Patents by Inventor Hyoryoung LIM

Hyoryoung LIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11524271
    Abstract: A thin film getter is provided. The thin film getter comprises a substrate and an absorption layer on the substrate, wherein the absorption layer comprises a getter material for absorbing target gas and an auxiliary material for providing a moving path of the target gas, and the getter material can be divided into a plurality of getter regions by the auxiliary material.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: December 13, 2022
    Assignee: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: Yongho Choa, Hyoryoung Lim, Nusia Eom
  • Patent number: 11285453
    Abstract: A moisture and hydrogen adsorption getter is provided. The moisture and hydrogen adsorption getter includes a silicon substrate including a concave portion and a convex portion, a silicon oxide layer conformally provided along a surface of the concave portion and a surface of the convex portion and configured to adsorb moisture, and a hydrogen adsorption pattern disposed on the silicon oxide layer. A portion of the silicon oxide layer is exposed between portions of the hydrogen adsorption pattern.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: March 29, 2022
    Assignee: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: Yongho Choa, Nusia Eom, Hyoryoung Lim
  • Publication number: 20210031167
    Abstract: A moisture and hydrogen adsorption getter is provided. The moisture and hydrogen adsorption getter includes a silicon substrate including a concave portion and a convex portion, a silicon oxide layer conformally provided along a surface of the concave portion and a surface of the convex portion and configured to adsorb moisture, and a hydrogen adsorption pattern disposed on the silicon oxide layer. A portion of the silicon oxide layer is exposed between portions of the hydrogen adsorption pattern.
    Type: Application
    Filed: October 16, 2020
    Publication date: February 4, 2021
    Applicant: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: YONGHO CHOA, Nusia EOM, Hyoryoung LIM
  • Patent number: 10843167
    Abstract: A moisture and hydrogen adsorption getter is provided. The moisture and hydrogen adsorption getter includes a silicon substrate including a concave portion and a convex portion, a silicon oxide layer conformally provided along a surface of the concave portion and a surface of the convex portion and configured to adsorb moisture, and a hydrogen adsorption pattern disposed on the silicon oxide layer. A portion of the silicon oxide layer is exposed between portions of the hydrogen adsorption pattern.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: November 24, 2020
    Assignee: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: Yongho Choa, Nusia Eom, Hyoryoung Lim
  • Publication number: 20200346184
    Abstract: A thin film getter is provided. The thin film getter comprises a substrate and an absorption layer on the substrate, wherein the absorption layer comprises a getter material for absorbing target gas and an auxiliary material for providing a moving path of the target gas, and the getter material can be divided into a plurality of getter regions by the auxiliary material.
    Type: Application
    Filed: August 28, 2017
    Publication date: November 5, 2020
    Applicant: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: Yongho Choa, Hyoryoung Lim, Nusia Eom
  • Publication number: 20190060863
    Abstract: A moisture and hydrogen adsorption getter is provided. The moisture and hydrogen adsorption getter includes a silicon substrate including a concave portion and a convex portion, a silicon oxide layer conformally provided along a surface of the concave portion and a surface of the convex portion and configured to adsorb moisture, and a hydrogen adsorption pattern disposed on the silicon oxide layer. A portion of the silicon oxide layer is exposed between portions of the hydrogen adsorption pattern.
    Type: Application
    Filed: October 31, 2018
    Publication date: February 28, 2019
    Applicant: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: Yongho CHOA, Nusia EOM, Hyoryoung LIM
  • Patent number: 10115508
    Abstract: The present invention relates to a magnetic-dielectric composite for a high-frequency antenna substrate, and a manufacturing method therefor, the composite comprising: a porous insulating dielectric substrate including an upper surface, a lower surface and lateral surfaces, and having a plurality of pores penetrating the upper surface and the lower surface; and soft ferrite nano-wires provided within the pores, wherein the soft ferrite nano-wires are encompassed by the insulating dielectric substrate so as to be separated from each other. The present invention controls a dielectric constant and can minimize eddy current loss by having a structure in which the soft ferrite nano-wires are provided within the pores of the insulating dielectric substrate and in which the soft ferrite nano-wires are encompassed by the insulating dielectric substrate so as to be separated from each other.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: October 30, 2018
    Assignees: LG ELECTRONICS INC., INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: Jinbae Kim, Yongho Choa, Jongryoul Kim, Hyoryoung Lim
  • Publication number: 20170323710
    Abstract: The present invention relates to a magnetic-dielectric composite for a high-frequency antenna substrate, and a manufacturing method therefor, the composite comprising: a porous insulating dielectric substrate including an upper surface, a lower surface and lateral surfaces, and having a plurality of pores penetrating the upper surface and the lower surface; and soft ferrite nano-wires provided within the pores, wherein the soft ferrite nano-wires are encompassed by the insulating dielectric substrate so as to be separated from each other. The present invention controls a dielectric constant and can minimize eddy current loss by having a structure in which the soft ferrite nano-wires are provided within the pores of the insulating dielectric substrate and in which the soft ferrite nano-wires are encompassed by the insulating dielectric substrate so as to be separated from each other.
    Type: Application
    Filed: June 24, 2015
    Publication date: November 9, 2017
    Applicants: LG ELECTRONICS INC., INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: Jinbae KIM, Yongho CHOA, Jongryoul KIM, Hyoryoung LIM