Abstract: Provided is a washing machine including an auxiliary washing unit configured with an auxiliary washing space formed separately from a main washing space formed in a rotating tub, and a discharging assembly by which the auxiliary washing space and the main washing space are selectively in communication with each other. Through such a structure, auxiliary washing may be independently performed, and washing efficiency may be enhanced.

Abstract: Provided is a washing machine including an auxiliary washing unit configured with an auxiliary washing space formed separately from a main washing space formed in a rotating tub, and a discharging assembly by which the auxiliary washing space and the main washing space are selectively in communication with each other. Through such a structure, auxiliary washing may be independently performed, and washing efficiency may be enhanced.

Abstract: Provided is a washing machine including an auxiliary washing unit configured with an auxiliary washing space formed separately from a main washing space formed in a rotating tub, and a discharging assembly by which the auxiliary washing space and the main washing space are selectively in communication with each other. Through such a structure, auxiliary washing may be independently performed, and washing efficiency may be enhanced.

Abstract: Disclosed is a washing machine capable of improving the efficiency of washing and product quality by improving a pivoting structure of a door assembly having a door and an auxiliary washing unit forming an auxiliary washing space. Also, the door and the auxiliary washing unit may be coupled by a locking part so that a user can open and close the door assembly conveniently when manual washing is not needed. When manual washing is needed, the user may release a locked state of the locking part to move the door and the auxiliary washing unit separately.

Abstract: Disclosed is a washing machine capable of improving the efficiency of washing and product quality by improving a pivoting structure of a door assembly having a door and an auxiliary washing unit forming an auxiliary washing space. Also, the door and the auxiliary washing unit may be coupled by a locking part so that a user can open and close the door assembly conveniently when manual washing is not needed. When manual washing is needed, the user may release a locked state of the locking part to move the door and the auxiliary washing unit separately.

Abstract: A washing machine including a door to open and close an opening for laundry. The door includes a first upper door, a second upper door disposed to allow at least one portion of the first upper door to be seen therethrough, and a lower door. The lower door includes a contraction preventing part to prevent the lower door from contracting when molded.

Abstract: A cleaner including a body configured to generate a suction force, a suction head configured to suction air and dirt while making contact with a cleaning surface, a handle pipe configured for manipulation by a user, a flexible hose connecting the handle pipe to the body, an extension pipe connecting the suction head to the handle pipe, and an accessory assembly coupled to the handle pipe to perform a cleaning in place of the suction head, the accessory assembly comprising an accessory body, a Dusting on which a brush is mounted, a Crevice to clean a gap, and an Upholstery to clean fabrics, the Upholstery being rotatably coupled to the accessory body, thereby enhancing the convenience of use and cleaning efficiency.

Abstract: Disclosed herein is a vacuum cleaner including a main body generating suction force, a suction head contacting a surface to be cleaned and sucking air and dust from the surface, a handle pipe for user operation, a flexible hose connecting the handle pipe and the main body, and an extension pipe connecting the suction head and the handle pipe. The handle pipe includes a handle pipe body communicating the extension pipe and the flexible hose with each other, and a sub-accessory assembly combined integrally with the handle pipe body so as to suck air and dust from the surface as a substitute for the suction head. In the vacuum cleaner, sub-accessories may be easily replaced, a separate space for storage of the sub-accessories is not required, and there is no danger of loss of the sub-accessories.

Abstract: Bone cements and methods provided include a bone cement composition having collective attributes and properties desirable for initial fixation as well as interventional applications. Compositions include an amount of Portland cement and an amount of calcium sulfate.

Abstract: A vacuum cleaner includes a suction head including a cover and a bottom plate provided with a suction hole through which air is sucked from a surface to be cleaned and rotatably combined with the cover. The bottom plate is rotated in one direction relative to the cover when the suction head moves forward, and is rotated in the other direction relative to the cover when the suction head moves backward. Further, the vacuum cleaner includes a brush base including brushes and movable upward and backward between the cover and the bottom plate. The brush base includes indicating parts exposed to the outside of the cover and forming at least a portion of the external appearance of the suction head.

Abstract: A semiconductor integrated circuit device includes: a substrate which has a first conductivity type and in which a first amplifier area and a second amplifier area are defined; a first well which has a second conductivity type, a first pocket well which has the first conductivity type and is separated from the first well, and a first deep well which has the second conductivity type, surrounds the first pocket well, and is separated from the first well; and a second well which has the second conductivity type, a second pocket well which has the first conductivity type and is separated from the second well, and a second deep well which has the second conductivity type, surrounds the second pocket well, and is separated from the second well The first well, the first pocket well, and the first deep well are formed in the first amplifier area of the substrate, and the second well, the second pocket well, and the second deep well are formed in the second amplifier area of the substrate.

Abstract: Bone cements and methods provided include a bone cement composition having collective attributes and properties desirable for initial fixation as well as interventional applications. Compositions include an amount of Portland cement and an amount of calcium sulfate.

Abstract: A semiconductor integrated circuit device includes: a substrate which has a first conductivity type and in which a first amplifier area and a second amplifier area are defined; a first well which has a second conductivity type, a first pocket well which has the first conductivity type and is separated from the first well, and a first deep well which has the second conductivity type, surrounds the first pocket well, and is separated from the first well; and a second well which has the second conductivity type, a second pocket well which has the first conductivity type and is separated from the second well, and a second deep well which has the second conductivity type, surrounds the second pocket well, and is separated from the second well The first well, the first pocket well, and the first deep well are formed in the first amplifier area of the substrate, and the second well, the second pocket well, and the second deep well are formed in the second amplifier area of the substrate.

Abstract: A silicidation blocking layer (SBL) pattern is formed on a substrate including an active region and a field region. The SBL pattern covers the field region and exposes the active region. A silicide layer is formed on the active region by reacting metal with silicon existing in the active region. An insulation layer is formed on the substrate including the silicide layer. An opening exposing the silicide layer is formed by selectively etching the insulation layer under a condition having an etching selectivity between the SBL and the insulation layer. Conductive material is filled up the opening. The field region of a substrate is sufficiently protected by the SBL pattern without any additional process so that the failure of a semiconductor device is effectively prevented because the flow of a leakage current through the field region is blocked.

Abstract: A silicidation blocking layer (SBL) pattern is formed on a substrate including an active region and a field region. The SBL pattern covers the field region and exposes the active region. A silicide layer is formed on the active region by reacting metal with silicon existing in the active region. An insulation layer is formed on the substrate including the silicide layer. An opening exposing the silicide layer is formed by selectively etching the insulation layer under a condition having an etching selectivity between the SBL and the insulation layer. Conductive material is filled up the opening. The field region of a substrate is sufficiently protected by the SBL pattern without any additional process so that the failure of a semiconductor device is effectively prevented because the flow of a leakage current through the field region is blocked.

Abstract: A method for manufacturing the same, wherein the monolithic ink-jet printhead includes a manifold for supplying ink, an ink chamber having a hemispheric shape, and an ink channel formed monolithically on a substrate; a silicon oxide layer, in which a nozzle for ejecting ink is centrally formed in the ink chamber, is deposited on the substrate; a heater having a ring shape is formed on the silicon oxide layer to surround the nozzle; a MOS integrated circuit is mounted on the substrate to drive the heater and includes a MOSFET and electrodes connected to the heater. The silicon oxide layer, the heater, and the MOS integrated circuit are formed monolithically on the substrate. Additionally, a DLC coating layer having a high hydrophobic property and high durability is formed on an external surface of the printhead.

Abstract: A silicidation blocking layer (SBL) pattern is formed on a substrate including an active region and a field region. The SBL pattern covers the field region and exposes the active region. A silicide layer is formed on the active region by reacting metal with silicon existing in the active region. An insulation layer is formed on the substrate including the silicide layer. An opening exposing the silicide layer is formed by selectively etching the insulation layer under a condition having an etching selectivity between the SBL and the insulation layer. Conductive material is filled up the opening. The field region of a substrate is sufficiently protected by the SBL pattern without any additional process so that the failure of a semiconductor device is effectively prevented because the flow of a leakage current through the field region is blocked.

Abstract: A semiconductor integrated circuit device is provided. The semiconductor integrated circuit device includes a semiconductor substrate, a transistor having a gate interconnection that extends in one direction on the semiconductor substrate and source/drain regions aligned in the gate interconnection and formed in the semiconductor substrate, and a diffusion-preventing metallic pattern extending on the gate interconnection in the same direction as the gate interconnection and which prevents ions from being diffused into the semiconductor substrate.

Abstract: This invention relates to an alignment apparatus for aligning a planar optical wave-guide element and an optical fiber block wherein alignment can be completed with more precision and less expense than conventional methods. The alignment apparatus comprising a lower plate; a sliding table mounted on the lower plate capable of horizontal displacement on the lower plate; an upper plate mounted to the sliding table; and, a jig disposed on the upper plate and fixed to rotational means and capable of rotation about the upper plate for holding the optical fiber block.

Abstract: A bubble-jet type ink-jet printhead and manufacturing method thereof including a substrate integrally having an ink supply manifold, an ink chamber, and an ink channel; a nozzle plate having a nozzle on the substrate; a heater centered around the nozzle and an electrode for applying current to the heater on the nozzle plate; and an adiabatic layer on the heater for preventing heat generated by the heater from being conducted upward from the heater. Alternatively, a bubble-jet type ink-jet printhead may be formed on a silicon-on-insulator (SOI) wafer having a first substrate, an oxide layer, and a second substrate stacked thereon and include an adiabatic barrier on the second substrate. In the bubble-jet type ink-jet printhead and manufacturing method thereof, the adiabatic layer or the adiabatic barrier is provided to transmit most of the heat generated by the heater to ink under the heater, thereby increasing energy efficiency.