Patents by Inventor Hyewon NA

Hyewon NA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260250653
    Abstract: Novel uracil-DNA glycosylase (UDG) derived from Photobacterium leiognathi and uses thereof are disclosed. The novel UDG is an enzyme isolated from Photobacterium leiognathi, which is a psychrophilic bacterium, and is characterized by having an activity of degrading uracil bases from uracil-containing DNA substrate and being easily denatured at low temperatures. Accordingly, the UDG can be effectively used to eliminate carryover contamination occurring during the nucleic acid amplification reaction, resulting in increased accuracy (elimination of false positives), purity and amplification efficiency in nucleic acid amplification reactions.
    Type: Application
    Filed: December 23, 2022
    Publication date: August 27, 2026
    Applicant: SEEGENE, INC.
    Inventors: Suk-Tae KWON, Hyewon NA, Sung Suk CHO, Chanho KWON
  • Patent number: 11504409
    Abstract: Disclosed in the present disclosure is a composition for improving skin damage caused by fine dust, which contains an Aureobasidium pullulans strain; a lysate thereof; a culture thereof; or an extract of the strain, the lysate or the culture as an active ingredient, and the composition has an effect of promoting the expression of keratinocyte differentiation markers and granular layer tight junction markers, thereby enhancing the skin barrier function and having skin-moisturizing, anti-aging and wrinkle-suppressing effects, and, thus, has an excellent effect in terms of improving skin damage caused by fine dust.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: November 22, 2022
    Assignee: AMOREPACIFIC CORPORATION
    Inventors: Kilsun Myoung, Hyewon Na, Yong Jin Kim
  • Publication number: 20200384046
    Abstract: Disclosed in the present disclosure is a composition for improving skin damage caused by fine dust, which contains an Aureobasidium pullulans strain; a lysate thereof; a culture thereof; or an extract of the strain, the lysate or the culture as an active ingredient, and the composition has an effect of promoting the expression of keratinocyte differentiation markers and granular layer tight junction markers, thereby enhancing the skin barrier function and having skin-moisturizing, anti-aging and wrinkle-suppressing effects, and, thus, has an excellent effect in terms of improving skin damage caused by fine dust.
    Type: Application
    Filed: November 20, 2018
    Publication date: December 10, 2020
    Applicant: AMOREPACIFIC CORPORATION
    Inventors: Kilsun MYOUNG, Hyewon NA, Yong Jin KIM