Patents by Inventor Hwa Joong Lim

Hwa Joong Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • In-situ chamber cleaning for an RTP chamber
    Patent number: 8821643
    Abstract: A method of cleaning a chamber used for annealing doped wafer substrates. In one embodiment the method provides removing dopants deposited in an annealing chamber after an annealing process of a doped substrate by flowing one or more volatilizing gases into the annealing chamber, applying heat to volatilize the deposited dopants in the annealing chamber, and exhausting the chamber to remove volatilized dopants from the annealing chamber.
    Type: Grant
    Filed: November 12, 2012
    Date of Patent: September 2, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Balasubramanian Ramachandran, Tae Jung Kim, Jung Hoon Sun, Joung Woo Lee, Hwa Joong Lim, Sang Phil Lee, Joseph M. Ranish
  • IN-SITU CHAMBER CLEANING FOR AN RTP CHAMBER
    Publication number: 20130178072
    Abstract: A method of cleaning a chamber used for annealing doped wafer substrates. In one embodiment the method provides removing dopants deposited in an annealing chamber after an annealing process of a doped substrate by flowing one or more volatilizing gases into the annealing chamber, applying heat to volatilize the deposited dopants in the annealing chamber, and exhausting the chamber to remove volatilized dopants from the annealing chamber.
    Type: Application
    Filed: November 12, 2012
    Publication date: July 11, 2013
    Inventors: BALASUBRAMANIAN RAMACHANDRAN, Tae Jung Kim, Jung Hoon Sun, Joung Woo Lee, Hwa Joong Lim, Sang Phil Lee, Joseph M. Ranish
  • IN-SITU CHAMBER CLEANING FOR AN RTP CHAMBER
    Publication number: 20080115808
    Abstract: A method of cleaning a chamber used for annealing doped wafer substrates. In one embodiment the method provides removing dopants deposited in an annealing chamber after an annealing process of a doped substrate by flowing one or more volatilizing gases into the annealing chamber, applying heat to volatilize the deposited dopants in the annealing chamber, and exhausting the chamber to remove volatilized dopants from the annealing chamber.
    Type: Application
    Filed: November 20, 2006
    Publication date: May 22, 2008
    Inventors: Balasubramanian Ramachandran, Tae Jung Kim, Jung Hoon Sun, Joung Woo Lee, Hwa Joong Lim, Sang Phil Lee, Joseph Michael Ranish