Abstract: A substrate treating apparatus is provided which includes a housing which provides a space in which a process is performed; a spin head which supports and rotates a substrate; and a spray unit which sprays a fluid on the substrate. The spray unit comprises a first nozzle mistily spraying a first fluid; and second nozzle spraying a second fluid.

Abstract: A substrate treating apparatus is provided which includes a treatment container which provides a space in which a substrate is washed; a substrate support member which is included in the space and supports the substrate; a spray member which selectively sprays a plurality of fluids on the substrate seated on the substrate support member. The treatment container comprises a plurality of recovery containers the entrances of which are stacked in an up-and-down direction to receive a fluid within the space; a first elevation member which moves the plurality of recovery containers in an up-and-down direction; and a second elevation member which relatively moves a part of the plurality of recovery containers in an up-and-down direction with respect to the remaining recovery containers.

Abstract: A solution supplying unit includes a body, a first supplying tube and a second supplying tube. The body includes a chamber having a substantially circular cross-section to receive a solution and an out-flowing part connected to the chamber to flow out the solution. The first supplying tube is disposed at a side of the body, tangentially connected to the chamber, and supplying a first solution into the chamber to rotate the first solution in the chamber. The second supplying tube has an end portion, and supplying a second solution into the chamber to mix the first solution with the second solution. The end portion is formed through the body and is adjacent to a central axis of the body.