Abstract: A display device includes a first substrate on which a thin film transistor is disposed, a planarization layer disposed on the first substrate, where the planarization layer includes a plurality of protrusions, a first electrode disposed on the planarization layer, a pixel defining layer disposed on the first electrode, where the pixel defining layer includes a plurality of insulating patterns corresponding to the protrusions, a light emitting layer disposed on the first electrode and the pixel defining layer, and a second electrode disposed on the light emitting layer.

Abstract: A display device includes: a first pixel electrode comprising a first reflective electrode in a first emission area, a first light transmitting pattern on the first reflective electrode, and a first light transmitting electrode on the first reflective electrode and the first light transmitting pattern and connected to the first reflective electrode; a second pixel electrode comprising a second reflective electrode in a second emission area and a second light transmitting electrode on the second reflective electrode; a light emitting stack on the first and second pixel electrodes and comprising at least one light emitting layer; a common electrode on the light emitting stack; and a bank pattern surrounding the first and second emission areas, and having at least a portion between the first emission area and the second emission area, wherein the first light transmitting pattern and the bank pattern contain a same material and are spaced apart.

Abstract: An manufacturing method of a display device may include the following steps: forming a transistor on a substrate; forming an insulating layer on the transistor; forming a conductive layer including silver on the insulating layer; forming a photosensitive member on the conductive layer; forming an electrode of a light-emitting element by etching the conductive layer; performing plasma treatment on a structure that comprises the electrode, the plasma treatment using a gas including a halogen; and removing a product that is resulted from the plasma treatment.

Abstract: A display device includes a first substrate on which a thin film transistor is disposed, a planarization layer disposed on the first substrate, where the planarization layer includes a plurality of protrusions, a first electrode disposed on the planarization layer, a pixel defining layer disposed on the first electrode, where the pixel defining layer includes a plurality of insulating patterns corresponding to the protrusions, a light emitting layer disposed on the first electrode and the pixel defining layer, and a second electrode disposed on the light emitting layer.

Abstract: An manufacturing method of a display device may include the following steps: forming a transistor on a substrate; forming an insulating layer on the transistor; forming a conductive layer including silver on the insulating layer; forming a photosensitive member on the conductive layer; forming an electrode of a light-emitting element by etching the conductive layer; performing plasma treatment on a structure that comprises the electrode, the plasma treatment using a gas including a halogen; and removing a product that is resulted from the plasma treatment.

Abstract: An manufacturing method of a display device may include the following steps: forming a transistor on a substrate; forming an insulating layer on the transistor; forming a conductive layer including silver on the insulating layer; forming a photosensitive member on the conductive layer; forming an electrode of a light-emitting element by etching the conductive layer; performing plasma treatment on a structure that comprises the electrode, the plasma treatment using a gas including a halogen; and removing a product that is resulted from the plasma treatment.

Abstract: An manufacturing method of a display device may include the following steps: forming a transistor on a substrate; forming an insulating layer on the transistor; forming a conductive layer including silver on the insulating layer; forming a photosensitive member on the conductive layer; forming an electrode of a light-emitting element by etching the conductive layer; performing plasma treatment on a structure that comprises the electrode, the plasma treatment using a gas including a halogen; and removing a product that is resulted from the plasma treatment.