Patents by Inventor Hwa-Jun Cha

Hwa-Jun Cha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160067522
    Abstract: The present disclosure relates to a method for skin improvement using low-dose radiation, and the low-dose radiation can exhibit excellent effects of improving skin wrinkles, improving skin barriers, improving skin thickness, improving skin elasticity, and improving skin moisture through the mechanisms of promoting the growth of normal human dermal fibroblasts, increasing the collagen synthesis within the normal human dermal fibroblast, or reducing the metalloproteinase synthesis within the normal human dermal fibroblasts, thus being effectively used for skin improvement. Additionally, the low-dose radiation of the present disclosure can exhibit excellent hair growth-promoting effect through the mechanisms of promoting the growth of human dermal papilla cells or activating hair follicle cells, thus being useful for the improvement of promoting hair growth.
    Type: Application
    Filed: August 28, 2015
    Publication date: March 10, 2016
    Inventors: SUNG-KWAN AN, Seung-Hee Bae, Hwa-Jun Cha, Ka-Ram Kim, Sang-Hun Shin, Hyun-Hee Jang