Patents by Inventor Hyeon-Mo Cho

Hyeon-Mo Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same
    Patent number: 9291899
    Abstract: A resist underlayer composition and a method of manufacturing a semiconductor integrated circuit device, the composition including a solvent and an organosilane polymer, the organosilane polymer being a condensation polymerization product of at least one first compound represented by Chemical Formulae 1 and 2 and at least one second compound represented by Chemical Formulae 3 to 5.
    Type: Grant
    Filed: December 30, 2009
    Date of Patent: March 22, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hyeon-Mo Cho, Sang-Kyun Kim, Chang-Soo Woo, Mi-Young Kim, Sang-Ran Koh, Hui-Chan Yun, Woo-Jin Lee, Jong-Seob Kim
  • Resist underlayer composition and process of producing integrated circuit devices using the same
    Patent number: 9140986
    Abstract: A resist underlayer composition includes a solvent and an organosilane condensation polymerization product, the organosilane condensation polymerization product including about 40 to about 80 mol % of a structural unit represented by the following Chemical Formula 1,
    Type: Grant
    Filed: July 2, 2012
    Date of Patent: September 22, 2015
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Mi-Young Kim, Sang-Kyun Kim, Hyeon-Mo Cho, Sang-Ran Koh, Hui-Chan Yun, Yong-Jin Chung, Jong-Seob Kim
  • Photoresist underlayer composition and method of manufacturing semiconductor device by using the same
    Patent number: 8758981
    Abstract: A photoresist underlayer composition includes a solvent, and a polysiloxane resin represented by Chemical Formula 1: {(SiO1.5—Y—SiO1.5)x(SiO2)y(XSiO1.5)z}(OH)e(OR1)f.
    Type: Grant
    Filed: July 2, 2012
    Date of Patent: June 24, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Mi-Young Kim, Sang-Kyun Kim, Hyeon-Mo Cho, Chang-Soo Woo, Sang-Ran Koh, Hui-Chan Yun, Woo-Jin Lee, Jong-Seob Kim
  • Silicon-based hardmask composition and process of producing semiconductor integrated circuit device using the same
    Patent number: 8524851
    Abstract: A silicon-based hardmask composition, including an organosilane polymer represented by Formula 1: {(SiO1.5—Y—SiO1.5)x(R3SiO1.5)y(XSiO1.5)z}(OH)e(OR6)f??(1).
    Type: Grant
    Filed: July 12, 2010
    Date of Patent: September 3, 2013
    Assignee: Cheil Industries, Inc.
    Inventors: Sang Kyun Kim, Hyeon Mo Cho, Sang Ran Koh, Mi Young Kim, Hui Chan Yun, Yong Jin Chung, Jong Seob Kim
  • PHOTORESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME
    Publication number: 20120282776
    Abstract: A photoresist underlayer composition includes a solvent, and a polysiloxane resin represented by Chemical Formula 1: {(SiO1.5—Y—SiO1.5)(SiO2)y(XSiO1.5)z}(OH)e(OR1)f.
    Type: Application
    Filed: July 2, 2012
    Publication date: November 8, 2012
    Inventors: Mi-Young KIM, Sang-Kyun KIM, Hyeon-Mo CHO, Chang-Soo WOO, Sang-Ran KOH, Hui-Chan YUN, Woo-Jin LEE, Jong-Seob KIM
  • RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING THE SAME
    Publication number: 20120267766
    Abstract: A resist underlayer composition includes a solvent and an organosilane condensation polymerization product, the organosilane condensation polymerization product including about 40 to about 80 mol % of a structural unit represented by the following Chemical Formula 1,
    Type: Application
    Filed: July 2, 2012
    Publication date: October 25, 2012
    Inventors: Mi-Young KIM, Sang-Kyun KIM, Hyeon-Mo CHO, Sang-Ran KOH, Hui-Chan YUN, Yong-Jin CHUNG, Jong-Seob KIM
  • RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES USING THE SAME
    Publication number: 20120270143
    Abstract: A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product including about 10 to about 40 mol % of a structural unit represented by Chemical Formula 1:
    Type: Application
    Filed: July 2, 2012
    Publication date: October 25, 2012
    Inventors: Hui-Chan YUN, Sang-Kyun KIM, Hyeon-Mo CHO, Mi-Young KIM, Sang-Ran KOH, Yong-Jin CHUNG, Jong-Seob KIM
  • Silicon-based hardmask composition and process of producing semiconductor integrated circuit device using the same
    Publication number: 20100279509
    Abstract: A silicon-based hardmask composition, including an organosilane polymer represented by Formula 1: {(SiO1.5—Y—SiO1.5)x(R3SiO1.5)y(XSiO1.5)z}(OH)e(OR6)f??(1).
    Type: Application
    Filed: July 12, 2010
    Publication date: November 4, 2010
    Inventors: Sang Kyun Kim, Hyeon Mo Cho, Sang Ran Koh, Mi Young Kim, Hui Chan Yun, Yong Jin Chung, Jong Seob Kim
  • Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same
    Publication number: 20100167203
    Abstract: A resist underlayer composition and a method of manufacturing a semiconductor integrated circuit device, the composition including a solvent and an organosilane polymer, the organosilane polymer being a condensation polymerization product of at least one first compound represented by Chemical Formulae 1 and 2 and at least one second compound represented by Chemical Formulae 3 to 5.
    Type: Application
    Filed: December 30, 2009
    Publication date: July 1, 2010
    Inventors: Hyeon-Mo Cho, Sang-Kyun Kim, Chang-Soo Woo, Mi-Young Kim, Sang-Ran Koh, Hui-Chan Yun, Woo-Jin Lee, Jong-Seob Kim
  • RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME
    Publication number: 20100167212
    Abstract: A resist underlayer composition and a method of manufacturing a semiconductor integrated circuit device, the resist underlayer composition including a solvent and an organosilane-based polymer, the organosilane-based polymer being a polymerization product of at least one first compound represented Chemical Formulae 1 to 3 and at least one second compound represented by Chemical Formulae 4 and 5.
    Type: Application
    Filed: December 30, 2009
    Publication date: July 1, 2010
    Inventors: Hyeon-Mo Cho, Sang-Kyun Kim, Mi-Young Kim, Sang-Ran Koh, Hui-Chang Yun, Yong-Jin Chung, Jong-Seob Kim, In-Sun Jung