Patents by Inventor Hye Ryoung Lee

Hye Ryoung Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition
    Patent number: 9695279
    Abstract: Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below:
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: July 4, 2017
    Assignees: SK Innovation Co., Ltd., SK Global Chemical Co., Ltd.
    Inventors: Kwang Kuk Lee, Jin Su Ham, Sun Joo Kim, Hye Ryoung Lee, Min Ho Jung
  • Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition
    Patent number: 9589788
    Abstract: Provided are a polymer for an underlayer film, used in semiconductor and display manufacturing processes, an underlayer film composition for semiconductor and display manufacturing processes, containing the same, and a method for forming an underlayer film for semiconductor and display manufacturing processes using the underlayer film composition. The polymer according to the present invention is a polymer including a repeating unit represented by the following Chemical Formula 1: in Chemical Formula 1, Ar, R1 to R6, L, and R? and R? are the same as those in the detailed description of the present invention.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: March 7, 2017
    Assignees: SK Innovation Co., Ltd., SK Global Chemical Co., Ltd.
    Inventors: Min Ho Jung, Jeong Eop Choi, Hye Ryoung Lee
  • Novel Polymer with a Good Heat Resistance and Storage Stability, Underlayer Film Composition Containing the Polymer and Process for Forming Underlayer Film Using the Composition
    Publication number: 20160365242
    Abstract: Provided are a polymer for an underlayer film, used in semiconductor and display manufacturing processes, an underlayer film composition for semiconductor and display manufacturing processes, containing the same, and a method for forming an underlayer film for semiconductor and display manufacturing processes using the underlayer film composition. The polymer according to the present invention is a polymer including a repeating unit represented by the following Chemical Formula 1: in Chemical Formula 1, Ar, R1 to R6, L, and R? and R? are the same as those in the detailed description of the present invention.
    Type: Application
    Filed: June 10, 2016
    Publication date: December 15, 2016
    Inventors: Min Ho Jung, Jeong Eop Choi, Hye Ryoung Lee
  • Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Forming Resist Underlayer Film Using the Composition
    Publication number: 20160311975
    Abstract: Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below:
    Type: Application
    Filed: April 20, 2016
    Publication date: October 27, 2016
    Inventors: Kwang Kuk Lee, Jin Su Ham, Sun Joo Kim, Hye Ryoung Lee, Min Ho Jung
  • Hexaaza [3.3.3] propellane compounds as key intermediates for new molecular explosives and a method for preparing the same
    Patent number: 8609861
    Abstract: Provided are hexaaza[3.3.3]propellane compounds represented by the following formula (I), which can be used as a main skeleton structure for novel molecular explosives and method for preparing the same: wherein, R is H, C1-C20 alkyl, cycloalkyl, arylalkyl or aryl, which may contain heteroatoms such as oxygen, nitrogen, sulfur, halogen, etc. or unsaturations; and X is H2, O or S.
    Type: Grant
    Filed: October 15, 2012
    Date of Patent: December 17, 2013
    Assignee: Agency for Defense Development
    Inventors: Young Gyu Kim, Jin Seuk Kim, Kyoo Hyun Chung, Moon Yong Shin, Seung Hee Kim, Tae Hwan Ha, Hye Ryoung Lee, Myeong Hak Kim