Patents by Inventor Hyo Chang LEE

Hyo Chang LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried
    Patent number: 11867643
    Abstract: The present invention relates to a planar-type plasma diagnosis apparatus comprising: a transmission antenna for applying a frequency-variable microwave to plasma; a reception antenna for receiving the microwave from the plasma; and a body part encompassing the transmission antenna and the reception antenna so that same are insulated from each other, wherein the upper surface of the transmission antenna for applying the microwave and the upper surface of the reception antenna for receiving the microwave are planar, and side surfaces of the upper surfaces of the transmission antenna and the reception antenna face each other.
    Type: Grant
    Filed: April 15, 2019
    Date of Patent: January 9, 2024
    Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
    Inventors: Hyo Chang Lee, Jung Hyung Kim, Dae Jin Seong, Hee Jung Yeom
  • Device for measuring plasma ion density and apparatus for diagnosing plasma using the same
    Patent number: 11735397
    Abstract: Disclosed herein is a device for measuring a plasma ion density, which includes a transceiver antenna configured to apply and receive a microwave, of which a frequency is varied, to and from plasma, and a frequency analyzer configured to analyze a frequency of the microwave received from the transceiver antenna and measure a cut-off frequency, wherein the frequency of the microwave applied to the plasma is varied in the range of 100 kHz to 500 MHz.
    Type: Grant
    Filed: April 5, 2021
    Date of Patent: August 22, 2023
    Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
    Inventors: Hyo Chang Lee, Jung Hyung Kim, Hee Jung Yeom
  • DEVICE FOR MEASURING PLASMA ION DENSITY AND APPARATUS FOR DIAGNOSING PLASMA USING THE SAME
    Publication number: 20220270852
    Abstract: Disclosed herein is a device for measuring a plasma ion density, which includes a transceiver antenna configured to apply and receive a microwave, of which a frequency is varied, to and from plasma, and a frequency analyzer configured to analyze a frequency of the microwave received from the transceiver antenna and measure a cut-off frequency, wherein the frequency of the microwave applied to the plasma is varied in the range of 100 kHz to 500 MHz.
    Type: Application
    Filed: April 5, 2021
    Publication date: August 25, 2022
    Inventors: Hyo Chang LEE, Jung Hyung KIM, Hee Jung YEOM
  • Plasma generation apparatus
    Patent number: 11211231
    Abstract: A plasma generation apparatus includes a plasma generation unit. The plasma generation unit has a spherical or elliptical cavity. The plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity. The cavity has a plasma extraction hole to communicate with an external space.
    Type: Grant
    Filed: January 2, 2018
    Date of Patent: December 28, 2021
    Assignee: Korea Research Institute of Standards and Science
    Inventors: Hyo Chang Lee, Jung-Hyung Kim, Dae-Jin Seong
  • PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS, WAFER-TYPE PLASMA DIAGNOSIS APPARATUS IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED, AND ELECTROSTATIC CHUCK IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED
    Publication number: 20210116393
    Abstract: The present invention relates to a planar-type plasma diagnosis apparatus comprising: a transmission antenna for applying a frequency-variable microwave to plasma; a reception antenna for receiving the microwave from the plasma; and a body part encompassing the transmission antenna and the reception antenna so that same are insulated from each other, wherein the upper surface of the transmission antenna for applying the microwave and the upper surface of the reception antenna for receiving the microwave are planar, and side surfaces of the upper surfaces of the transmission antenna and the reception antenna face each other.
    Type: Application
    Filed: April 15, 2019
    Publication date: April 22, 2021
    Inventors: Hyo Chang LEE, Jung Hyung KIM, Dae Jin SEONG, Hee Jung YEOM
  • Plasma Generation Apparatus
    Publication number: 20190355558
    Abstract: A plasma generation apparatus includes a plasma generation unit. The plasma generation unit has a spherical or elliptical cavity. The plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity. The cavity has a plasma extraction hole to communicate with an external space.
    Type: Application
    Filed: January 2, 2018
    Publication date: November 21, 2019
    Inventors: Hyo Chang LEE, Jung-Hyung KIM, Dae-Jin SEONG