Abstract: Provided are a method for manufacturing a nano-pattern including: increasing a temperature of a self-assembling material applied on a substrate through light irradiation to form a self-assembly pattern, and a nano-pattern manufactured thereby. More particularly, the present invention relates to a method for manufacturing a nano-pattern capable of implementing various circuit patterns through simple dragging without using a photoresist pattern or chemical pattern in advance, implementing the nano-pattern on a substrate having a three-dimensional structure such as a flexible substrate as well as a flat substrate, and performing a process without a specific environmental restriction. In addition, the present invention relates to a method for manufacturing a nano-pattern capable of forming a large-area self-assembly pattern within a very short time, that is, several to several ten milliseconds (ms) by instantly irradiating high-energy flash light to instantly perform thermal annealing.

Abstract: An apparatus and method are provided including a first segmenter and a second segmenter. The first segmenter is configured to generate a first segmentation result from a medical image using a first segmentation parameter for a candidate lesion. The second segmenter is configured to determine a target lesion to segment from among the candidate lesion based on the first segmentation result, and generate a second segmentation result using a second segmentation parameter to segment the target lesion.

Abstract: An apparatus and method are provided including a first segmenter and a second segmenter. The first segmenter is configured to generate a first segmentation result from a medical image using a first segmentation parameter for a candidate lesion. The second segmenter is configured to determine a target lesion to segment from among the candidate lesion based on the first segmentation result, and generate a second segmentation result using a second segmentation parameter to segment the target lesion.