Patents by Inventor Hyo-Joong Yoon

Hyo-Joong Yoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etching compositions and methods for fabricating semiconductor devices by using the same
    Patent number: 12297385
    Abstract: Etching compositions are provided. The etching compositions can be used for etching cobalt. The etching compositions may include a chelator, water, an oxidizer, and an organic solvent, and the chelator may include an organic acid, an amine compound and/or a polyhydric alcohol. Water may be present in an amount of 1 wt % to 10 wt % based on a total weight of the etching composition.
    Type: Grant
    Filed: January 12, 2022
    Date of Patent: May 13, 2025
    Assignees: SAMSUNG ELECTRONICS CO., LTD., DONGWOO FINE-CHEM CO., LTD.
    Inventors: Min Hyung Cho, Hyo Joong Yoon, Min Ju Im, Jung Min Oh, Sang Won Bae, Hyo San Lee
  • SILICON-ETCHANT COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
    Publication number: 20240287383
    Abstract: A silicon-etchant composition according to an embodiment may include quaternary alkyl ammonium hydroxide, an amine-based compound, and two or more types of nonionic surfactants represented by Chemical Formula 1 and having different lengths of a hydrophilic group. Accordingly, the silicon-etchant composition having improved etch rate and etching selectivity is provided.
    Type: Application
    Filed: February 14, 2024
    Publication date: August 29, 2024
    Inventors: JIN KYU ROH, KYU SANG AHN, HYO JOONG YOON
  • RUTHENIUM ETCHANT COMPOSITION, PATTERN FORMATION METHOD USING SAME COMPOSITION, METHOD OF MANUFACTURING ARRAY SUBSTRATE, AND ARRAY SUBSTRATE MANUFACTURED THEREBY
    Publication number: 20230272279
    Abstract: Disclosed is a ruthenium etchant composition containing periodic acid and ammonium ions and having a pH of 6 to 7.5. Further disclosed are a pattern formation method including a step of etching a ruthenium metal film using the etchant composition, a method of manufacturing a display device array substrate by employing the pattern formation method, and a display device array substrate manufactured by the method.
    Type: Application
    Filed: February 28, 2023
    Publication date: August 31, 2023
    Inventors: Ji-Won Kim, Jin-Kyu Roh, Hyo-Joong Yoon, Han-Woo Park, Min-Jae Sung, Soo-Jin Kim, Jung-Min Oh, Sang-Won Bae
  • ETCHING COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICES BY USING THE SAME
    Publication number: 20220267673
    Abstract: Etching compositions are provided. The etching compositions can be used for etching cobalt. The etching compositions may include a chelator, water, an oxidizer, and an organic solvent, and the chelator may include an organic acid, an amine compound and/or a polyhydric alcohol. Water may be present in an amount of 1 wt % to 10 wt % based on a total weight of the etching composition.
    Type: Application
    Filed: January 12, 2022
    Publication date: August 25, 2022
    Inventors: Min Hyung CHO, Hyo Joong YOON, Min Ju IM, Jung Min OH, Sang Won BAE, Hyo San LEE
  • Cleaning solution composition for a solar cell
    Patent number: 8614175
    Abstract: Disclosed herein is a cleaning solution composition for a solar cell, comprising: organic alkali compounds, water-soluble glycol ether compounds, percarbonates, organic phosphoric acids or salts thereof, and water.
    Type: Grant
    Filed: June 23, 2010
    Date of Patent: December 24, 2013
    Assignee: Dongwoo Fine-Chem Co., Ltd.
    Inventors: Hyo-Joong Yoon, Soon-Hong Bang, Sang-Tae Kim, Seung-Yong Lee
  • CLEANING SOLUTION COMPOSITION FOR A SOLAR CELL
    Publication number: 20120090670
    Abstract: Disclosed herein is a cleaning solution composition for a solar cell, comprising: organic alkali compounds, water-soluble glycol ether compounds, percarbonates, organic phosphoric acids or salts thereof, and water.
    Type: Application
    Filed: June 23, 2010
    Publication date: April 19, 2012
    Applicant: Dongwoo Fine-Chem Co., Ltd.
    Inventors: Hyo-Joong Yoon, Soon-Hong Bang, Sang-Tae Kim, Seung-Yong Lee