Abstract: Provided are an apparatus for cleaning a substrate by dipping the substrate in a treating bath filled with a treating solution and a method for cleaning a substrate using the apparatus. A boat provided to each of the treating baths supports the substrate by being in contact with a different point of a substrate during a process. Contact points of the substrate which each of the boats supports are made different at every treating bath, so that contact points of a substrate which are not cleaned in any treating bath can be cleaned in different treating baths. Therefore, an efficiency of a cleaning process is improved.