Abstract: An embodiment of the present invention relates to a plasma-resistant glass, and a manufacturing method therefor, and the present invention is intended to provide a plasma-resistant glass having improved plasma resistance properties, and a manufacturing method therefor. To this end, the present invention provides a plasma-resistant glass including SiO2 in an amount of 40 to 75 mol %, Al2O3 in an amount of 5 to 20 mol %, MgO in an amount of 10 to 40 mol %, and MgF2 in an amount of 0.01 to 10 mol %, and a manufacturing method therefor.

Abstract: A forming method of an yttrium oxide fluoride (YOF) coating film and a (YOF) coating film formed thereby are disclosed. The YOF coating film has no or extremely small pores therein and a nanostructure to increase light transmittance thereof, and has high hardness and high bonding strength and thus can protect a transparent window of a display device. The method for forming an YOF coating film involves the steps of: providing pretreated YOF powder having a particle diameter ranging from 0.1 to 12 ?m; receiving a transfer gas supplied from a transfer gas supply unit and receiving the pretreated YOF powder supplied from a powder supply unit to transfer the pretreated YOF powder in an aerosol state; and colliding/smashing (spraying) the pretreated YOF powder transferred in the aerosol state with/onto a substrate in a process chamber to form an YOF coating film on the substrate.

Abstract: The present invention relates to plasma-resistant glass containing 32-52 mol % of SiO2, 5-15 mol % of Al2O3, 30-35 mol % of CaO, and 0.1-15 mol % of CaF2 as chemical components, and a manufacturing method thereof. According to the present invention, a glass stability index KH is 2.0 or higher, and a plasma-resistant characteristic of an etch rate of lower than 10 nm/min for a mixed plasma of fluorine and argon (Ar) is exhibited.

Abstract: A forming method of an yttrium oxide fluoride (YOF) coating film and a (YOF) coating film formed thereby are disclosed. The YOF coating film has no or extremely small pores therein and a nanostructure to increase light transmittance thereof, and has high hardness and high bonding strength and thus can protect a transparent window of a display device. The method for forming an YOF coating film involves the steps of: providing pretreated YOF powder having a particle diameter ranging from 0.1 to 12 ?m; receiving a transfer gas supplied from a transfer gas supply unit and receiving the pretreated YOF powder supplied from a powder supply unit to transfer the pretreated YOF powder in an aerosol state; and colliding/smashing (spraying) the pretreated YOF powder transferred in the aerosol state with/onto a substrate in a process chamber to form an YOF coating film on the substrate.

Abstract: One embodiment of the present invention relates to a method for forming a transparent fluorine film, and a transparent fluorine film formed thereby, and the technical issues to be resolved are to provide a method for forming a transparent fluorine film, and transparent fluorine film formed thereby that can protect the transparent windows of display devices by having not only high transmissivity due to no or extremely small nano-structured pores in the interior, but also having high strength and adhesiveness. To that end, disclosed are a method for forming a transparent fluorine film, and a transparent fluorine film formed thereby, the method comprising the steps of: receiving transport gas from a transport gas supply unit and YF3 powder from a powder supply unit, and transporting the YF3 powder in aerosol form; and colliding and crushing the YF3 powder transported in aerosol form against a substrate in the interior of a processing chamber, and forming a transparent YF3 film on the substrate.