Patents by Inventor Hwan J. Jeong
Hwan J. Jeong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11899198Abstract: A digital lithography system may adjust a wavelength of the light source to compensate for tilt errors in micromirrors while maintaining a perpendicular direction for the reflected light. Adjacent pixels may have a phase shift that is determined by an optical path difference between their respective light beams. This phase shift may be preselected to be any value by generating a corresponding wavelength at the light source based on the optical path difference. To generate a specific wavelength corresponding to the desired phase shift, the light source may produce multiple light components that have wavelengths that bracket the wavelength of the selected phase shift. The intensities of these components may then be controlled individually to produce an effect that approximates the selected phase shift on the substrate.Type: GrantFiled: May 23, 2022Date of Patent: February 13, 2024Assignee: Applied Materials, Inc.Inventors: Thomas L. Laidig, Christopher Bencher, Hwan J. Jeong, Uwe Hollerbach
-
Publication number: 20230408807Abstract: A digital lithography system may adjust a wavelength of the light source to compensate for tilt errors in micromirrors while maintaining a perpendicular direction for the reflected light. Adjacent pixels may have a phase shift that is determined by an optical path difference between their respective light beams. This phase shift may be preselected to be any value by generating a corresponding wavelength at the light source based on the optical path difference. To generate a specific wavelength corresponding to the desired phase shift, the light source may produce multiple light components that have wavelengths that bracket the wavelength of the selected phase shift. The intensities of these components may then be controlled individually to produce an effect that approximates the selected phase shift on the substrate.Type: ApplicationFiled: May 23, 2022Publication date: December 21, 2023Applicant: Applied Materials, Inc.Inventors: Thomas L. Laidig, Christopher Bencher, Hwan J. Jeong, Uwe Hollerbach
-
Patent number: 11243480Abstract: A lithography system for generating grating structures is provided having a multiple column imaging system located on a bridge capable of moving in a cross-scan direction, a mask having a grating pattern with a fixed spatial frequency located in an object plane of the imaging system, a multiple line alignment mark aligned to the grating pattern and having a fixed spatial frequency, a platen configured to hold and scan a substrate, a scanning system configured to move the platen over a distance greater than a desired length of the grating pattern on the substrate, a longitudinal encoder scale attached to the platen and oriented in a scan direction and at least two encoder scales attached to the platen and arrayed in the cross-scan direction wherein the scales contain periodically spaced alignment marks having a fixed spatial frequency.Type: GrantFiled: May 31, 2019Date of Patent: February 8, 2022Assignee: Applied Materials, Inc.Inventors: David Markle, Hwan J. Jeong
-
Publication number: 20210191285Abstract: A lithography system for generating grating structures is provided having a multiple column imaging system located on a bridge capable of moving in a cross-scan direction, a mask having a grating pattern with a fixed spatial frequency located in an object plane of the imaging system, a multiple line alignment mark aligned to the grating pattern and having a fixed spatial frequency, a platen configured to hold and scan a substrate, a scanning system configured to move the platen over a distance greater than a desired length of the grating pattern on the substrate, a longitudinal encoder scale attached to the platen and oriented in a scan direction and at least two encoder scales attached to the platen and arrayed in the cross-scan direction wherein the scales contain periodically spaced alignment marks having a fixed spatial frequency.Type: ApplicationFiled: May 31, 2019Publication date: June 24, 2021Inventors: David MARKLE, Hwan J. JEONG
-
Patent number: 10983441Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels. The spatial light modulator is useful for pixel blending by forming a plurality of partially overlapping images, at least one of the plurality of partially overlapping images having at least two pixels formed by a first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween. The spatial light modulator results in improved resolution, depth of focus, and pixel blending.Type: GrantFiled: August 5, 2019Date of Patent: April 20, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Thomas L. Laidig, Hwan J. Jeong
-
Patent number: 10495983Abstract: Methods are provided and generally relate to adjusting exposure parameters of a substrate in response to an overlay error. The method includes partitioning the substrate into one or more sections. Each section corresponds to an image projection system. A total overlay error of a first layer deposited on the substrate is determined. For each section, a sectional overlay error is calculated. For each overlap area, in which two or more sections overlap, an average overlay error is calculated. The exposure parameters are adjusted in response to the total overlay error.Type: GrantFiled: September 28, 2018Date of Patent: December 3, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Tamer Coskun, Hwan J. Jeong
-
Publication number: 20190361353Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels. The spatial light modulator is useful for pixel blending by forming a plurality of partially overlapping images, at least one of the plurality of partially overlapping images having at least two pixels formed by a first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween. The spatial light modulator results in improved resolution, depth of focus, and pixel blending.Type: ApplicationFiled: August 5, 2019Publication date: November 28, 2019Inventors: Thomas L. LAIDIG, Hwan J. JEONG
-
Patent number: 10451564Abstract: A method for qualitatively detecting aberration and determine aberration types in a photolithography system is disclosed. The method includes using a digital micromirror device (DMD) pattern to project an optical signal on a reflective substrate, acquiring a return optical signal reflected from the substrate at different focus heights (ranging from above to below best focus), forming a through focus curve based off of the return optical signal at various focus heights, comparing the through focus curve to a predetermined curve—the predetermined curve being a function of focus, and determining if a lens aberration is present. By using the existing hardware of the photolithography system to determine if a lens aberration exists, costs are maintained at a minimum and the DMD pattern creates a through focus curve (TFC) image in less than five minutes allowing for quick correction.Type: GrantFiled: April 25, 2018Date of Patent: October 22, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Qin Zhong, Antoine P. Manens, Hwan J. Jeong
-
Patent number: 10429744Abstract: Methods and apparatuses are provided that determine an offset between actual feature/mark locations and the designed feature/mark locations in a maskless lithography system. For example, in one embodiment, a method is provided that includes opening a camera shutter in a maskless lithography system. Light is directed from a configuration of non-adjacent mirrors in a mirror array towards a first substrate layer. An image of the first substrate layer on a camera is captured and accumulated. Light is directed and images are captured repeatedly using different configurations of non-adjacent mirrors to cover an entire field-of-view (FOV) of the camera on the first substrate layer. Thereafter, the camera shutter is closed and the accumulated image is stored in memory.Type: GrantFiled: June 22, 2018Date of Patent: October 1, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Tamer Coskun, Hwan J. Jeong
-
Patent number: 10372042Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels. The spatial light modulator is useful for pixel blending by forming a plurality of partially overlapping images, at least one of the plurality of partially overlapping images having at least two pixels formed by a first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween. The spatial light modulator results in improved resolution, depth of focus, and pixel blending.Type: GrantFiled: January 15, 2018Date of Patent: August 6, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Thomas L. Laidig, Hwan J. Jeong
-
Publication number: 20190128825Abstract: A method for qualitatively detecting aberration and determine aberration types in a photolithography system is disclosed. The method includes using a digital micromirror device (DMD) pattern to project an optical signal on a reflective substrate, acquiring a return optical signal reflected from the substrate at different focus heights (ranging from above to below best focus), forming a through focus curve based off of the return optical signal at various focus heights, comparing the through focus curve to a predetermined curve—the predetermined curve being a function of focus, and determining if a lens aberration is present. By using the existing hardware of the photolithography system to determine if a lens aberration exists, costs are maintained at a minimum and the DMD pattern creates a through focus curve (TFC) image in less than five minutes allowing for quick correction.Type: ApplicationFiled: April 25, 2018Publication date: May 2, 2019Inventors: Qin ZHONG, Antoine P. MANENS, Hwan J. JEONG
-
Publication number: 20190033729Abstract: Methods are provided and generally relate to adjusting exposure parameters of a substrate in response to an overlay error. The method includes partitioning the substrate into one or more sections. Each section corresponds to an image projection system. A total overlay error of a first layer deposited on the substrate is determined. For each section, a sectional overlay error is calculated. For each overlap area, in which two or more sections overlap, an average overlay error is calculated. The exposure parameters are adjusted in response to the total overlay error.Type: ApplicationFiled: September 28, 2018Publication date: January 31, 2019Inventors: Tamer COSKUN, Hwan J. JEONG
-
Publication number: 20180373161Abstract: Methods and apparatuses are provided that determine an offset between actual feature/mark locations and the designed feature/mark locations in a maskless lithography system. For example, in one embodiment, a method is provided that includes opening a camera shutter in a maskless lithography system. Light is directed from a configuration of non-adjacent mirrors in a mirror array towards a first substrate layer. An image of the first substrate layer on a camera is captured and accumulated. Light is directed and images are captured repeatedly using different configurations of non-adjacent mirrors to cover an entire field-of-view (FOV) of the camera on the first substrate layer. Thereafter, the camera shutter is closed and the accumulated image is stored in memory.Type: ApplicationFiled: June 22, 2018Publication date: December 27, 2018Inventors: Tamer Coskun, Hwan J. Jeong
-
Patent number: 10133193Abstract: Embodiments disclosed herein generally relate to adjusting exposure parameters of a substrate in response to an overlay error. The method includes partitioning the substrate into one or more sections. Each section corresponds to an image projection system. A total overlay error of a first layer deposited on the substrate is determined. For each section, a sectional overlay error is calculated. For each overlap area, in which two or more sections overlap, an average overlay error is calculated. The exposure parameters are adjusted in response to the total overlay error.Type: GrantFiled: July 7, 2017Date of Patent: November 20, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Tamer Coskun, Hwan J. Jeong
-
Publication number: 20180210346Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels. The spatial light modulator is useful for pixel blending by forming a plurality of partially overlapping images, at least one of the plurality of partially overlapping images having at least two pixels formed by a first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween. The spatial light modulator results in improved resolution, depth of focus, and pixel blending.Type: ApplicationFiled: January 15, 2018Publication date: July 26, 2018Inventors: Thomas L. LAIDIG, Hwan J. JEONG
-
Publication number: 20180024444Abstract: Embodiments disclosed herein generally relate to adjusting exposure parameters of a substrate in response to an overlay error. The method includes partitioning the substrate into one or more sections. Each section corresponds to an image projection system. A total overlay error of a first layer deposited on the substrate is determined. For each section, a sectional overlay error is calculated. For each overlap area, in which two or more sections overlap, an average overlay error is calculated. The exposure parameters are adjusted in response to the total overlay error.Type: ApplicationFiled: July 7, 2017Publication date: January 25, 2018Inventors: Tamer COSKUN, Hwan J. JEONG
-
Patent number: 9304410Abstract: Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.Type: GrantFiled: December 30, 2013Date of Patent: April 5, 2016Assignee: Periodic Structures Inc.Inventors: David A. Markle, Rudolf H. Hendel, John S. Petersen, Hwan J. Jeong
-
Publication number: 20150331330Abstract: Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.Type: ApplicationFiled: December 30, 2013Publication date: November 19, 2015Applicant: Periodic Structures, Inc.Inventors: David A. Markle, Rudolf H. Hendel, John S. Petersen, Hwan J. Jeong
-
Patent number: 9189705Abstract: Overlay measurement systems and methods are disclosed that control the relative phase between the scattered and specular components of light to amplify weak optical signals before detection. The systems and methods utilize model-based regressional image processing to determine overlay errors accurately even in the presence of inter-pattern interference.Type: GrantFiled: July 11, 2014Date of Patent: November 17, 2015Assignee: JSMSW Technology LLCInventor: Hwan J. Jeong
-
Patent number: 9075013Abstract: Microscope apparatus and methods for imaging an object with a resolution beyond the Abbe limit are disclosed. The apparatus employs an object selectively patterned with a fluorescing material that is induced to fluoresce with one wavelength and inhibited from fluorescing with a second wavelength. Two orthogonal interference-fringe patterns are generated from four diffracted light beams of an inhibiting wavelength and superimposed on the object along with light that induces fluorescence. The interference-pattern image allows only sub-resolution-sized emission areas of the object to fluoresce. Multiple images of the fluorescing object are obtained, each corresponding to a slightly different position of the fringe patterns on the substrate. Each image is processed to yield a sparsely sampled super-resolution image. Multiple sparse images are interwoven to form a complete super-resolution image of the object.Type: GrantFiled: April 26, 2013Date of Patent: July 7, 2015Assignee: Periodic Structures, Inc.Inventors: David A. Markle, Hwan J. Jeong, John S. Petersen