Patents by Inventor Hwa Seop Oh

Hwa Seop Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing a group III nitride substrate using a chemical lift-off process
    Patent number: 9171717
    Abstract: The non-polar or semi-polar group III nitride layer disclosed in a specific example of the present invention can be used for substrates for various electronic devices, wherein problems of conventional polar group III nitride substrates are mitigated or solved by using the nitride substrate of the invention, and further the nitride substrate can be manufactured by a chemical lift-off process.
    Type: Grant
    Filed: November 4, 2011
    Date of Patent: October 27, 2015
    Assignee: KOREA PHOTONICS TECHNOLOGY INSTITUTE
    Inventors: Jin Woo Ju, Jong Hyeob Baek, Hyung Jo Park, Sang Hern Lee, Tak Jung, Ja Yeon Kim, Hwa Seop Oh, Tae Hoon Chung, Yoon Seok Kim, Dae Woo Jeon
  • METHOD FOR MANUFACTURING A GROUP III NITRIDE SUBSTRATE USING A CHEMICAL LIFT-OFF PROCESS
    Publication number: 20130193558
    Abstract: The non-polar or semi-polar group III nitride layer disclosed in a specific example of the present invention can be used for substrates for various electronic devices, wherein problems of conventional polar group III nitride substrates are mitigated or solved by using the nitride substrate of the invention, and further the nitride substrate can be manufactured by a chemical lift-off process.
    Type: Application
    Filed: November 4, 2011
    Publication date: August 1, 2013
    Applicant: Korea Photonics Technology Institute
    Inventors: Jin Woo Ju, Jong Hyeob Baek, Hyung Jo Park, Sang Hern Lee, Tak Jung, Ja Yeon Kim, Hwa Seop Oh, Tae Hoon Chung, Yoon Seok Kim, Dae Woo Jeon