Patents by Inventor Hye Suk CHAE

Hye Suk CHAE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230291986
    Abstract: A method for manufacturing a phase mask and a lens-less camera module comprises the steps of: obtaining a replica mold on which an inverted phase shift pattern is formed in which a phase shift pattern of a master phase mask spaced apart from an image sensor is inverted; calculating a thickness of a phase mask disposed on the image sensor replacing the master phase mask; arranging a photocurable material for implementing the phase mask on the image sensor to a calculated thickness, placing the replica mold on an upper surface of the photocurable material, and then curing the photocurable material; and removing the replica mold from the top of the phase mask, so that the focal distance change or parallel movement does not occur depending on the position of the phase mask.
    Type: Application
    Filed: February 14, 2023
    Publication date: September 14, 2023
    Inventors: Seung Ah LEE, Hye Suk CHAE, Yu Jin LEE, Kyung Chul LEE, Nak Kyu BAEK, Tae Young KIM, Jae Woo JUNG