Patents by Inventor Hyelim KANG

Hyelim KANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11944940
    Abstract: Provided is a method for manufacturing a water-treatment membrane, the method including bringing an aqueous solution including free chlorine and a halogen ion into contact with a polyamide active layer, wherein the free chlorine is present in an amount from 150 ppm to 400 ppm and the halogen ion is present in an amount from 150 ppm to 400 ppm based on the aqueous solution, and a water-treatment membrane manufactured using the same.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: April 2, 2024
    Assignee: LG CHEM, LTD.
    Inventors: Hyelim Kang, Danbi Han, Eun Woo Cho, Hyungjoon Jeon, Chong Kyu Shin, Lakwon Choi
  • Publication number: 20220226785
    Abstract: Provided is a composition for forming a separation membrane active layer, the composition comprising a compound of the following Chemical Formula 1 and a compound of the following Chemical Formula 2, wherein a percentage (a/b) of a weight (a) of the compound of Chemical Formula 1 to a weight (b) of the compound of Chemical Formula 2 is 30% to 60%, and a pH thereof is 11 to 12.7: wherein in Chemical Formulae 1 and 2: R1 to R16 are each independently —CRR?— or —NR?—. at least two of R1 to R10 are —NR?—; at least two of R11 to R16 are —NR?—; and R, R?, and R? are each independently hydrogen or a substituted or unsubstituted alkyl group; a method for producing a separation membrane; a separation membrane; and a water treatment module.
    Type: Application
    Filed: April 22, 2020
    Publication date: July 21, 2022
    Inventors: Hyelim KANG, Lakwon CHOI, Huizi SHEN, Gahyeon LEE, Chong Kyu SHIN
  • Publication number: 20220126240
    Abstract: Provided is a reverse osmosis spacer and a reverse osmosis element with a high recovery rate, and, more particularly, to a reverse osmosis spacer and a reverse osmosis element with a high recovery rate, which are capable of increasing a flow rate of produced water and decreasing less a salt removal rate in the reverse osmosis element during an operation at a high recovery rate with a structure of the reverse osmosis spacer that comprises the reverse osmosis element.
    Type: Application
    Filed: March 19, 2020
    Publication date: April 28, 2022
    Inventors: Taeyoung PARK, Phill LEE, Taehyeong KIM, Hyelim KANG, Huizi SHEN, Gahyeon LEE, Kiho KIM
  • Publication number: 20210113969
    Abstract: Provided is a method for manufacturing a water-treatment membrane, the method including bringing an aqueous solution including free chlorine and a halogen ion into contact with a polyamide active layer, wherein the free chlorine is present in an amount from 150 ppm to 400 ppm and the halogen ion is present in an amount from 150 ppm to 400 ppm based on the aqueous solution, and a water-treatment membrane manufactured using the same.
    Type: Application
    Filed: January 18, 2019
    Publication date: April 22, 2021
    Inventors: Hyelim KANG, Danbi HAN, Eun Woo CHO, Hyungjoon JEON, Chong Kyu SHIN, Lakwon CHOI
  • Patent number: 10632428
    Abstract: The present specification relates to a method for manufacturing a water-treatment membrane, a water-treatment membrane manufactured using the same, and a water-treatment module including the water-treatment membrane.
    Type: Grant
    Filed: May 9, 2016
    Date of Patent: April 28, 2020
    Assignee: LG CHEM, LTD.
    Inventors: Byoungsoo Lee, Hyung Joon Jeon, Hyelim Kang, Chong Kyu Shin, Bong Ju Kwak
  • Publication number: 20180178170
    Abstract: The present specification relates to a method for manufacturing a water-treatment membrane, a water-treatment membrane manufactured using the same, and a water-treatment module including the water-treatment membrane.
    Type: Application
    Filed: May 9, 2016
    Publication date: June 28, 2018
    Inventors: Byoungsoo LEE, Hyung Joon JEON, Hyelim KANG, Chong Kyu SHIN, Bong Ju KWAK