Patents by Inventor Hyeonbeom Gwon

Hyeonbeom Gwon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9384964
    Abstract: The inventive concepts provide methods of manufacturing a semiconductor device including a thermal treatment process. The method may include providing a substrate including a channel region of a transistor, forming an initial oxide layer on the channel region, and performing a thermal treatment process at least once before or after forming the initial oxide layer.
    Type: Grant
    Filed: August 1, 2014
    Date of Patent: July 5, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yongkuk Jeong, Hyeonbeom Gwon, Junghwa Seo