion of a surface of the substrate in a direction substantially perpendicular to the surface of the substrate; a photomultiplier tube (PMT) configured to obtain a photoluminescence mapping image having a wavelength corresponding to the band gap energy of the substrate from the surface of the substrate; and a controller configured to process the mapping image and identify stacking faults.
    Type: Application
    Filed: April 26, 2022
    Publication date: April 13, 2023
    Inventors: Huyndon JUNG, Min-jung LEE
  • Patent number: 11009461
    Abstract: The present disclosure relates to a substrate defect measuring apparatus for detecting defects inside a substrate by photoluminescence and detecting defects outside the substrate by using the scattering of incident light for generating photoluminescence, and provides an apparatus for constituting an optical system in order to measure scattered and/or reflected light together in a procedure of measuring the photoluminescence, thereby shortening a measurement time.
    Type: Grant
    Filed: November 22, 2017
    Date of Patent: May 18, 2021
    Assignee: ETAMAX CO., LTD
    Inventors: Huyndon Jung, Youngbeom Kim
  • Publication number: 20190302025
    Abstract: The present disclosure relates to a substrate defect measuring apparatus for detecting defects inside a substrate by photoluminescence and detecting defects outside the substrate by using the scattering of incident light for generating photoluminescence, and provides an apparatus for constituting an optical system in order to measure scattered and/or reflected light together in a procedure of measuring the photoluminescence, thereby shortening a measurement time.
    Type: Application
    Filed: November 22, 2017
    Publication date: October 3, 2019
    Inventors: Huyndon JUNG, Youngbeom KIM