Patents by Inventor Hyeon-Choon CHO

Hyeon-Choon CHO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11355355
    Abstract: The present invention relates to a method of producing a ceramic substrate, the method including: joining a metal layer to each of opposite surfaces of a ceramic base material; forming, on the metal layers, a first electrode layer and a second electrode layer having a larger volume than the first electrode layer; calculating the volumes of the first and second electrode layers; and controlling a thickness of the second electrode layer, thereby controlling warpage which may occur due to a difference between the volumes of the first and second electrode layers. The present invention can reduce the defect rate of a ceramic substrate by controlling warpage that may occur due to the difference in volume taken up by the metal layers on the opposite surfaces of the base material.
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: June 7, 2022
    Assignee: Amosense Co., Ltd.
    Inventors: Ji-Hyung Lee, Ik-Seong Park, Hyeon-Choon Cho
  • Patent number: 11291113
    Abstract: A ceramic substrate is provided in which an inclined protrusion is formed on boundary surface of a metal layer bonded to a ceramic base so as to increase bonding strength; and a manufacturing method therefor. The inclined protrusion may include: a tapered protrusion and a multi-stepped protrusion formed on the boundary surface of the metal layer according to an interval between the metal layer bonded to the ceramic base and a neighboring metal layer, wherein a multi-stepped protrusion having an inclination angle within a predetermined angle range with respect to the ceramic base may be formed on the boundary surface of the metal layer where stress is concentrated, such as the short edge, apex, corner, and the like, and a tapered protrusion may be formed on a remaining portion of the boundary surface of the metal layer.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: March 29, 2022
    Assignee: Amosense Co. Ltd.
    Inventors: Ji-Hyung Lee, Ik-Seong Park, Hyeon-Choon Cho
  • Publication number: 20200357660
    Abstract: The present invention relates to a method of producing a ceramic substrate, the method including: joining a metal layer to each of opposite surfaces of a ceramic base material; forming, on the metal layers, a first electrode layer and a second electrode layer having a larger volume than the first electrode layer; calculating the volumes of the first and second electrode layers; and controlling a thickness of the second electrode layer, thereby controlling warpage which may occur due to a difference between the volumes of the first and second electrode layers. The present invention can reduce the defect rate of a ceramic substrate by controlling warpage that may occur due to the difference in volume taken up by the metal layers on the opposite surfaces of the base material.
    Type: Application
    Filed: August 23, 2018
    Publication date: November 12, 2020
    Applicant: Amosense Co., Ltd.
    Inventors: Ji-Hyung LEE, Ik-Seong PARK, Hyeon-Choon CHO
  • Publication number: 20200315003
    Abstract: A ceramic substrate is provided in which an inclined protrusion is formed on boundary surface of a metal layer bonded to a ceramic base so as to increase bonding strength; and a manufacturing method therefor. The inclined protrusion may include: a tapered protrusion and a multi-stepped protrusion formed on the boundary surface of the metal layer according to an interval between the metal layer bonded to the ceramic base and a neighboring metal layer, wherein a multi-stepped protrusion having an inclination angle within a predetermined angle range with respect to the ceramic base may be formed on the boundary surface of the metal layer where stress is concentrated, such as the short edge, apex, corner, and the like, and a tapered protrusion may be formed on a remaining portion of the boundary surface of the metal layer.
    Type: Application
    Filed: June 14, 2017
    Publication date: October 1, 2020
    Inventors: Ji-Hyung LEE, Ik-Seong PARK, Hyeon-Choon CHO
  • Publication number: 20190096696
    Abstract: The present invention relates to a method for filling a via hole in a ceramic substrate and a filler for the via hole in the ceramic substrate filled using the same. The via hole is formed in a ceramic base material, and a conductor is formed in the via hole, melted in a vacuum state, and cooled, so that the via hole in the ceramic substrate is simply filled with the conductor without any voids. Accordingly, the manufacturing process of the ceramic substrate is simplified, manufacturing costs are reduced, the operational reliability of the ceramic substrate is improved, and stable operational reliability is secured when the ceramic substrate is used in a high-power semiconductor module.
    Type: Application
    Filed: March 8, 2017
    Publication date: March 28, 2019
    Applicant: AMOSENSE CO., LTD.
    Inventors: Kyung-Whan WOO, Ik-Seong PARK, Hyeon-Choon CHO