Patents by Inventor Hwa Nien Yu

Hwa Nien Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9230467
    Abstract: A display module and an assembly method thereof are provided. The display module includes a display region, at least one connection terminal, and a plurality of connective lines. The display region, the connection terminal, and the connective lines are disposed on a same flexible substrate. A plurality of pixels is arranged within the display region. The connection terminal is arranged at an extension portion of a non-display region of the flexible substrate. The connective lines respectively connect the pixels in the display region to the connection terminal at the extension portion. The connection terminal is connected to an external circuit for receiving signals and transmitting the same to the display region.
    Type: Grant
    Filed: May 12, 2011
    Date of Patent: January 5, 2016
    Assignee: Industrial Technology Research Institute
    Inventors: Janglin Chen, Tzeng-Shii Tsai, Hwa-Nien Yu
  • Publication number: 20120056859
    Abstract: A display module and an assembly method thereof are provided. The display module includes a display region, at least one connection terminal, and a plurality of connective lines. The display region, the connection terminal, and the connective lines are disposed on a same flexible substrate. A plurality of pixels is arranged within the display region. The connection terminal is arranged at an extension portion of a non-display region of the flexible substrate. The connective lines respectively connect the pixels in the display region to the connection terminal at the extension portion. The connection terminal is connected to an external circuit for receiving signals and transmitting the same to the display region.
    Type: Application
    Filed: May 12, 2011
    Publication date: March 8, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Janglin Chen, Tzeng-Shii Tsai, Hwa-Nien Yu
  • Patent number: 4157269
    Abstract: A method consisting of a sequence of process steps for fabricating a bipolar transistor having base contacts formed of polysilicon material and an emitter contact formed of polysilicon material or metal. The emitter contact is self-aligned to the base contacts by the use of process steps wherein a single mask aperture is used for defining the base contacts and the emitter.
    Type: Grant
    Filed: June 6, 1978
    Date of Patent: June 5, 1979
    Assignee: International Business Machines Corporation
    Inventors: Tak Hung Ning, Hwa Nien Yu
  • Patent number: 4116721
    Abstract: Positive charges that appear in the gate silicon oxide insulation of a silicon insulated gate field-effect transistor device may be controlled through neutralization by injecting electrons in to the gate oxide from the substrate after the device is complete and metallized by irradiating the back of the substrate with light in the presence of a voltage bias.
    Type: Grant
    Filed: November 25, 1977
    Date of Patent: September 26, 1978
    Assignee: International Business Machines Corporation
    Inventors: Tak Hung Ning, Carlton Morris Osburn, Hwa Nien Yu